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X-ray optics in Langmuir-Blodgett films
F. Rieutord, J.J. Benattar, Louis Bosio, P. Robin, C. Blot, R. de Kouchkovsky
To cite this version:
X-ray optics
in
Langmuir-Blodgett
films
F. Rieutord
(*),
J. J. Benattar(*),
L. Bosio(**),
P. Robin(***),
C. Blot(*)
and R. deKouchkovsky
(*)
(*)
DPhG/SPSRM 2014 CENSaclay
91191 Gif-sur-Yvette Cedex, France(**)
Laboratoire «Physique
desliquides
et électrochimie »ESPCI,
10 rueVauquelin,
75231Paris,
France(***)
THOMSON CSF - Laboratoire central derecherche,
Domaine deCorbeville,
BP10,
91401
Orsay Cedex,
France(Reçu
le 20 octobre 1986,accepté
le 25 novembre1986)
Résumé. 2014 Les milieux stratifiés et
plus
particulièrement
les films deLangmuir-Blodgett
produisent
d’interessants effets aux incidences rasantes sur les courbes de réflectivité des rayons X. Nous avons étudié laprojection
de la densitéélectronique
sur la normale aux couches dans des films L.B. d’acidebéhénique
pourdifférentes
séquences
dedépôt,
afin de corréler leur structure auxfigures
d’interférenceparticulières
seproduisant
autour despics
deBragg
(00l).
En utilisant le formalisme del’optique
et la théoriecinématique
des rayonsX,
nous avonsanalysé
ces différents effets d’interférence. Parailleurs,
nous avons mis en évidence unenouvelle structure non inclinée de ces
systèmes.
Abstract. 2014 Stratified media and
especially Langmuir-Blodgett
filmsgive
rise tointeresting
features of the X-rayreflectivity
curves atgrazing
incidences. We have studied theprojection
of the electronicdensity along
the normal to thelayers
ofdifferently sequenced
L.B. Films of behenicacid,
in order to correlate their structurewith the
particular
interference patternsoccurring
around(00l)
Bragg
peaks. Using
bothoptical
formalism and kinematicaltheory
forX-rays,
we haveanalysed
these various interferencephenomena.
Moreover, we found a new untilted structure of these systems.Classification
Physics
Abstracts 61.10 -68.90
1. Introduction.
X-ray
scattering techniques
undergrazing
incidence haveproved
to bepowerful
tools forinvestigating
the surfaces and the structure of thin films[1].
In the case of films that are made up of a fewlayers
deposited
over a thicksubstrate,
the electronicdensity
profile
along
the normal to thelayers
can be studiedusing reflectivity experiments.
It has beenpreviously
shown[2]
that the wholereflectivity
curvedisplays
variousinteresting
features due to the both finite size effects and substrate influence. The aim of this paper is toanalyse theoretically
andexperimen-tally
the interference effects which are visible on thereflectivity
pattern
of stratified thin films and thus toshow how information about the film
deposition
can bedirectly
obtained.Our
experiments
were carried out over thinor-ganic
filmsdeposited by
the classicalLangmuir-Blodgett (L.B.) technique [3, 4].
Thistechnique
hasrecently
been thesubject
of a renewed interest since it allows the construction of varioussystems,
having
both fundamental andtechnological
interests.(For
areview see Refs.
[3-5].)
The data were taken on standard behenic acidlayers
(C22H44O2)
but the results we mentionapply
to any L.B. film or anyregular
stratified film as forexample
composition-modulated
amorphous
thin films[6].
The interference effects we
study
here indetail,
and which havealready
been observed on L.B.multilayers
by
a fewworkers,
mainly
consist ofsubsidiary
maxima between mainBragg
peaks.
The first observation of these effects was carried outby
Bisset and Iball
[7].
Theirinterpretation
of theX-ray
diffraction data wasonly qualitative
and based on theanalogy
with a finite sizeoptical grating.
Morerecently,
aninvestigation
of fine interferencestruc-ture
in L.B. films of manganese stearate was per-formedby
Pomerantz et al.[2]
who used bothX-rays
[2]
and neutrons[8].
Their dataprocessing
involved ageneral optical
formalism[9],
well suited forcomputations
but which obscured thephysical origins
of the observedpatterns.
Apart
from thesestudies,
several structure determinations
using
standard methods ofcrystallography (i.e.
Fouriertransforms)
have beenperformed
on L.B. filmsincluding
alarge
680
number of
layers
whichprevent
the observation of finite size effects[10].
