• Aucun résultat trouvé

Copper Oxide Thin Films Deposited byRadiofrequency Magnetron Sputtering:1Photovoltaic Applications

N/A
N/A
Info
Télécharger
Protected

Academic year: 2021

Partager "Copper Oxide Thin Films Deposited byRadiofrequency Magnetron Sputtering:1Photovoltaic Applications"

Copied!
1
0
0

Chargement.... (Voir le texte intégral maintenant)

Texte intégral

(1)

7th African Conference on Non Destructive Testing ACNDT 2016 & the 5th International Conference on NDT and Materials Industry and Alloys (IC-WNDT-MI)

2016

Copper Oxide Thin Films Deposited by Radiofrequency Magnetron Sputtering:

1Photovoltaic Applications

R. TADJINE, A. HAOUIMI, M.M. ALIM, M. Kechouane

Abstract : An unbalanced radiofrequency magnetron sputtering, at low pressure argon-oxygen gas mixture, was used to elaborate copper oxide films. Analyses of the deposited layers by X-ray diffraction (XRD), spectrometry UV-VIS-NIR and electrical resistivity measurement were carried out to assist and optimize the method. The apparition of CuO and/or CuO phases is affected by the experimental plasma parameters. So it’s important to find the best operating range ensuring the correct stoichiometry and giving the preferred phase. The results showed a changing films color with resistivity ranging from 10 to 570?cmandfilmsthicknessfrom0.24to2.2?m.

Keywords : solar cells, Copper oxide thin films, Magnetron sputtering

Centre de Recherche en Technologies Industrielles - CRTI - www.crti.dz

Powered by TCPDF (www.tcpdf.org)

Références

Télécharger maintenant ( PDF - 1 Page - 7.82 KB )

Documents relatifs

Characterization of a Peroxodiiron(III) Intermediate in the T201S Variant of Toluene/o-Xylene Monooxygenase Hydroxylase from Pseudomonas sp. OX1

When investigating pre-steady-state dioxygen activation at the reduced diiron(II) center of T201S by stopped-flow spectrophotometry, we observed a new transient intermediate

A comparative study of copper thin films deposited using magnetron sputtering and supercritical fluid deposition techniques

A comparison of crystallinity, microstructure, surface morphology and electrical conductivity is proposed for the deposition of copper films, using supercritical fluid chemical

Guide-utilisation_MaClasseVirtuelle.pdf

o voter à un sondage en ligne ou répondre à une évaluation pendant la classe virtuelle o partager un document ou une application de son poste de travail..  Consulter en

Les arguments pris en compte par des enseignants de 6ème année dans le maintien ou le changement d'orientation d'élèves

Nous remarquons que l’enseignant oriente les élèves dans une certaine voie pour qu’ils réussissent une 7 ème année mais pas forcément toute leur école

Stratégie pour l'emploi des personnes en situation de handicap 2019-2020

employeurs publics d’accompagnement des par- cours professionnels pour les agents en situation de handicap, mise en place de dispositifs de pro- motion ad hoc pour les

A Copper Oxide (CuO) Thin Films Deposited bySpray Pyrolysis Method

Their optical band gaps ranged from 3.95 to 4.02eV for thin films made with S1, and from 1.6 to 1.95eV for thin films made with S2 with a high absorbency in the visible region, which

A Copper Oxide (CuO) Thin Films Deposited by Spray Pyrolysis Method

Optical Absorbance of CuO Thin Films Deposed at Different volumes (S 1 or S 2 ) at T=500°C In order to appreciate the gap energy of CuO thin films, first, the experimental data

A Copper Oxide (CuO) Thin Films Deposited bySpray Pyrolysis Method

A copper nitrate was used and dissolved in two different solutions (Water, Methanol) S1 and S2 respectively in order to obtain an equal concentration;CS1, S2= 0.5M.The spray