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NMR AND ESR STUDIES ON ANNEALING EFFECTS IN a-Si : F : H AND a-Si : H
S. Ueda, M. Kumeda, T. Shimizu
To cite this version:
S. Ueda, M. Kumeda, T. Shimizu. NMR AND ESR STUDIES ON ANNEALING EFFECTS IN a-Si : F : H AND a-Si : H. Journal de Physique Colloques, 1981, 42 (C4), pp.C4-729-C4-732.
�10.1051/jphyscol:19814159�. �jpa-00220782�
JOURNAL DE PHYSIQUE
CoZZoque C4, suppZ6ment au nO1O, Tome 42, octobre 1981 page C4-729
NMR AND ESR STUDIES ON ANNEALING EFFECTS IN a-Si:F:H AND a-Si:H
S. Ueda, ?l. Kumeda and T. Shimizu
DeparLment of EZectronics, Kanazma University, Kanazawa 920, Japan
Abstract.- Measurezents of N1.Z of F in a-Si:F:H and a-Si:F have been carried out and the results are compared with those of H in a-Si:F:H and a-Si:lt.
Effects of motional narrowing on the linewidth of F NIIR in a-Si:F:H show that some fraction of F is incorporated in the form of SiF, or (SiF2)n which tends to move easily. Xhen samples are annealed, the increase in the ESR center density is remarkable in a-Si:F:H and a-Si:H corresponding to the decrease in the H content, but the increase in the ESR center density is rather small in hydrogen free a-Si:F.
Introduction.- Investigations of H and/or F incorporation scheme and their distri- butions in a-Si are inportant in order to know the mechanism of reducing the densi- ty of defects. Nl!R is a very powerful technique for such investigations in con- junction with IR measurements. N t T measurements of H in a-Si:H have already been carried out by several workers, and interesting informations have been obtained(1
-
31. Kere, we kill report for the first tine the results of N1R measurenents of F in a-Si:T:l: and a-Si:F and compare them with the results of H in a-Si:H and a-Si:F:K. In order to study the relation betgeen incorporated H and/or F and de- fects, we have also measured ESR for the same samples. Especially, we have inves- tigated how the results of NI!R and ESP, change with annealing. As a result, we have found interesting difference between the effects of H and F. Ke also found for some cases the narrowinp, of NMP. lines by raising a measurement temperature. To our knowledge this is also the first report of ESR for fluorinated a-Si. A part of the present work was already published[4].
Experimental.- a-Si:H and a-Si:F films uere prepared by rf sputtering and a-Si:F:H films were prepared by dc glow discharge. Preparation conditions are briefly sum- marized in Table 1. All samples were prepared on aluminium foils which were dis- solved off before measurenents. NMR measurenents were performed with a pulse NER
spectrometer at 16 Eniz at 4.2 K, 77 K and room temperature. The free induction decay (FID) following a 90° pulse were averaged by computer accumulation and Fourier-transformed. ESR measurements were performed with a JEOL PE 3X spectrome- ter at room temperature. MIR and ESR measurements were made for the same sample after each step of isochronal annealing for 1 h in a vacuum of < Torr.
Table I. sample preparation COndltlOnS
Results.- The NPIR spectra of H in either a-Si:H or a-Si:F:H at 77 K can be decom- posed into a broad Gaussian line and a narrow Lorentzian line in agreement with the
a-Si:F:H
dc glow discharge SiF4
+
H21.0 Torr 12.5 % H2 300°C a-Si:F
rf sputtering Ar
+
SiF4 0.04 Torr 6 % SiF, 350°C Preparation methodGas
Gas pressure Gas fraction
Substrate temperature
a-Si:H
rf sputtering Ar
+
H20.11 Torr 40 % H2 water cooled
Article published online by EDP Sciences and available at http://dx.doi.org/10.1051/jphyscol:19814159
C4-730 JOURNAL DE PHYSIQUE
p r e v i o u s w o r k s [ l , 21. The NMR s p e c t r a o f F a t 77 K i n a - S i : F a r e a l s o composed o f t h e two c o m p o n e n t s , b u t t h o s e i n a-Si:F:H h a v e n o n a r r o w component ( l e s s t h a n s e v - e r a l % o f t h e b r o a d component i n t h e i n t e n s i t y r a t i o ) . The c o n t e n t s o f H and F c o n t r i b u t i n g t o t h e component l i n e s a r e shown i n T a b l e 2 t o g e t h e r w i t h t h e NH'R l i n e w i d t h s .
