HAL Id: hal-00534735
https://hal-iogs.archives-ouvertes.fr/hal-00534735
Preprint submitted on 10 Nov 2010
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Single-frequency diode-pumped semiconductor laser tuned on a Cs transition
Benjamin Cocquelin, Gaëlle Lucas-Leclin, Patrick Georges, Isabelle Sagnes, Arnaud Garnache, David Holleville
To cite this version:
Benjamin Cocquelin, Gaëlle Lucas-Leclin, Patrick Georges, Isabelle Sagnes, Arnaud Garnache, et al.. Single-frequency diode-pumped semiconductor laser tuned on a Cs transition. 2010. �hal-00534735�
Single-frequency diode-pumped
Single-frequency diode-pumped
semiconductor laser tuned on a Cs transition
semiconductor laser tuned on a Cs transition
B. Cocquelin, Gaëlle Lucas-Leclin and P. Georges
Laboratoire Charles Fabry de l’Institut d’Optique, Palaiseau, France
I. Sagnes
Laboratoire de Photonique et de Nanostructures, Marcoussis, France
D. Holleville
LNE/SYRTE - Observatoire de Paris , Paris, France
A. Garnache
Institut d’Électronique du Sud, Montpellier, France
Lasers in
Lasers in
Cesium atomic clocks
Cesium atomic clocks
Need for high-power and narrow-linewidth sources emitting at the Cesium D2 line (852 nm)
⇒ a single OP-VECSEL ?
Scheme of an atomic fountain
Microwave interrogation : FCs = 9 192 631 770 Hz F = 3 F = 4 Cs D2 line λ = 852 nm F = 5 4 3 2 Cs atomic levels Optical Detection Δν << 5 MHz Extended-cavity laser diodes Atoms cooling Popt > 200 mW DFB/DBR diodes, MOPA, … 9.192 GHz 60 0 M H z Atom cooling Popt > 200 mW DFB/DBR diodes, MOPA, …
OP-VECSEL
OP-VECSEL
at
at
850 nm
850 nm
Pump module External mirror Semiconductor structure S u b st ra te Bragg mirror QW λP ≅ 700 nm λL ≅ 850 nm• High power in Optically Pumped-VECSEL
30 W @ 980 nm, M2 = 3 (Coherent - Photonics West '04)
1.0 W in-well pump / 0.7 W @ 850 nm, M2 = 5 (University of Strathclyde) • No spatial hole-burning : single-frequency in simple linear cavity
500 mW @ 1003 nm (Jacquemet et al, App.Phys. B 86, 503 (2007))
42 mW @ 870 nm, ∆νL ≅ 3 kHz (Holm et al, IEEE PTL 11, 1551 (1999)) • Linearly polarized, circular TEM beam
Design of
Design of
the
the
semiconductor
semiconductor
structure
structure
• λL = 852 nm
• Barriers absorption at λP ≤ 720 nm
eb ≅ 2 µm ⇒ ηP = 85%
• AR coating (Si3N4) at air/SC surface for :
maximum pump transmission
+ reduction of microcavity etalon effect • Structure grown by MOCVD
Reflectivity Photoluminescence Stop band 70 nm Rmax ≅ 99.97% 1.0 0.2 0.4 0.6 0.8 0.0 0.8 0.9 1.0 1.1 0.7 0.6 Energy Quantum wells Bragg Mirror |E|2 Substrate GaAs 350 µm 32.5 pairs λ/4 Al0.22Ga0.78As/AlAs R ≥ 99.95% Active Layers 29λ/4 GaAs NQW= 7 ; LQW = 8 nm Barriers Al0.22Ga0.78As InGaP Caping Layer (20 nm)
Design
Design
optimization
optimization
• Low threshold pump intensity Ith for high opt-opt efficiency
⇒ NQW= 7 is optimal for ~ 2% losses
0 1 2 3 4 5 0 5 10 15 20 T = 0.5% T = 1% T = 2% 10°C 40°C I th ( kW /c m 2 ) NQW 190 105 Itr (W/cm2) 830 1000 g0(cm-1) 40°C 10°C T(°C) Experimental parameters ! Ith = NQWItr " exp T 2#NQWLQWg0 $ % & & ' ( ) ) Threshold intensity
Single-frequency
Single-frequency
s
s
etup
etup
• Compact plane-concave cavity : Lext ≅ 10 mm
• Single-transverse mode pump laser diode :
Pmax= 120 mW (245 mA) at λP = 658 nm
• 52 x 52 x 58 mm3 integrated setup for improved mechanical stability
Pump Diode Output coupler + PZT Single-mode Laser Diode GaAs DBR QW Active Structure Output coupler T = 1% - RC = 12 mm WP = 20 µm Active Structure PZT
Single-frequency emission
Single-frequency emission
• Low threshold: 4.1 kW/cm²
• Good beam quality : M² < 1.2 and linear polarization
Output coupler T = 1% - RC = 12 mm η = 17% Ith ≅ 4.1 kW/cm2 PL = 17 mW (pump limited) T = 280 K 0 5 10 15 20 0 50 100 150
