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THE LOCAL STRUCTURE OF a-SiOx : H FILMS
G. Greaves, X. Jiang, R. Jenkins, E. Holzenkampfer, S. Kalbitzer
To cite this version:
G. Greaves, X. Jiang, R. Jenkins, E. Holzenkampfer, S. Kalbitzer. THE LOCAL STRUC- TURE OF a-SiOx : H FILMS. Journal de Physique Colloques, 1986, 47 (C8), pp.C8-853-C8-856.
�10.1051/jphyscol:19868164�. �jpa-00226068�
JOURNAL DE PHYSIQUE
Colloque C8, suppl6ment au n o 12, Tome 47, decembre 1986
THE LOCAL STRUCTURE OF a - S i 0 x : H FILMS
G.N. GREAVES, X.L. JIANG, R.N. JENKINS, E. HOLZENKAMPFER" and S. KALBITZER*
SERC, Daresbury Laboratory, GB-Warrington W A 4 4AD, Great-Britain
" ~ e p a r t m e n t of Physics, University of Marburg, 0 - 3 5 5 0 Marburg, F.R.G.
ax-~lanck-~nstitut fiir Kernphysik, 0 - 6 9 0 0 Heidelberg, F.R.G.
A b s t r a c t . - The S i K-edge
EXAFSof t h i n f i l m s of amorphous hydrogenated s i l i c o n oxide r a n g i n g from S i t o S i O l e 7 have been measured. A n a l y s i s o f the S i - S i and Si-0 p a i r d i s t r i b u t i o n f u n c t i o n s r e v e a l s s i g n i f i c a n t bond l e n g t h changes w i t h oxygen c o n c e n t r a t i o n . Films of i n t e r m e d i a t e composition ( e . g . SiO) d i s p l a y c o n s i d e r a b l e d i s o r d e r i n t h e n e a r e s t neighbour S i environment.
Both f a c t s g i v e c l e a r evidence f o r random bonding i n t h e s e amorphous s i l i c o n o x i d e s .
I n t r o d u c t i o n
The amorphous s i l i c o n oxide system, a-SiO , i s p a r t i c u l a r l y i n t e r e s t i n g in t h a t it
X
o f f e r s a v a r i a b l e bandgap semiconductor ranging from 1.7 eV ( a - S i ) t o 9 eV (a-Si02).
Moreover it models t h e i n t e r f a c e between c r y s t a l l i n e s i l i c o n and amorphous s i l i c o n d i o x i d e i n MOST devices. The o p t i c a l p r o p e r t i e s of evaporated a-SiO f i l m s were
X
o r i g i n a l l y i n v e s t i g a t e d by P h i l i p p ( 1 ) . These r e s u l t s were confirmed by
Holzenkampfer e t a l . ( 2 ) who s t u d i e d them i n c o n j u n c t i o n w i t h t h e ESR p r o p e r t i e s . These a u t h o r s have shown t h a t t h e e l e c t r o n i c and d e f e c t p r o p e r t i e s of a-SiO f i l m s
X
can be i n t e r p r e t e d i n terms of s t r u c t u r e s which a r e randomly bonded. I n t h i s t y p e of model s i l i c o n atoms can adopt t h e t e t r a h e d r a l c o n f i g u r a t i o n s S i ( S i 3 0 ) , S i ( S i 2 0 2 ) and S i ( S i 0 3
)a s w e l l a s t h e chemically ordered s i t e s Si(Si,,
)and Si(O,,) c h a r a c t e r - i s t i c of s i l i c o n and s i l i c a . By c o n t r a s t t h e i n t e r m e d i a t e oxide SiO has been well- s t u d i e d by a wide v a r i e t y of techniques - n o t a b l y X-ray ( 3 ) and neutron (4) d i f f r a c - t i o n , (MAS )NMR ( 5 ) and XPS and XANES ( 6 ) . For s i l i c o n m n o x i d e a mixture model has been proposed comprising 5 t o 10 a r e g i o n s of o r d e r e d s i l i c o n and s i l i c a ( 3 ) . Bulk SiO, however, i s commonly used, and a s t h i s i s p r e p a r e d by s i n t e r i n g s i l i c o n and s i l i c a it might be expected t o be microphase s e p a r a t e d . I n any event p r i o r t o t h e p r e s e n t s t u d y c o n c l u s i v e evidence f o r random bonding i n a-SiO f i l m s i n c l u d i n g SiO
X
was n o t forthcoming.
Measurements and A n a l y s i s
I n an e f f o r t t o r e s o l v e t h e controversy between t h e random bonding and mixture
models we have measured t h e S i K-edge EXAFS of t h i n f i l m s of hydrogenated s i l i c o n
Article published online by EDP Sciences and available at http://dx.doi.org/10.1051/jphyscol:19868164
C8-85 4 JOURNAL DE PHYSIQUE
I . . . . I . .
1-
a, U C
n
0b n
V)u
0
Fig.