C h a n g e s w i t h a n n e a l i n g o f H c o n t e n t s o b t a i n e d from NMR a t 77 K a r e shown i n F i g . 1. The H c o n t e n t c o n t r i b u t i n g t o t h e b r o a d l i n e d e c r e a s e s w i t h a n n e a l i n g t e m p e r a t u r e f a s t e r t h a n t h a t c o n t r i b u t i n g t o t h e n a r r o w l i n e . Changes w i t h a n n e a l - i n g o f F c o n t e n t s o b t a i n e d from NMR a t 77 K a r e shown i n F i g . 2. A n a r r o w l i n e a p p e a r s a n d i n c r e a s e s i n F s p e c t r a o f a-Si:F:H by a n n e a l i n g a b o v e 450°C, b u t t h e t o t a l F c o n t e n t d o e s n o t c h a n g e w i t h a n n e a l i n g . The F NMR s p e c t r a i n a - S i : F d o e s n o t a p p r e c i a b l y c h a n g e w i t h a n n e a l i n g . F i g u r e 3 shows t h e t e m p e r a t u r e d e p e n d e n c e o f XMR l i n e w i d t h s .
Changes w i t h a n n e a l i n g o f t h e c e n t e r d e n s i t i e s o f t h e ESR s i g n a l d u e t o d a n g l - i n g b o n d s a r e shown i n F i g . 4 . I n a-Si:H a n d a-Si:F:H, t h e ESR c e n t e r d e n s i t y i n - c r e a s e s by two o r d e r s of m a g n i t u d e by a n n e a l i n g . I n a - S i : F , however, t h e i n c r e a s e i s n o t s o p r o m i n e n t .
T a b l e 2. 11 a n d F c o n t e n t s c o n t r i b u t i n g t o t h e b r o a d and n a r r o w Nt!R l i n e s a t 77 K i n a s - d e p o s i t e d f i l m s . F u l l w i d t h h a l f maximum (FIJHEI) o f t h e s e l i n e s a r e shown i n p a r e n t h e s e s .
D i s c u s s i o n . - The o r i g i n o f t h e b r o a d and n a r r o w l i n e s o f H NNR s p e c t r a i n a-Si:H h a s b e e n d i s c u s s e d by s e v e r a l a u t h o r s , a n d t h e n a r r o w l i n e i s c o n s i d e r e d t o o r i g i - n a t e from H d i s p e r s e d i n t h e form o f s i l i c o n m o n o h y d r i d e (SiH) and t h e b r o a d l i n e from c l o s e l y g a t h e r e d H [ 3 , 5, 61. The c o n s i d e r a t i o n i s b a s e d on t h e f a c t t h a t m o t i o n a l n a r r o w i n g is n o t a m a j o r f a c t o r i n t h e l i n e w i d t h d e t e r m i n a t i o n and temper- a t u r e i n d e p e n d e n t l i n e w i d t h i s d o m i n a t e d by d i p o l a r i n t e r a c t i o n .
annealing temperature ( O C ) annealing temperature ( O C ) F c o n t e n t ( a t . % ) b r o a d (>WH:.kIiz) narrow(FWHK,kHz) - -
1 3 . 6 ( 2 3 . 2 ) -
1 2 . 4 ( 2 2 . 0 ) 4 . 4 ( 8 . 0 ) a-Si:H
a-Si:F:H a - S i : F
F i g . 1. Changes w i t h a n n e a l i n g o f H F i g . 2. Changes w i t h a n n e a l i n g of F c o n t e n t s i n a-Si:H and a-Si:F:H ob- c o n t e n t s i n a - S i : F and a-Si:F:H ob- t a i n e d from KMR a t 77 K. t a i n e d from NFR a t 7 7 K .
