• Aucun résultat trouvé

Effect of cavities induced by ion implantation on rare gases diffusion in uranium dioxide

N/A
N/A
Protected

Academic year: 2021

Partager "Effect of cavities induced by ion implantation on rare gases diffusion in uranium dioxide"

Copied!
2
0
0

Texte intégral

(1)

HAL Id: cea-02338620

https://hal-cea.archives-ouvertes.fr/cea-02338620

Submitted on 21 Feb 2020

HAL is a multi-disciplinary open access

archive for the deposit and dissemination of sci-entific research documents, whether they are pub-lished or not. The documents may come from teaching and research institutions in France or abroad, or from public or private research centers.

L’archive ouverte pluridisciplinaire HAL, est destinée au dépôt et à la diffusion de documents scientifiques de niveau recherche, publiés ou non, émanant des établissements d’enseignement et de recherche français ou étrangers, des laboratoires publics ou privés.

Effect of cavities induced by ion implantation on rare

gases diffusion in uranium dioxide

M. Gerardin, E. Gilabert, D. Horlait, P. Desgardin, G. Carlot, M-F. Barthe

To cite this version:

M. Gerardin, E. Gilabert, D. Horlait, P. Desgardin, G. Carlot, et al.. Effect of cavities induced by ion implantation on rare gases diffusion in uranium dioxide. SHIM-ICACS - 10th International symposium on swift heavy ions in matter & 28th international conference on Atomic collisions in solids, Jul 2018, Caen, France. �cea-02338620�

(2)

5

6

7

8

9

10

10

-24

10

-23

10

-22

10

-21

10

-20

10

-19

10

-18

10

-17

10

4

/T (K

-1

)

D

(m

2

.s

-1

)

Long [1], Long

Lindner [2], Lindner

Miekeley [3], Miekeley

Davies [4], Davies

0 100 200 300 400 0.0E+00 1.0E-04 2.0E-04 3.0E-04 4.0E-04 5.0E-04 6.0E-04 7.0E-04 8.0E-04 9.0E-04

Xe[Im

p] (

% at

./ at

.UO

2

)

Depth (nm)

Ions, Xe 800 keV

dpa, Xe 800 keV

Ions, Kr 500 keV

dpa, Kr 500 keV

0.00 0.01 0.02 0.03 0.04 0.05 0.06

dpa

10

21

10

22

10

23

10

24

1x10

-20

1x10

-21

1x10

-22

Burnup (fission.m

-3

)

D (m

2

.s

-1

)

Effect of cavities induced by ion implantation on rare

gases diffusion in uranium dioxide

M. Gerardin

1

*, E. Gilabert

2

, D. Horlait

2

, P. Desgardin

3

, G. Carlot

1

, M-F. Barthe

3

1

CEA/DEN/DEC (Saint Paul Lez Durance, France)

2

CENBG, CNRS/IN2P3 (Gradignan, France)

3

CEMHTI, CNRS/UPR3079 (Orléans, France)

* marie.gerardin@cea.fr

● Objectives

Improve the modelling of fission gas thermal diffusion mechanisms

to better predict UO

2

fuel behaviour under irradiation

Study the interaction between gas and defect induced by irradiation

Gas release

Pressure increase

Precipitation

Fuel swelling

Modification of the oxide

physico-chemical properties limiting fuel life time

in reactor

UO

2

: fluorine structure

UO

2

Pellets

Diffusion coefficient dependance

Stoichiometry of the sample

Burn up (fission.m

-3

)

● Literature

Arrhenius laws of xenon diffusion in UO

2.00

irradiated at a low burn-up

(<2.10

22

fission.m

-3

)

Xenon diffusion coefficient dependance with

the burn-up [1]

Rare gases

diffusion in UO

2

Thermal desorption

measurements

Gas release fraction

Diffusion

coefficient

Xe 800keV

or

Kr 500 keV

Implantation

 Gases are trapped in UO

2

for a

burn-up > 2.10

22

f.m

-3

 In which defects ?

𝐷

𝑖

𝜕

2

𝐶

𝑖

(𝑥, 𝑡)

𝜕

2

𝑥

=

𝜕𝐶

𝑖

(𝑥, 𝑡)

𝜕𝑡

𝐶

𝑖

0, 𝑡 = 0

𝐶

𝑖

∞, 𝑡 = 0

𝐶

1

𝑥, 0 = 1 − 𝑀 × 𝐶

𝑆𝑅𝐼𝑀 𝑃𝑟𝑜𝑓𝑖𝑙𝑒

𝐶

2

𝑥, 0 = 𝑀 × 𝐶

𝑆𝑅𝐼𝑀 𝑃𝑟𝑜𝑓𝑖𝑙𝑒

● Diffusion model : two populations

Second Fick law

𝑪

𝟏

: Gaz concentration mobile with

𝑫

𝟏

Burst effect

𝑴

: Fraction of 2 populations

𝑪

𝟐

: Gaz concentration mobile with

𝑫

𝟐

Intrinsic diffusion

● Experimental approach

Seperated effect studies

● Conclusions

Same diffusion mechanism between xenon and krypton

Good agreement with literature

Rare gases trapped in cavities induced by irradiation

Ea ̴ 3 eV

[1] Long, Davies and Findlay, AERE-M1251 (1964)

[2] Lindner and Matzke, Z. Naturforschung 14a (1959)

[3] Miekeley and Felix, JNM 42 (1972)

[4] Davies Long, AERE-R 4347 (1963)

Positron annihilation

spectroscopy (PAS)

+

Defects induced by

implantation

● Arrhenius law (D

2

)

