HAL Id: jpa-00229540
https://hal.archives-ouvertes.fr/jpa-00229540
Submitted on 1 Jan 1989
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HIGH Tc SUPERCONDUCTING THIN FILMS BY ORGANOMETALLIC CHEMICAL VAPOR
DEPOSITION
B. Gallois
To cite this version:
B. Gallois. HIGH Tc SUPERCONDUCTING THIN FILMS BY ORGANOMETALLIC CHEM- ICAL VAPOR DEPOSITION. Journal de Physique Colloques, 1989, 50 (C5), pp.C5-117-C5-117.
�10.1051/jphyscol:1989517�. �jpa-00229540�
JOURNAL DE PHYSIQUE
Colloque C5, supplbment au n05, Tome 50, mai 1989
HIGH Tc SUPERCONDUCTING THIN FILMS BY ORGANOMETALLIC CHEMICAL VAPOR DEPOSITION
B. GALLOIS
Stevens Institute of Technology, Castle Point on the Hudson, Hoboken NJ 07030, U.S.A.
Article published online by EDP Sciences and available at http://dx.doi.org/10.1051/jphyscol:1989517