1XANES of a-SiOx:H f i l m s
Fig. 2
EXAFS of s i l i c o n monoxide:
experiment
( - )and theory
(...)oxide. The f i l m s were prepared by r . f . glow discharge from mixtures of s i l a n e and n i t r o u s oxide and deposited on s u b s t r a t e s of Be f o i l held a t 2700C. Sputtered amorphous s i l i c o n and s i l i c a were used a s model compounds. The chemical composition of t h e samples were measured using Rutherford b a c k s c a t t e r i n g (0 c o n t e n t ) and y-ray a n a l y s i s of t h e
l5EJ+ p r e a c t i o n (H c o n t e n t )
(7 ) . Room temperature S i K-edge EXAFS s p e c t r a were obtained i n txansmission a t
WWREu s i n g t h e ACO s t o r a g e r i n g and a KAP monochromator. The r a p i d curved wave theory was used f o r a n a l y s i s ( 8 ) with phase s h i f t s taken from t h e SRS EXAFS Data Bank (9). These were s l i g h t l y adjusted t o p r e c i s e l y f i t t h e t e t r a h e d r a l coordination and bond l e n g t h s of t h e model s t r u c t u r e s v i z S i - 0 1.62 a and Si-Si 2.35 8 . The non-structural EXAFS parameters included a quantum e f f i c i e n c y f a c t o r of 0.8 and a photoelectron imaginary self-energy of 2.7 eV. To account f o r t h e considerable d i f f e r e n c e s i n t h e e l e c t r o n i c s t r u c t u r e of Si-O and Si-Si bonds, two energy zeros were used - 16 eV f o r Si-O d i s t r i b u t i o n s and 7 eV f o r Si-Si a s t r i b u t i o n s . These were chosen to match t h e d i f f e r e n c e i n energy gap between s i l i c a and s i l i c o n . Figure
1shows t h e XANES f o r t h r e e of t h e f i l m s c l e a r l y i n d i c a t i n g t h e s i z a b l e chemical s h i f t across t h e s i l i c o n oxide system. I n t h e same vein, two c e n t r a l atom phase s h i f t s were employed - one f o r s i l i c a ( c o n t a i n i n g a Madelung c o r r e c t i o n ) and one f o r s i l i c o n (comprising n e u t r a l atoms).
The Si-O and Si-Si p a i r d i s t r i b u t i o n f u n c t i o n s f o r t h e f i l m s were analysed s e p a r a t e -
l y from F o u r i e r - f i l t e r e d spectra. Results f o r intermediate oxides were checked by
analysing t h e complete n e a r e s t neighbour r a d i a l d i s t r i b u t i o n function of s i l i c o n ;
t a k i n g values f o r c e n t r a l atom phase s h i f t s and energy zeros by weighting t h o s e of
S i and Si02 according t o composition. Figure 2 shows t h e comparison between experi-
ment and theory f o r a f i l m of s i l i c o n mnoxide. Both approaches yielded almost
i d e n t i c a l r e s u l t s .
Results and Discussion
W h i l s t s p e c t r a f o r hydrogenated and s p u t t e r e d amorphous s i l i c o n were almost t h e same, t h e smaller coordination numbers of t h e hydrogenated f i l m (3.9 compared t o 4.0) meant t h e s p u t t e r e d f i l m was s l i g h t l y more disordered. For convenience t h e EXAFS ~ebye-Waller f a c t o r s f o r t h e s i l i c o n r i c h and oxygen r i c h ends of t h e system were f i x e d a t t h e common value of 0.0053 f12. The coordination numbers f o r oxygen and s i l i c o n were taken from t h e chemical a n a l y s i s . Hydrogen d e f e c t s were presumed t o be mnohydrides r a t h e r than dihydrides which is expected f o r t h e s u b s t r a t e temperature employed i n deposition
(10
).
W e found oxygen and s i l i c o n bond lengths v a r i e d w i t h t h e concentration of oxygen,
x.T h i s i s shown i n f i g . 3 ( a ) where S i 4 bonds decrease from 1.69 fl t o
1.62 fl and Si-Si bonds i n c r e a s e from 2.35 t o 2.49 fl a s x i n c r e a s e s . This i s p r e c i s e l y t h e behaviour expected i f t h e s t r u c t u r e s a r e randomly bonded. I f on t h e o t h e r hand t h e s t r u c t u r e s were comprised simply of mixtures of s i l i c o n and s i l i c a , no change would be expected. The gradual incorporation of oxygen i n t o t h e n e a r e s t neighbour environment of s i l i c o n w i l l i n c r e a s e t h e charge on s i l i c o n s causing them t o r e p e l one another but i n c r e a s i n g t h e i r a t t r a c t i o n t o oxygens. Suppose P i s t h e
n p r o b a b i l i t y of f i n d i n g t h e c o n f i g u r a t i o n S i ( S i 0
)i n a randomly bonded s t r u c t u r e
n 4-n
- n running from 0 t o 4. I f R and r a r e t h e i n d i v i d u a l bond lengths of Si-O and n
Si-Si r e s p e c t i v e l y f o r t h a t c o n f i g u r a t i o n , t h e s e can be deduced from t h e measured average bond lengths and ; given i n f i g . 3 ( a ) , viz.
2 (4-n) PnRn - C n P n r n -
R =
r =
2x 4 ( 1 - x/2)
S i - S i