In depth static and low-frequency noise characterization of n-channel FinFETs on SOI substrates at cryogenic temperature

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Submitted on 21 Jul 2014

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In depth static and low-frequency noise characterization of n-channel FinFETs on SOI substrates at cryogenic

temperature

H. Achour, Bogdan Cretu, Jean-Marc Routoure, Régis Carin, Rachida Talmat, A. Benfdila, E. Simoen, C. Claeys

To cite this version:

H. Achour, Bogdan Cretu, Jean-Marc Routoure, Régis Carin, Rachida Talmat, et al.. In depth static and low-frequency noise characterization of n-channel FinFETs on SOI substrates at cryogenic temperature. Solid-State Electronics, Elsevier, 2014, 8 p. �hal-00994380�

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