MECHANICAL AND ELECTRONIC ASPECTS OF A FIELD ION SOURCE FOR BEAM APPLICATIONS

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Submitted on 1 Jan 1986

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MECHANICAL AND ELECTRONIC ASPECTS OF A FIELD ION SOURCE FOR BEAM APPLICATIONS

P. Schwoebel, G. Hanson

To cite this version:

P. Schwoebel, G. Hanson. MECHANICAL AND ELECTRONIC ASPECTS OF A FIELD ION

SOURCE FOR BEAM APPLICATIONS. Journal de Physique Colloques, 1986, 47 (C2), pp.C2-

167-C2-167. �10.1051/jphyscol:1986224�. �jpa-00225657�

JOURNAL DE PHYSIQUE

Colloque C2, supplément au n03, Tome 47, mars 1986 page c2-167

MECHANICAL AND ELECTRONIC ASPECTS OF A FIELD ION SOURCE FOR BEAM APPLICATIONS

P.R. SCHWOEBEL AND G.R. HANSON

AEP and NRRFSS, Corne11 University, Knight Laboratory, Ithaca.

NY 14853, U.S.A.

Temperature control from 5.0 t o 3000K and high voltage constraints of a f i e l d ion source a r e discussed. Electronics f o r ernitter annealing and f o r thermal f i e l d prosessing in addition t o drawings and operational aspects of a 1 l i t e r cryostat source assembly operating a t 40 t o 50kV a r e presented. Practical constraints such as alignment, emitter replacement, operating temperature ranges, e t c . will be presented.

Supported by NSF under NRRFSS grant ECS-8200312

Article published online by EDP Sciences and available at http://dx.doi.org/10.1051/jphyscol:1986224