Fission : ̴ 200 MeV

0,3 at (Xe + Kr) per fission U

 Consistent with literature

 Same diffusion mechanisms

between Xe and Kr

For i = 1 or 2 :

0 100 200 300 0.0 2.0x104 4.0x104 6.0x104

[Gas

] (

at

/c

m

3

)(a

t/

cm

2

)

Depth (nm)

C

SRIM

(x,0)

C

1

(x,0)

C

1

(x,t)

C

2

(x,0)

C

2

(x,t)

M = 0.95 D1 = 3.10-17 m2.s-1 D2 = 1.10-20 m2.s-1 Tfinal = 500 min

● Trapping effect

Xenon 800 keV at 1.4.10

11

Xe.cm

-2

Ea̴ = 3.10 ± 0.33 eV

D0 = 1.62.10

-10

m

2

.s

-1

Krypton 500 keV at 2.1.10

12

Kr.cm

-2

Ea̴ = 2.81 ± 0.45 eV

D0 = 2.13.10

-11

m

2

.s

-1

D

0

̴ 10

-12

to 5.10

-6

m

2

.s

-1

Arrhenius laws of xenon and krypton

implanted in UO

2

10

13

ions.cm

-2

Diffusion coefficient (D

2

) determined on

isotherms obtained at 1300°C for each dose

D

1

remains constant

D

2

decreases from

10

13

ions.cm

-2

in polycrystals

10

12

ions.cm

-2

in monocrystals

Trapping effect in implanted UO

2

1. Thermal desorption

𝐶

1

𝑥, 0 = 1 − 𝑀 × 𝐶

𝑆𝑅𝐼𝑀 𝑃𝑟𝑜𝑓𝑖𝑙𝑒

𝐶

2

𝑥, 0 = 𝑀 × (1 −

𝑭𝒓

𝒊𝒏𝒊𝒕

) × 𝐶

𝑆𝑅𝐼𝑀 𝑃𝑟𝑜𝑓𝑖𝑙𝑒

𝐶

𝑃

𝑥, 0 = 𝑀 ×

𝑭𝒓

𝒊𝒏𝒊𝒕

× 𝐶

𝑆𝑅𝐼𝑀 𝑃𝑟𝑜𝑓𝑖𝑙𝑒

2. Trapping sites

1E11

1E12

1E13

1E14

1E15

4E-22

6E-22

8E-22

2E-21

4E-21

6E-21

8E-21

2E-20

1E-21

1E-20

D

2

(m

2

.s

-1

)

Fluence (ions.cm

-2

)

Xenon (Poly)

Xenon (Mono)

Krypton (Poly)

Krypton (Mono)

TEM images of cavities after ion implantation

 Gas retained in cavities induced by irradiation

[7] A. Michel, NIMB 272 (2012)

[8] C. Onofri, non published

1E11

1E12

1E13

1E14

1E15

1E22

1E23

1E24

1E25

Cavity density (m

-3

)

Fluence (ions.cm

-2

)

Xe 390 keV 600°C [7]

Xe 390 keV 600°C [8]

Xe 390 keV -180°C [8]

Xe 390 keV 800°C [8]

[7]

● Context

UO

2

is the most used fuel in nuclear power plants

TEM image of cavities in

irradiated material at

23 GWj/tU

Transmission

Electron Microscopy

(TEM)

0 100 200 300 400 500 0.00 0.01 0.02 0.03 0.04 0.05

Xe 1.4e11 (1s - Poly)

Simulated with D

2

= 0

Simulated with D

2

 0

Re

leas

ed fraction ([

Xe]relea

se

d/[Xe]im

p)

Time (min)

5

6

7

8

9

10

10

-24

10

-23

10

-22

10

-21

10

-20

10

-19

10

-18

10

-17

10

4

/T (K

-1

)

D

(m

2

.s

-1

)

Long [1], Long

Lindner [2], Lindner

Miekeley [3], Miekeley

Davies [4], Davies

Xe 1.4e11, This study

Kr 2.1e12, This study

𝑭𝒓

𝒊𝒏𝒊𝒕

: Fraction of trapped gas atom

 Increases with the fluence

1E11

1E12

1E13

1E14

1E15

0

20

40

60

80

Fr

in

it

Fluence (ions.cm

-2

)

Xenon (Poly)

Xenon (Mono)

Krypton (Poly)

Krypton (Mono)

Références

Documents relatifs

To test whether the vesicular pool of Atat1 promotes the acetyl- ation of -tubulin in MTs, we isolated subcellular fractions from newborn mouse cortices and then assessed

Néanmoins, la dualité des acides (Lewis et Bronsted) est un système dispendieux, dont le recyclage est une opération complexe et par conséquent difficilement applicable à

Cette mutation familiale du gène MME est une substitution d’une base guanine par une base adenine sur le chromosome 3q25.2, ce qui induit un remplacement d’un acide aminé cystéine

En ouvrant cette page avec Netscape composer, vous verrez que le cadre prévu pour accueillir le panoramique a une taille déterminée, choisie par les concepteurs des hyperpaysages

Chaque séance durera deux heures, mais dans la seconde, seule la première heure sera consacrée à l'expérimentation décrite ici ; durant la seconde, les élèves travailleront sur

A time-varying respiratory elastance model is developed with a negative elastic component (E demand ), to describe the driving pressure generated during a patient initiated

The aim of this study was to assess, in three experimental fields representative of the various topoclimatological zones of Luxembourg, the impact of timing of fungicide

Attention to a relation ontology [...] refocuses security discourses to better reflect and appreciate three forms of interconnection that are not sufficiently attended to