H c o n t e n t ( a t . %)
b r o a d (FWHE1,kHz) narrow(Fk'til.'.kHz) 2 0 . 9 ( 2 4 . 0 ) 1.1 ( 3 . 5 ) 1 2 . 2 ( 2 3 . 4 ) 2.4 ( 5 . 3 )
- -
I n t h e p r e s e n t c a s e , however, t h e l i n e w i d t h s o f H a n d F P E R w e r e f o u n d t o c h a n g e i n some c a s e s w i t h t e m p e r a t u r e a s shown i n F i g . 3 . E s p e c i a l l y , F NMR s p e c t r a i n a-Si:F:H a n n e a l e d a t 600°C e x h i b i t t h e p r o m i n e n t t e m p e r a t u r e d e p e n d e n c e : The s p e c t r u m a t 4.2 K i s a s i n g l e b r o a d l i n e , t h a t a t 77 K is a s u p e r p o s i t i o n o f a b r o a d a n d a n a r r o w l i n e s and t h a t a t room t e m p e r a t u r e is a s i n g l e n a r r o w l i n e . Hence, t h e n a r r o w l i n e i n t h i s c a s e s h o u l d b e m o t i o n a l n a r r o w e d o n e , and i s c o n s i d - e r e d t o o r i g i n a t e from F which i s e a s y L O move and n o t f r o m d i s p e r s e d F. F WIR s p e c t r u m i n a s - d e p o s i t e d a-Si:F:H a l s o e x h i b i t s t h e e f f e c t o f m o t i o n a l n a r r o w i n g a l t h o u g h t h e e f f e c t i s n o t s o p r o m i n e n t . T h e s e f a c t s s u g g e s t t h a t F i n a - S i : F : l i t a k e s m o v a b l e f o r m s w i t h d i f f e r e n t d e g r e e s of f e a s ' b i l i t y f o r movement. The i n f r a - r e d a b s o r p t i o n peak a t 1 0 1 0 cm-' i n f l u o r i n a t e d a - S i i s a t t r i b u t e d t o S i F 4 [ 7 ] o r ( S i F 2 2 , La] g r o u p s . T h e s e g r o u p s may b e e a s y t o m o v e t o c a u s e t h e m o t i o n a l n a r r o w i n g . S i n c e t h e a n n e a l i n g i s known t o i n c r e a s e t h e i n f r a r e d a b s o r p t i o n p e a k a t 1 0 1 0 cm-' f o r a - S i : F : l i [ 7 ] , i t i s r e a s o n a b l e t h a t t h e n a r r o w i n g e f f e c t i s more p r o m i n e n t i n t h e a n n e a l e d f i l m s . The l i n e w i d t h s o f F
m 3
a t 4 . 2 K , which w i l l b e f r e e from no- t i o n a l n a r r o w i n g , c o i n c i d e f o r a s - d e p o s i t e d and a n n e a l e d a-Si:F:H. The f a c t shows t h a t t h e d i p o l a r i n t e r a c t i o n r e m a i n s unchanged a f t e r H e v o l v e s by a n n e a l i n g , w h i c h i n d i c a t e s t h a t t h e d i p o l a r i n t e r a c t i o n b e t w e e n F a n d H d o e s n o t c o n t r i b u t e t o t h e l i n e w i d t h ofr
dKR. T h e r e f o r e , F a n d H a r e c o n s i d e r e d n o t t o b e l o c a t e d c l o s e l y i n a - S i : F : l i .F NMK s p e c t r a i n a - S i : F d o n o t e x h i b i t t h e m o t i o n a l n a r r o w i n g e f f e c t as shown i n F i g . 3 i n s p i t e o f t h e p r e s e n c e o f a l a r g e amount of S i F 4 o r ( S i F 2 ) , , j u d g i n g from t h e i n f r a r e d a b s o r p t i o n s p e c t r a [ 9 ] . T h e r e f o r e , i t i s s p e c u l a t e d t h a t t h e r e e x i s t S i F 4 o r (SiF2),, g r o u p s which a r e e a s y t o move and t h o s e which a r e n o t e a s y t o move d e p e n d i n g on t h e e n v i r o n m e n t . The i n v a r i a n c e o f t h e F EMR s p e c t r u m f o r a - S i : F w i t h a n n e a l i n g i s c o n s i s t e n t w i t h t h e f a c t t h a t t h e i n f r a r e d a b s o r p t i o n s p e c t r u m d o e s n o t a p p r e c i a b l y c h a n g e w i t h a n n e a l i n g [ l O ] . S i n c e b o t h t h e F NE!R a n d i n f r a r e d a b s o r p t i o n s p e c t r a f o r a-Si:F:K c h a n g e a t t e m p e r a t u r e a t which H e v o l v e s , t h e move- ment of H a t o m s is c o n s i d e r e d t o s t i m u l a t e t h e c h a n g e of F i n c o r p o r a t i o n scheme.
H NP% l i n e w i d t h f o r a-Si:F:H h a s o n l y a s m a l l e f f e c t o f n a r r o w i n g e v e n a t room t e m p e r a t u r e p r e s u m a b l y b e c a u s e t h e f i l m d o e s n o t c o n t a i n a n a p p r e c i a b l e amount o f H
10
l a - S i : ~ : ~ a s d e p . lA
A a-Si:F:H600°C
ann~ 3 0
- o
rn a-Si:F 600% ann.LL n
o 8 a-Si: H
os
dep.- 0A A a-Si:F:H as dep. 0 1
I
temperature ( K annealing temperature ( %
F i g . 3 . T e m p e r a t u r e d e p e n d e n c e o f t h e F i g . 4 . Changes w i t h a n n e a l i n g o f t h e l i n e w i d t h of H and F NFIR i n a-Si:H, c e n t e r d e n s i t y Ys o f t h e ESR s i g n a l a-Si:F:H and a - S i : F a s - d e p o s i t e d a n d d u e t o d a n g l i n g b o n d s i n a-Si:H.
a n n e a l e d a t 600°C. a-Si:F:H and a - S i : F .
