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PHONON SOFTENING IN ULTRA HEAVILY DOPED Si AND Ge
A. Compaan, G. Contreras, M. Cardona, A. Axmann
To cite this version:
A. Compaan, G. Contreras, M. Cardona, A. Axmann. PHONON SOFTENING IN ULTRA HEAV- ILY DOPED Si AND Ge. Journal de Physique Colloques, 1983, 44 (C5), pp.C5-197-C5-201.
�10.1051/jphyscol:1983531�. �jpa-00223116�
JOURNAL DE PHYSIQUE
Colloque C5, suppl6ment au nO1O, Tome 44, octobre 1983 page C5-197
PHONON SOFTENING I N ULTRA HEAVILY DOPED Si AND Ge A. cornpaan+, G. Contreras ++ , M. Cardona aqd A. Axmann
rMax-PZanck-Institut far FestkOrperforschung, Heisenbergstr.
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4 ,7800 Freiburg,
F . R.G.Resume - Un r e c u i t l a s e r XeCl 2 impulsions (308 nm, 10 nsec, %0,8J/cm 2 ) a etO u t i l i s e pour o b t e n i r des p r o f i l s de concentration p l a t s a p r e s f o r t e implan- t a t i o n ionique de Ga, B, P e t As 21 des e n e r g i e s a l l a n t j u s q u ' a 350 kev.
L ' i n f l u e n c e de l a concentration de p o r t e u r s l i b r e s s u r l a frequence du phonon de c e n t r e de zone a ete e t u d i e e par s p e c t r o s c o p i e Raman d l ' a i d e des r a i e s l a s e r continues v i o l e t t e s e t ul t r a - v i o l e t t e s , a f i n de s ' a s s u r e r que s e u l e s l e s regions implantees sont concernees.
NOUSavons d e t e c t & une reduction de la frequence du phonon Raman d'environ 10 cm-1 pour Si:As (Ne = 3
x1021 cm-3) e t d ' e n v i r o n 20 cm-1 pour Si:B (Np = 1
x1021 cm-3).
Abstract - Multiple pulse annealing with a XeCl l a s e r (308 nm, lonsec, s Q . 8 J 1 been used t o produce f l a t concentration p r o f i l e s f o l lowing heavy implantations of Ga, B, P , and As a t e n e r g i e s up t o 350 keV.
The i n f l u e n c e of t h e f r e e c a r r i e r c o n c e n t r a t i o n on t h e zone c e n t e r phonon f r e - quency has been s t u d i e d by Raman s c a t t e r i n g with v i o l e t and u l t r a - v i o l e t
Cwl a s e r l i n e s t o ensure t h a t only t h e implanted region was sampled. We f i n d a s o f t e n i n g of t h e zone c e n t e r o t i c mode i n Si :As (Ne
23
x1021 cm-3) of 10 cm-1 and f o r S i : a (Np = 1
x1051 cm-3) a s o f t e n i n g of
520 cm-1.
High dose implantation followed by pulsed l a s e r annealing has t h e demonstrated ca- p a b i l i t y of producing s u b s t i t u t i o n a l dopant concentrations i n Si f a r exceeding normal s o l i d s o l u b i l i t y l i m i t s / I / . The p r o p e r t i e s of t h i s u l t r a heavily doped Si a r e of g r e a t i n t e r e s t s i n c e they provide t e s t s f o r a wide v a r i e t y o f phenomena such a s carrier-phonon s c a t t e r i n g a t high d e n s i t i e s , band gap renormalization due t o dense c a r r i e r systems, and c a r r i e r recombination processes a t high d e n s i t y . How- ever, t h e p r o p e r t i e s of such heavily doped Si have thus f a r received remarkably l i t t l e a t t e n t i o n . In t h i s paper we d e s c r i b e r e s u l t s on t h e s o f t e n i n g o r renormali- z a t i o n of t h e zone c e n t e r o p t i c phonon energy a s a consequence of i n t e r a c t i o n with t h e dense c a r r i e r ( e l e c t r o n o r hole) system i n t h e s e m a t e r i a l s . Other r e l a t e d papers d i s c u s s luminescence s t u d i e s i n heavily doped Si and Ge / 2 / , e l l i p s o m e t r i c s t u d i e s of broadening and s h i f t s i n t h e e l e c t r o n i c s t r u c t u r e /3/ and Raman s t u d i e s of l o c a l i z e d v i b r a t i o n a l modes of t h e dopant atoms / 4 / . The samples used i n t h i s study come from a v a r i e t y of sources ( s e e acknowledgements), however t h e majority of samples were implanted a t t h e Fraunhofer I n s t i t u t e (Freiburg) following prepara- t i o n a t t h e Max Planck I n s t i t u t e from commercially grown, pure s i n g l e c r y s t a l boules. The ion beam was provided by a High Voltage Engineering 350 keV implanter equipped with a hollow-cathode ion source. The focused ion beam a f t e r electromag- n e t i c mass s e p a r a t i o n was swept e l e c t r o s t a t i c a l l y t o achieve a uniform implantation over a 5 x 5 cm 2 a r e a . The t o t a l dose was determined by i n t e g r a t i n g t h e ion beam c u r r e n t . The dose r a t e s were about
1~A/cm 2 . The wafers were misaligned under an angle of 7 degrees between t h e normal of t h e wafer s u r f a c e and t h e i n c i d e n t beam t o 'permanent address
:von Humbolt Foundation Fellow, on leave from Kansas State University, Dept. of Physics, Cardwell Hall, Manhattan, Kansas 66506, U.S.A.
