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ASYMMETRIC SHUBNIKOV-DE HAAS OSCILLATIONS AND HALL PLATEAUS OF HETEROJUNCTIONS IN THE QUANTUM HALL

REGIME

R. Gerhardts, R. Haug, K. Ploog

To cite this version:

R. Gerhardts, R. Haug, K. Ploog. ASYMMETRIC SHUBNIKOV-DE HAAS OSCILLATIONS AND HALL PLATEAUS OF HETEROJUNCTIONS IN THE QUANTUM HALL REGIME. Journal de Physique Colloques, 1987, 48 (C5), pp.C5-227-C5-230. �10.1051/jphyscol:1987547�. �jpa-00226751�

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JOURNAL DE PHYSIQUE

Colloque C5, suppl6ment au noll, Tome 48, novembre 1987

ASYMMETRIC SHUBNIKOV-DE HAAS OSCILLATIONS AND HALL PLATEAUS OF HETEROJUNCTIONS IN THE QUANTUM HALL REGIME

R.R. GERHARDTS, R.J. HAUG AND K. PLOOG

Max-Planck-Institut fur Festktirperforschung, Heisenbergstr. 1, D-7000 Stuttgart 80, F.R.G.

Nous avons observe, sur des heterojunctions GaAs-AlGaAs dopees en Be et en Si, des deplacements importants et de sens oppose de la position des plateaux de la resis- tance de Hall. Nous presentons un calcul de transport au niveau microscopique, base sur lfapproximation self-consistent de la matrice T, qui explique les deplacements en terme d'interaction electron-impurete non-Bornienne.

We present experimental results on Be-doped and Si-doped GaAwAlGaAs heterostruc- tures which show strong and opposite shifts of the quantum Hall plateaus. We also present a microscopic transport calculation based on the self-consistent T-matrix approximation, which explains these shifts in terms of strong, non-Bornian scatter- ing of electrons by individual impurities.

The concentration and distribution of impurities determines the low temperature transport properties of a two-dimensional electron gas (ZDEG) in a semiconductor.

Even the quantum Hall effect (QHE) [I], which is famous for its universality, is strongly influenced by impurities. Although the observed plateau values of the Hall resistance are sample-independent, the very occurrence and the width of the plateaus are attributed to localized electron states in the fluctuating potential due to randomly distributed impurities. Plots of the Hall resistance pxy versus magnetic field B show, that not only the width of the plateaus depends on the impurities in the s a m ~ l e , . , but also their vosition with resvect to the classical free electron result piy = &ens, where e' is the elementary charge and nS the area density of the PDEG.

However, only a few systematic investigations of the effects of the impurity distribution on density of states (DOS) and magnetotransport properties of the EDEG have been published. For Si-MOSFETs with driftable ~ a + ions in the oxide, the depen- dence of width and position of the Hall plateaus on the oxide charge was studied [PI. For high mobility GaAl/AlGaAs heterostructures, Haug et al. [3] investigated the effect of a backgate voltage, which changes the mean position of the ZDEG and thus the effective interaction with donors in the AlGaAs and acceptors in the GaAs.

In both cases the experimental results could be qualitatively explained by the as- sumption that attractive impurities lead to an asymmetric broadening of Landau levels (LLs), with localized states on the low-energy side [PI, whereas repulsive impurities tend to produce localized states on the high-energy side. The assumption of an asymmetric level broadening is consistent with exact results for the effect of repulsive 6-potentials on the lowest LL [ d l . Exact results about localization of these states and a reliable magnetotransport theory including localization effects and covering both the plateau regimes and the dissipative regions between plateaus do, however, not exist.

In the present paper we report on new experimental results for selectively doped GaAs/AlGaAs heterostructures. The drastic and opposite effects obtained for doping with donors and with acceptors, respectively, are explained by a microscopic trans- port calculation within the self-consistent T-matrix approximation (STMA) [ 5 ] which is equivalent with the so-called single-site approximation [ 6 , 7 ] . This calculation neglects coherent multi-center scattering processes, which may lead to localization [8], but treats exactly the scattering by individual impurities.

