Study of thin Films of Nickel Oxide (NiO)Deposited bythe Spray Pyrolysis Method

Successive annealing of samples for 20 minutes at 450 °C (Fig. 6c) and 20 minutes at 500 °C shows the increase of TiO 2 cystallinity with the increase of the annealing temperature.

Abstract: In this work, thin films of nickel oxide (NiO) were deposited by a simple and inexpensive technique, which is spray pyrolysis on ordinary glass substrates heated to a

Abstract : In this work, a copper oxide thin films were deposed by a simple and inexpensive technique (spraypyrolysis) on ordinary glass substrates at a fixed temperature T=500°C..

In this work, a copper oxide thin films were deposed by a simple and inexpensive technique (spray pyrolysis) on ordinary glass substrates at a fixed temperature T=500°C. and

Abstract : Nickel oxide (NiO) thin films were deposited on glass substrates by chemical spray pyrolysis technique.. A high quality crystal was obtained after annealing at

The aim of our work is the development and characterization of nickel oxide thin films deposited by the technique of spray pyrolysis on glass substrates.. This

Abstract : An unbalanced radiofrequency magnetron sputtering, at low pressure argon-oxygen gas mixture, was used to elaborate copper oxide films.. Analyses of the deposited layers

«Property variations of direct-current reactive magnetron sputtered copper oxide thin films deposited at different oxygen partial pressures», Thin Solid Films Vol. Wang, et