HAL Id: jpa-00229598
https://hal.archives-ouvertes.fr/jpa-00229598
Submitted on 1 Jan 1989
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DEPOSITION AND STUDY OF CARBONYL CVD-W THIN FILMS
K. Gesheva, G. Beshkov
To cite this version:
K. Gesheva, G. Beshkov. DEPOSITION AND STUDY OF CARBONYL CVD-W THIN FILMS.
Journal de Physique Colloques, 1989, 50 (C5), pp.C5-565-C5-565. �10.1051/jphyscol:1989566�. �jpa- 00229598�
JOURNAL DE PHYSIQUE
Colloque C5, suppl6ment au n05, Tome 50, mai 1989
DEPOSITION AND STUDY OF CARBONYL CVD-W THIN FILMS
K.A. GESHEVA and G.S. BESHKOV"
Central Laboratory o f Solar Energy and New Energy Sources, Bulgarian Academy o f Sciences. S o f i a , Bulgaria
* ~ a d j a k o v I n s t i t u t e o f Solid S t a t e Physics, Bulgarian Academy o f Sciences, S o f i a , Bulgaria
CVD - tungsten thin films a r e deposited using different technological parameters. As-deposited films a r e rich of carbon, oxygen a s well a s of nitrogen. Partially annealed in Hz atmosphere, these films exhibit solar selective properties - high absorptance in t h e visible coupled with high reflectance in t h e IR.
Fully annealed, t h e films a r e almost pure W with low resistivity, assuring good transport properties for t h e purposes of VLSI applications.
Article published online by EDP Sciences and available at http://dx.doi.org/10.1051/jphyscol:1989566