C4-732 JOURNAL DE PHYSIQUE
i n t h e form o f movable ( S i H 2 X \ . The f a c t is c ~ n s i s t e n t w i t h t h e f a c t t h a t f o r t h i s f i l m t h e i n f r a r e d a b s o r p t i o n p e a k i s m a i n l y a t 2000 cm-' i n d i c a t i n g t h e form o f SiH.
Thus, t h e l i n e w i d t h a t 77 K i s c o n s i d e r e d t o b e o n e w h i c h is f r e e from m o t i o n a l n a r r o w i n g .
I n c o n t r a s t , H MIR l i n e w i d t h f o r a s - d e p o s i t e d a-Si:E e x h i b i t s a p r o m i n e n t e f f e c t o f n a r r o w i n g a t room t e m p e r a t u r e , i n d i c a t i n g t h a t t h e f i l m c o n t a i n s a l a r g e amount o f H i n t h e f o r m O ~ ( S ~ H ~ ) ~ i n a g r e e m e n t w i t h t h e f a c t t h a t t h e i n f r a r e d a b s o r p t i o n p e a k i s m a i n l y a t a r o u n d 2100 cm-' f o r t h i s f i l m . The p r e s e n c e o f t h e l a r g e amount o f H i n t h e f o r m o f (SiH2)n may e x p l a i n t h e l a r c e ESR c e n t e r d e n s i t y i n t h i s f i l m as shown i n F i g . 4 [ 1 1 ] .
I t is f o u n d f r o n F i g s . 1 a n d 4 t h a t t h e i n c r e a s e i n t h e ESR c e n t e r d e n s i t y by a n n e a l i n g c o r r e s p o n d s t o t h e d e c r e a s e i n t h e c o n t e n t o f I! i n a-Si:H a n d a-Si:F:H.
As e x p e c t e d , t h e i n c r e a s e i n t h e ESR c e n t e r d e n s i t y by a n n e a l i n g i s s m a l l f o r h y d r o g e n f r e e a-Si:F. The o r i g i n o f t h e s m a l l i n c r e a s e i n t h e ESR c e n t e r d e n s i t y i s n o t c l e a r , b u t i t m i g h t b e c a u s e d d u r i n g t h e c o o l i n g p r o c e s s a f t e r a n n e a l i n g b e c a u s e a s p e c i a l c a r e was n o t t a k e n t o a v o i d a r a p i d c o o l i n g .
I n c o n c l u s i o n , we m e a s u r e d how t h e NliR o f F and H a n d t h e ESR c h a n g e b y a n n e a l i n g i n a - S i : F , a-Si:F:H a n d a-Si:H. The t e m p e r a t u r e d e p e n d e n c e o f t h e NPR l i n e w i d t h was m e a s u r e d , a n d t h e n o t i o n a l n a r r o w i n g was s e e n i n some c a s e s . The r e s u l t s are c o r r e l a t e d w i t h t h e p r e s e n c e o f ( S i F n ) n o r S i F , and (SiIi2)n w h i c h a r e e a s y t o move. We a l s o f o u n d t h a t h y d r o g e n f r e e a - S i : F i s much more s t a b l e a g a i n s t h e a t i n g t h a n a-Si:H a n d a-Si:F:H.
Acknowledgements.- The a u t h o r s w i s h t o t h a n k K. Nakazawa f o r t e c h n i c a l a s s i s t a n c e . They would a l s o t h a n k D r . Y . Uchida o f F u j i E l e c t r i c C o r p o r a t e R e s e a r c h a n d
Development, L t d . a n d Dr. H . K a t s u m u r a o f Tokyo I n s t i t u t e o f T e c h n o l o g y f o r s u p p l y - i n g a-Si:F:H a n d a - S i : F s a m p l e s , r e s p e c t i v e l y . T h i s work i s s u p p o r t e d by t h e S u n s h i n e F r o j e c t o f H i n i s t r y o f I n t e r n a t i o n a l T r a d e a n d I n d u s t r y of J a p a n .
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