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Atomic white-out: enabling atomic circuitry through mechanically induced bonding of single hydrogen atoms to a silicon surface

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Supplementary Materials: Atomic White-Out:

Enabling Atomic Circuitry through

Mechanically Induced Bonding of Single

Hydrogen Atoms to a Silicon Surface

Taleana R. Hu,

∗,†,‡,§

Hatem Labidi,

†,¶,§

Mohammad Rashidi,

†,¶

Mohammad

Koleini,

†,¶

Roshan Achal,

†,‡

Mark H. Salomons,

¶,‡

and Robert A. Wolkow

∗,†,¶,‡

†Department of Physics, University of Alberta, Edmonton, Alberta, T6G 2E1, Canada ‡Quantum Silicon, Inc., Edmonton, Alberta, T6G 2M9, Canada

¶National Institute for Nanotechnology, National Research Council of Canada, Edmonton, Alberta, T6G 2M9, Canada

§These authors contributed equally to this work E-mail: taleana@ualberta; rwolkow@ualberta.ca

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Figure 1: (a) Single hydrogen atoms physisorbed on the chemically inert H-Si(100) surface could be stably imaged in lled states at low voltage (+1.3 V). However, when the scanning voltage is increased to +1.7V in gure (b), the hydrogen atom is dragged by the tip. This dragging is not smooth, but can result in the H atom being moved close enough to the DB to cap it, as indicated by a change in contrast midway through the image and conrmed by a subsequent STM image of the same area (c). (b) and (c) are larger area (10×10)nm2)

images of the area in (a). The location of the atomic hydrogen is marked with an arrow.

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Figure 2: (a)-(e) Series of raw (3×3)nm2 NC-AFM frequency shift maps of H-Si(100) surface

at dierent tip-sample elevations. Images were recorded at 0 V and with an oscillation amplitude of 1 Å. We see the evolution from atomic to chemical bond contrast on the H-Si surface. For smaller tip elevations, much higher interaction force is seen on the DB than elsewhere on the surface. Z=0 Å corresponds to the tip position dened by the STM imaging set points (30 pA and +1.3 V) before switching o the feedback loop.

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Figure 3: (a) NC-AFM frequency shift map of a single DB at small tip-sample distance (-4.6 Å) and (b) corresponding simultaneously obtained excitation channel map. (c) Superposed excitation versus tip elevation curves recorded on the same DB (red curve) and on the H-Si surface (blue curve)

Figure 4: (a) and (b) show empty states images (50pA, +1.3V) corresponding to Figure 5-a and 5-c from the main text, respectively. It can be seen clearly in (a) that for Figure 5-a, the coupled DBs are separated by 2 hydrogens. For Figure 5-b, (b) shows the central DB is separated from the top-most DB by 1 hydrogen separation, and the bottom-most DB by 2 hydrogen separation.

Figure

Figure 1: (a) Single hydrogen atoms physisorbed on the chemically inert H-Si(100) surface could be stably imaged in lled states at low voltage (+1.3 V)
Figure 2: (a)-(e) Series of raw (3 × 3) nm 2 NC-AFM frequency shift maps of H-Si(100) surface at dierent tip-sample elevations
Figure 4: (a) and (b) show empty states images (50pA, +1.3V) corresponding to Figure 5-a and 5-c from the main text, respectively

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