In this paper, we used both methods
(optical
formalism and Fouriertransform)
toanalyse
interfer-ence effects. Fourier transform method is less gener-al but enablesanalytic
calculations and easy discrimi-nation between theorigins
of thepattern
features. Thus we couldseparate
in thereflectivity
curveKiessig fringes [11]
and finite-sizeBragg peak
con-tributions andstudy
the waythey
interfere in connection with the filmdeposition
sequence.The observation of such interferences was made
possible only
because of the very small thicknesses of the film and thehigh regularity
of the stratification. In our case,using
ahigh
resolutiondevice,
we found that these effects were most visible onsamples including
about 30layers
corresponding
to an overall thickness of 1 000
A
typically.
2.
Experimental.
2.1 SAMPLE PREPARATION. - The L.B.
technique
for filmdeposition
has beenextensively
reviewed in manyplaces [3-5].
Let usonly
recall that the films areprepared by
transferring floating organic
mono-layers
onto solid substrate. In the most commondeposition
mode(Y type) amphiphilic
molecules(i.e.
molecules withhydrophilic
head andaliphatic
tail)
stack in a tail-to-tailconfiguration
(see Fig. 1).
The orientation of the firstlayer strongly depends
on the treatment of the substrate. The substrates we used wereoptically
polished
circular(100)
silicon disks(50
mm in diameter and 3 mmthick).
When cleaned withpropanol,
these were found to behydrophilic
so that nodeposition
was observedduring
the first immersion. If cleaned with a dilutefluorhydric
acidsolution,
silicon wafers becomehydrophobic
andaliphatic
tails ofmonolayer
bind first to the substrate. Since thedeposition
sequence endsby
an emersion of thesample,
the lastlayer
isFig.
1. - Schematicrepresentation
of the fourpossible
deposition
sequences for Y-type L.B. films.normally
hydrophobic (from
thealiphatic
tails of themolecules)
(Figs. 1-1, 1-3).
Attempts
were made however to end the sequence withhydrophilic
headsupwards (Figs. 1-2, 1-4),
by
decompressing
thefloat-ing monolayer
beforeremoving
the substrate.Unfor-tunately, they
result so far in poorquality
samples
which did not exhibit thedesigned
features. This iscertainly
due to thedeparture
of the lastdeposited
layer
during
thedecompression,
since thehyd-rophilic
heads were then oriented towards water.Two series of
samples
corresponding
tofigures
1-1 and 1-3 were built with different numbers oflayers.
Thedeposition
conditions were the same for all thesamples ;
behenic acid wasspread
on the surface as a solution of10- 3 moll
in chloroform. Thesubphase
wastriple
distilled water(Millipore).
Themonolayer
waskept
at a constant surface pressure of 35mN. m-1
during deposition
and the rate of transfer was 0.3 cm/min. We will lateronly
mention the results obtained on the 26layer
and 27layer
samples,
sinceapart
from variations due tolayer
number,
all observed features werequalitatively
the same in a series.2.2 X-RAY TECHNIQUES. -
Reflectivity
measure-ments were carried out
using
theexperimental
device which isrepresented
infigure
2 and described in detail in reference[12].
In ourgeometry
81 = 02
and the wavevector transfer(Q
=kf -
ki)
isparallel
to the z-axis
perpendicular
to the substrateplane
(see Fig. 3).
Thus weinvestigate
hereonly
theFig. , 2.
-Experimental
device forreflectivity
measurements ; the screw mechanism drivenby
the motor M, acts on81
1 and02 ;
the motor m moves02
viaSA-detector.
Fig.
3. -Geometry
forX-ray
reflectivity.
Thescattering
projection
of the three dimensional electrondensity
distribution onto the z-axis.The
X-ray
source in this device is a conventional tube. The CrKa
radiation is obtained from a double monochromatorequipped
with two flatLiF(200)
crystals
and adivergence
slitSD
which both isolates theKa
line
and collimates the incident beam. The width ofSD
was 80 um and theresulting
angular
broadness 0.45 mrad FWHM. Theintensity
of the monochromated beam is monitoredby
an ionization chamber while the reflected beam is detectedby
a scintillation counterplaced
behind theanalysis
slitSA.
Thisapparatus
wasemployed
for smallangle
measurements
only
(0-50 mrad).