Incident Pump Power (mW)
O u tp u t P o w er ( mW ) 850.5 851.0 851.5 852.0 852.5 W av ele n g th (n m )
Europhotons ‘08 Single-frequency diode-pumped semiconductor laser at the Cs line 8
Single-frequency emission
Single-frequency emission
Output coupler T = 1% - RC = 12 mm PL = 17 mW (pump limited) T = 280 K 0 5 10 15 20 0 50 100 150Incident Pump Power (mW)
O u tp u t P o w er ( mW ) 850.5 851.0 851.5 852.0 852.5 W av ele n g th (n m ) 0 1 2 3 4 5 F P s ig n a l (V ) FSR = 37.5 GHz
Scanning Fabry-Perot spectrum
• Single frequency operation without intracavity λ-selective element :
checked with a high Finesse (F = 130) 37.5-GHz-FSR scanning Fabry-Perot SMSR > 25 dB tSM " TC # FSR $ % & ' ( ) 2 " 1ms
Single-mode spectrum in for Lext = 10 mm
Jacquemet et al, App.Phys. B (2006)
TC = photon lifetime (~ 10 ns) Γ = gain bandwidth (~ 10 nm)
With
With
an intracavity
an intracavity
etalon
etalon
Output coupler T = 1% - RC = 12 mm
• Increased losses at θ ≠ 0° ⇒ laser power : P = 7 mW @ 852.14 nm
etalon
25-µm thick (≅ 9 nm FSR) silica etalon
⇒ λ independent of operating conditions (T°, PP) + improved long-term stability
10-4 10-3 10-2 10-1 1 840 845 850 855 860 Wavelength (nm) λ = 852.14 nm (Cs) 9 nm
Single-frequency tunability
Single-frequency tunability
• more than 15 GHz continuous tunability (without mode-hops)
by translating the external cavity mirror with PZT
Output coupler T = 1% - RC = 12 mm
Frequency-shift measurement with a low-finesse static 1.5-GHz-FSR Fabry-Perot etalon
⇒ Tuning over the Cs-absorption spectrum (9 GHz)
0
-5 +5
Laser frequency shift (GHz)
P h o to d et ec te d s ig n al Cs absorption 1.5 GHz > 15 GHz FP transmision
Extended-cavity laser diode Δν = 130 kHz PD
Beat-note set-up
Beat-note set-up
Stabilization of the laser frequency
- at side of a Doppler-free Cesium line (5 MHz FWHM)
- on PZT voltage - 2-stage integration electronics - low-frequency servo loop (F < 2 kHz)
OP-VECSEL G PD Cs cell Fast photodiode RF analyzer 10-11 10-9 10-7 S δV ( V /H z 1 /2 )
With low-frequency gain
With optimized gain
10-5
Extended-cavity laser diode Δν1/2 = 130 kHz ΔνL = 15 kHz PD
Linewidth measurement
Linewidth measurement
• FWHM linewidth ≅ 500 kHz : low-frequency noise contribution
• Lorentzian linewidth ≅ 70 kHz related to white noise floor RBW = 10 kHz SW. T = 10 ms AVE = 10 OP-VECSEL PD Cs cell Fast photodiode RF analyzer
Towards higher
Towards higher
power
power
…
…
T = 1.1 % External Mirror
HR @ 852 nm R = -100 mm
WP = 40 µm
• 330 mW at PP = 1.1 W
⇒ Thermal-limited output power
⇒ High output power on a GaAs substrate
G aA
s
λ = 855 nm (Δλ ≅ 1 nm)
Laser Diode Pump 5 W @ 690nm Ø = 100 µm 450 mW under QCW pumping 100 200 300 400 O u tp u t P o w er ( mW ) 845 850 855 860 W av el en g th ( n m ) T = 273 K ηext = 36% Ith ≅ 3.2 kW/cm2
• Single transverse mode
Silica etalon • 120 mW single-frequency tS = 350 µm H E A TS IN K
Conclusion
Conclusion
– Design & fabrication of a AlGaAs/GaAs structure at λ = 852 nm optimized for low power/high efficiency operation
7 QWs
low threshold Ith ≤ 4 kW/cm2
– Single-frequency operation in a simple linear cavity
without λ-selective element : 17 mW with a 25-µm thick etalon : 7 mW
– Validation on a Cs atomic line
>15 GHz continuous tunability
frequency lock-in on an absolute reference (atomic line) comparison with an independent laser source : ΔνL = 500 kHz (-3dB / 10 ms sweep time)
– Increase of the single-frequency power under high power pumping
120 mW without specific thermal management
(GaAs substrate, no intracavity heatspreader)
⇒ evaluation of the spectral properties
+ thermal management for power scaling
at 852.14 nm Specifications alreadyadequate for optical
detection in atomic clocks