++permanent address
:DAAD Fellow, on leave from E.S.F.M.-I.P.N., Mkxico,
MEXICOArticle published online by EDP Sciences and available at http://dx.doi.org/10.1051/jphyscol:1983531
C5-198
JOURNAL DE PHYSIQUE
a v o i d c h a n n e l l i n g . The source f e e d m a t e r i a l s a r e d e s c r i b e d elsewhere / 5 / .
I o n i m p l a n t a t i o n a t a s i n g l e energy r e s u l t s i n a r o u g h l y Gaussian d e p t h d i s t r i b u t i o n o f t h e i m p l a n t e d s p e c i e s . T h i s s e v e r e l y c o m p l i c a t e s m e a n i n g f u l s t u d y o f t h e ma- t e r i a l p r o p e r t i e s even a f t e r s u c c e s s f u l oven o r cw l a s e r a n n e a l i n g /6,7/. However, p u l s e d l a s e r a n n e a l i n g p e r m i t s a c o n s i d e r a b l e amount of dopant r e d i s t r i b u t i o n when performed a t l a s e r e n e r g i e s s i g n i f i c a n t l y above t h e a n n e a l i n g t h r e s h o l d /I/. I t has r e c e n t l y been shown /8/ t h a t p u l s e d a n n e a l i n g w i t h
mu1t i p l e 1 a s e r p u l s e s can p r o v i d e an e s s e n t i a l l y f l a t c o n c e n t r a t i o n p r o f i l e i n t h e r e g i o n which has been i o n i m p l a n t e d . The work of r e f . 8 was performed w i t h a r u b y l a s e r which s u f f e r s f r o m t h e d i s a d v a n t a g e t h a t t h e a b s o r p t i o n o f t h e f i r s t p u l s e i n t h e i o n i m p l a n t e d amor- phous l a y e r ( i n S i ) i s much h i g h e r t h a n t h e a b s o r p t i o n o f t h e second and subsequent p u l s e s w h i c h see r e c r y s t a l l i z e d m a t e r i a l .
I n t h i s work we have performed m u l t i p l e p u l s e a n n e a l i n g w i t h a XeCl l a s e r (Lambda Physi k model EMG 100) w i t h A
=308 nm. T h i s wavelength p r o v i d e s a n e a r l y i d e a l match between t h e a b s o r p t i o n c o e f f i c i e n t s of amorphous and c r y s t a l l i n e S i . Thus we
n
have used c o n s t a n t p u l s e e n e r g i e s ( t y p i c a l l y 0.8 t o 1.2 ~ / c m ~ ) and r e p e t i t i o n r a t e s o f 1-4 Hz w h i l e r a s t e r scanning t h e sample t o i n s u r e t h a t each p o i n t was annealed w i t h t y p i c a l l y f i v e p u l s e s . The beam was weakly focussed t o an a r e a o f about 500 x 1500 ym.