The investigated samples were prepared from modulation-doped heterostructures grown by molecular beam epitaxy. On top of 2 urn nominally undoped GaAs, a 21 nm

Article published online by EDP Sciences and available at http://dx.doi.org/10.1051/jphyscol:1987547

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C5-228 JOURNAL DE PHYSIQUE

undoped AlGaAs spacer layer was grown, followed by 4 0 nm Si-doped AlGaAs. During the growth process a single layer in the GaAs, 2 nm below its interface with the spacer, was selectively doped with either Si which acts as donor, or Be which acts as accep- tor. In the following we mean the doping in this layer, if we refer t o the Si-dop or ge-doped samples. The highest do ing was with an impurity density of n i = 4.10

B f8

cm- , leading t o a mobility of 3.10 cm2/vs at 4 K, more than an order of magnitude less than the mobility of a reference sample without the layer doping. Hall bridge specimen of 100 prn width were used to measure longitudinal resistivity px and Hall resistance p for different temperatures down t o 1.4 K in a magnetic fiefd perpen- dicular t o tf% ZDEG. Fig. 1 shows results for a Be-doped sample. The thin straight line in icat s the classical result for the Hall effect, pE = B/ens, for ns = 2.1-10'' c ~ ' as determined from the minima of pxx ( 0 ) at evh-integer filling fac- tors v = hn /eB > 2. We want t o emphasize the remarkable result that for large values o f tEe magnetic field, the measured p values fall below the classical line so that the plateau with the value px = h/ezY= 25,813 $2 does not cross the classi- cal line, which assumes this value fof v = 1, corresponding t o B = 8.5 T. The fill- ing factor is less than unity in the whole plateau region and becomes v = 0.83 near its center, where p for the lowest temperatures has a minimum owing t o the resolv- ed spin-splitting o f the lowest LL. Fig. 2 shows the corresponding results for a Si-doped sample, where similar shifts to smaller 0-values, i.e., larger filling factors are observed.

Since the observed shifts are different for attractive ( ~ i + ) and repulsive (Be-) impurities and persist at high temperatures where the QHE is no longer observed, a theoretical explanation must certainly go beyond the lowest order Born approxima- tion, but a sophisticated treatment of localization seems not important for a quali- tative understanding of the effect. We thus performed model calculations within the STMA. We replaced the Coulomb potentials in a distance Z,, from the 2DEG by a two- dimensional 6-potential with strength U adjusted to an appropriate expectation val- ue of the Coulomb potential. For a given distance U Z,,, the potentials are assumed randomly distributed with area density n,, and described by scattering amplitudes C5,91

with

where E N = .%wc ( N + 3) is a Landau energy. The self-energy of the averaged one particle Green's function is

l(E) = &(El - 3 P(E) = 1 n,,t,,(E). (3) Eqs. (1)-(3) are solved self-consistently for a suitable set of parameters P (Z,, n )

' P modelling the impurity distribution. Isolated bands are obtained which lead t o a strongly asymmetric broadening o f the Landau levels. For 6-potentials, the Kubo formulas for the conductivities can be written as [5]

o

,,, = / dE a,,,(E) (-df/dE), with f(E) the Fermifunction,

and where

( E-A )fiw

"X(E"+'.".* i - -

i s the integrated density of states. The correction

6oyx(E) = &. 1 n, i (o,(-m) - @,,(El + 3 sin 2 @ v ( E l )

"c v

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Fis. 1 Measured longitudinal resistivity Fis. 2 As in fig. 1 t f r a Si-doped pxx and Hall resistance p sample ith n = 4.10P8cm-' and ns = tic field for a Be-doped ~{~";:;i~~::'~; 3.4.101rcm-2 i ~ t B = I T the f i l h n g sample at three temperatures a s indi- factor is v = 2.

cated. The thin straight lin in icates p,O = B/en for ns = 2.1-101Fsiq. ~t B = 8.8 T the filling factor is v = 1.

Fiq. 3 Calculated conductivities oxx . (heavy broken line) and oyx (heavy solid line) in units of e2/h vs ener- gy in the region of the N=i Lanaau level for 8 ~ 3 . 8 T. The thin broken line gives the filling factor v(E)=(h/eB)n(E) and the thin solid line the density of states in arbitrary units. A donor-doped sample is considered

Fis. 4 Calculated resistivity vs magne- tic fi d f r two model samples with n g 2.S.10f'cm-' which differ only by the additional doping with attractive (solid lines) or repulsive (dash-dottefoliny) potentials of density n i . = 2 - 1 0 cm- .