Athigher
angles,
thepatterns
were recordedby
means of classical(0 -
20)
goniometer
using
V-filtered Cr K radi-ation. In the last case, the absolute values of thereflectivity
were obtainedby
calibrating
on anover-lapping
range ofangles
scannedusing
the twoapparatuses.
Thereflectance,
defined as the ratioI /Io
of reflected to incidentintensities,
could be measured down to10-7.
3. Methods for
reflectivity
computations.
For
X-ray wavelengths,
the refractive index n ofmatter is
given by :
where
e2
A is the
wavelength, re
=e 2
the classical electronmc
radius,
p thedensity,
M the atomic mass,f
+A f ’
+i A f "
thecomplex
atomicscattering factor
the linearabsorption
coefficient.Propagation
of X-raysthrough
matter can thus be describedusing
the laws ofoptics.
Inparticular,
thereflectivity
of aplane
diopter
isgiven
by
the Fresnel formulae. Note that since the realpart
of the index is less thanunity,
total reflection will occur at an air/matter interface if the incidentangle
is smaller than a criticalangle
oc =
-,,/2-5.
We shall see now how to deal with a medium in which the index varies as a function of the z-coordinateonly
(so-called
« stratified »medium).
3.1 MATRIX FORMALISM. -
Reflectivity
calcula-tions forangles
including grazing
incidencesrequire
a verygeneral
methodtaking
into accountmultiple
reflection effects. Such a method is available from
multilayer
filmoptics
[13, 14].
The most convenient way tocompute
thereflectivity
curve is to treat thesystem
as a succession ofhomogeneous
laminae. Each lamina is characterizedby
a transfer matrixMi
depending
on threeparameters :
its thicknessdj,
the refractiveindex nj
and the incidentangle
0;
Mi
isgiven by :
where
2 irti d,
sin 0and pj
= nj
sin 0. The lastexpression
is valid fors-polarization
but in the range ofangles
weconsider,
thereflectivity
for the twopolarizations
s and p are about the same.The whole medium is then
represented by
a characteristic matrix which is theproduct
of the matrices of theconstituting
laminae. Note that forlayered
systems
such as L.B.films,
a natural inter-mediatestage
of this calculation is the evaluation of the matrix of onelayer.
The reflection coefficient isgiven
in terms of the matrix elementmij :
where p, =
n, sin
0,
po = no sin 0 and no, n, are the indices of air and substraterespectively.
The final
reflectivity
is then :It should be noted that
angular dependence
of the atomicscattering
factor(i.e.
theindex)
can beeasily
included in thisgeneral
formalism. The method orequivalent computation
schemes[9]
have been usedpreviously
in manyreflectivity
studiesusing X-rays
[15, 16]
or neutrons[8,
17,
18].
3.2 FOURIER TRANSFORMS. - The other method
for
reflectivity
calculations derives from kinematicaltheory
of diffraction. The calculation of the reflectedamplitude
isperformed
by
adding
all thespherical
wavelets diffractedby
each small volume elementd3r
of thesample
[19] :
where
Ao
is theamplitude
of the incident wave at theorigin
0 ;
rl, r2, r are the distances between the element of volumed3r
and,
respectively
the source,the detector and the
origin
0.Pel (r)
is the electronicdensity
in the volumed3r.
On account of the distances involved inreflectivity experiments,
theplane
waveapproximation (Fraunhofer
approxi-mation)
does not suffice. Theproblem
must be treatedby
Fresnel diffraction. For a stratified682
where
Note that such a calculation assumes that each element of volume sees the same incident wave and that the diffracted wave is not diffracted
again
(absorption
anddynamical
effects areneglected).
Hence,
theexpression
is validonly
for q >
qc = 4sin
Oc
.A
4.
Experimental
results.The
reflectivity
patterns
of all thesamples
we studied are very similar and the main differences concern the interferencephenomena occurring
around the firstBragg
peak.
Next section will be devoted to thestudy
of these interferences. The aim of this section is toshow,
through
thestudy
of atypical
sample
(27
layers
deposited
over anhyd-rophilic
substrate),
how the differentparts
of thereflectivity provide
the information used to build a model for the electronicdensity
profile.
Three consecutivepart
of areflectivity
pattern
are rep-resented infigure
4.4.1 GRAZING ANGLES. - The first
part
of thisreflectivity
curve(Fig. 4a)
ranges between 0 and 10 mrad. For theseangles,
the film may be con-sideredhomogeneous
with a mean refractive index nF = 1 -8f - Bf.