C a r r i e r d e n s i t i e s i n t h e i m p l a n t e d l a y e r were o b t a i n e d v i a i n f r a r e d r e f l e c t i v i t y . We have used t h e l o c a t i o n o f t h e r e f l e c t i v i t y minimum t o g e t h e r w i t h t h e e x p e r i m e n t a l r e s u l t s f o r b u l k samples t a b u l a t e d by F i s t u l / 9 / and t h e r e c e n t s t u d y b y Miyao e t a l . / l o / on i o n i m p l a n t e d S i .
- - h = 4880 A
=
d- c
V) Z W I-
z
Z
a
LOO1
600I a
RAMAN SHIFT (cm-'1 Ix-200 800
F i g . 1 - Raman s p e c t r a o b t a i n e d from i o n i m p l a n t e d , p u l s e d l a s e r annealed samples.
I n each case t h e h i g h e r f r e q u e n c y peak of t h e d o u b l e t shown i n t h e i n s e t i s t h e 520 cm-I Raman l i n e o f t h e p u r e s u b s t r a t e . The l o w e r energy peak a r i s e s f r o m t h e h e a v i l y doped r e g i o n .
I o n i m p l a n t a t i o n foll'owed b y p u l s e d l a s e r a n n e a l i n g c r e a t e s a doped s u r f a c e l a y e r
o n l y 0 . 1 t o 0.3 ym deep. I n s i l i c o n t h i s p r e s e n t s m a j o r d i f f i c u l t i e s f o r Raman
s t u d i e s w i t h t h e u s u a l l a s e r f r e q u e n c i e s , hu 2.7 eV, because t h e l i g h t probes
w e l l i n t o t h e b u l k o f t h e sample / 7 / . The r e q u i r e d d e c o n v o l u t i o n o v e r t h e dopant
p r o f i l e and t h e bulk response severely l i m i t t h e accuracy of t h e r e s u l t s . Therefore we have used i n t h i s work primarily t h e v i o l e t (A
=406.7 and 413.1 nm) and UV(X
=356.4 and 350.7 nm) l i n e s of a Kr l a s e r . The corresponding Raman probe depths i n pure Si a r e /11/ ( 2 a ) - '
%6C0 8 and 50 8 f o r t h e v i o l e t and uv l i n e s , r e s p e c t i v e l y . To i l l u s t r a t e t h i s behavior we present s p e c t r a i n Fig. 1 obtained f o r wavelengths where t h e l a s e r p e n e t r a t e s s l i g h t l y i n t o t h e pure bulk m a t e r i a l . Comparison of t h e s e s p e c t r a with o t h e r s obtained a t s h o r t e r wavelengths where t h e absorption depth i s considerably l e s s show t h a t the t r a n s i t i o n zone between bulk and t h e heavily doped l a y e r has n e g l i g i b l e influence on t h e s p e c t r a . This i s c o n s i s t e n t with t h e ob- s e r v a t i o n t h a t f o r m u l t i p l e pulse l a s e r annealing t h i s zone i s very narrow / 8 / . The influence of f r e e c a r r i e r s on phonon frequencies and phonon l i f e t i m e s has been e x t e n s i v e l y s t u d i e d i n t h e l a s t several y e a r s by Raman s c a t t e r i n g /12,13,14/, acou- s t i c measurements /15/, and neutron s c a t t e r i n g /16/ i n bul
kdoped s e m i c o n ~ u c t o r s .
The i n t e r a c t i o n of t h e Raman phonon with t h e continuum of e l e c t r o n i c e x c i t a t i o n s gives r i s e t o an asymmetric broadened and s h i f t e d Raman l i n e (Fano l i n e shape).
However, t h e asymmetry becomes n e g l i g i b l y small a s t h e l a s e r frequency approaches t h e resonance f o r d i r e c t e l e c t r o n i c band-to-band t r a n s i t i o n s . For Si t h e v i o l e t and uv l i n e s a r e c l o s e t o t h e EA, El d i r e c t gap and hence t h e asymmetry i s very
. -
small compared t o t h e broadening which occurs i n t h e extremely heavily doped samples which a r e t h e s u b j e c t of t h i s study. Thus we have avoided a d e t a i l e d a n a l y s i s of t h e Fano l i n e shape parameters and p r e s e n t t h e s h i f t s of t h e Raman l i n e s which a r e d i r e c t l y observed.
bulk doped (Chandrasekhar. et al ,1980 )
% implanted. laser annealed
I
/
1
(Chandrasekhar./ et al.
1978
)A w - n
I