The thin dashed line indicates p:y.

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JOURNAL DE PHYSIQUE

to the Drude-type relation between o and o depends on the exact scattering phases and vanishes in the lowest orier BornY;pproximation. Wit r(E)<<fiwc, eq.(5) yields for the maxima of oxx(E) the values ( e /h)(ZN+l)/n. If 9 E - A(E) = eN and E is

in a gap between impurity bands and LL3, and satisfies s < E < sN, then the equations I'(E)=ox (E)=O and 0 (E)=N e /h hold exactly [Yi!

Numerical resufts for the @s, n(E), oxx!E) and o for one spin in the16eglqn of the LL with N=l are shown in fig. 3. Doping with aonors of density ni=2.10 cm producesthe impurity band at low energies. The main LL is broadened and shifted below the expected 9.9 me by emote donors assumed in two layers beyond he s acer, with total density 4.5-10Y1ci'. Residual acceptors of total density l.1Of0ciq are assumed in two planes. Those of one plane lead to the small impurity band near 10.3 meV. This merges with the impurity band due t o doping, if we dope with accep- tors instead of donors and keep all other parameters fixed. In order t o compare with the experiments, we have calculated the conductivities for fixed density ns as func- tions of the magnetic field. Furthermore, we have included the enhancement of spin- splitting by many-body effects [lo] by the simple interpolation formula [Ill

for the effective Land6 factor g*, where vB and aB are the effective Bohr magneton and radius, respectively, g = 0.4 and Ex, = 12 meV is a,fit parameter. Since the density n ( n + ) of spin up ?down) electrons depends on g , spin splitting is calcu- lated selj-consistently with the DOS for one spin calculated from the STMA.

The two calculations presented in fig. 4 differ only by the sign of the impurity potentials use t o escribe the intentional doping. For a realistic density of im- purities (2.10p0cm-$1 shifts are obtained in qualitative agreement with experiments.

The fine structure of the curves is determined by the impurity bands. For the ac- ceptor (donor) doped case, the peak of pxx with maximum at B = 5.3 T (4.7 T ) is due to impurity states at the Fermi level. Both spin directions contribute t o these peaks, although the spin-splitting of the main LLs is resolved in the calculation.

If localization could be taken into account in the transport calculation, one would expect the states in the region of impurity bands to be localized. Then pxx.would vanish where the STMA yields the peaks owing t o impurity band states. Ignoring de- tails of the impurity band structure and taking the impurity bands as a rough indi- cation for the position of localized states, we can explain the essential features of the experiments. The asymmetric broadening o f the LLs due to the strong non- Bornian scattering leads to the observed shifts. Near filling factor v=l (B=10.3 T), extended states of one spin direction overlap with 'localized' states of the other spin direction. This is the reason why in both cases considered the plateaus do not reach the classical straight line.

We also performed calculations for higher temperatures, where the QHE is no longer observed. In agreement with experiments, we found that the shift of the px -

versus-B-curves with respect t o the classical result persists. This indicates that an exact treatment of localization is not essential for the understanding of the asymmetries and supports our approach.

References

1 K.v.Klitzi,ng, G. Dorda, and M. Pepper, Phys.Rev.Lett. 45, 494 (1980) 2 J.E. Furneaux and T.L. Reinecke, Phys.Rev. 833, 6897 (1986)

3 R.J. Haug, K.v.Klitzing, and K. Ploog, Phys.Rev. 835, 5933 (1987)

4 E. Brgzin, D.J. Gross, and C. Itzykson, Nucl.Phys. 0% [FSll], 24 (1984) 5 R.R. Gerhardts, Z.Physik 822, 327 (1975)

6 T. Ando, J.Phys.Soc.Jpn. 36, 1521 (1974)

7 T . Ando, Y. Matsumoto, and Y. Uemura, J.Phys.Soc.Jpn. 39, 279 (1975)

8 Y . Ono, J.Phys.Soc.Jpn. 5 l , 3544 (1982); 53, 2342 (1984)

9 W. Wiertz and R.R. Gerhardts, Z.Physik 825, 19 (1976) 10 T. Ando and Y. Uemura, J.Phys.Soc.Jpn. 37, 1044 (1974)

11 Th. Englert, D.C. Tsui, A.C. Gossard, and Ch. Uihlein, Surf.Sci. 113, 295

( 1982)

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