Measurements of the two criticalangles
for film and substrate(Ocf
=J2 8f,
Oc
=J2 8s
respectively)
and theshape
of thereflectivity
curve at lowangle,
whichdepends
mainly
onabsorp-tion before
Ocs,
allow determination of film and substrate meancomplex
indices.Fringes
ofequal
inclination(Kiessig fringes)
arealready
visible but theirshape
is much alteredby
the instrumental resolution. This can be observed whencompared
tothe theoretical curve without convolution. The latter
displays
a narrow first minimum as well as asup-plementary fringe.
Thisshape
of thepattern
is dueto
multiple
diffraction effects which becomeimport-ant in this
angular
range.4.2 INTERFERENCE STRUCTURE AROUND FIRST
BRAGG PEAKS. - The second
part
of thereflectivity
pattern
(Fig. 4b)
is the mostinteresting
since it exhibits manystriking
features. Let us first consider the(001) Bragg
peak
surroundedby
subsidiary
maxima.One can notice that the
intensity
of thesubsidiary
maxima ishigh
before the firstpeak
and very low after it. This cannot beexplained
by regular damping
withincreasing
incidence,
since there is about one order inmagnitude
between the intensities. TheFig.
4. -X-ray
reflectivity
from a27-layer
film. The dots areexperimental points.
The solid linecorresponds
to the theoretical curvecomputed using
the model offigure
5,
after convolution
by experimental
resolution.a) grazing
angles
- The dashed line is the theoretical unconvolutedcurve.
b)
interference pattern around first and secondBragg
peaks.
Note the shift of theposition
of the(001)
peak
from its theoretical value(dashed line). c) higher
ordersBragg
peaks.
main
(001)
Bragg
peak
isclearly
shifted toward smallActually,
theseparticular
effects result from inter-ferencephenomena
between wavescoming
fromtwo
origins.
Firstly,
the waves reflected at the twointerfaces air/film and film/substrate which would
give
rise,
ifalone,
toKiessig
fringes. Secondly,
waves
coming
from the finite-size stratified structure whichyield Bragg peaks
withsecondary
maxima.Hence,
subsidiaries are aresulting
pattern
betweenKiessig
fringes
andsecondary Bragg peak
maxima. Thephase
difference between the two beamsde-pends
on the relativeposition
of interfaces and stratification(i.e.
the filmboundaries).
Note that these interference effects which will be described further in detail in section5,
can take miscellaneous forms. For instance thedip
in thereflectivity
curve close to the(002)
Bragg
peak position
is due todestructive interferences.
4.3 KIESSIG FRINGES. - Far from main
Bragg
peaks,
subsidiaries aregenuine
Kiessig fringes [11].
These arefringes
ofequal
inclination which result from the interference between the beams reflectedat the air-film and film-substrate interfaces. The
study
of thesefringes
provides
information relativeto the film and its two interfaces. The
position
of the maxima of thefringes
isgiven
by
the standardequation
where t is the total thickness of the
film,
and p
is aninteger
(interference order).
The termis the classical corrective term for refraction. Measurement of the
position
of thefringes
allows anaccurate determination of the total thickness of the film. In our case we found t = 815 ± 5
A.
Supplementary
information can be obtained from theanalysis
of thefringes
intensities. This kind ofinvestigations
has beenperformed by
Croce and Nevot on thin metallic films[20, 21].
Let us recall thatrough
interfaces result in additionaldamping
of thereflectivity
withincreasing
angles.
If a Gaussian distribution is assumed for theheight
variations of theinterface,
thedensity
profile
will berepresented
by
an error function and thereflectivity
will have an additional Gaussian attenuation.For a
homogeneous
film limitedby
tworough
interfaces the
intensity
of thefringes
on thereflectivi-ty
curve isgiven,
fromequation (1),
by
where
(ZÃF)
andz]FS)
are the meansquared
roughnesses
and t is the distance between the interfaces.Thus,
measurements of both mean level andamplitude
of thefringes
far from aBragg peak
enable a determination of these values. We find(ZÃF) 1/2
= 20A
and(zbs)
1/2
= 5
A.
Theroughness
of the air-film interface is rather
important
and indicates that the lastlayer
should bepoorly
filled. This factis
inagreement
with apreviously expected
mechanism[22, 23]
and with our observations madeby
electronmicroscopy
onreplicas [24]. Micrographs
taken on thesesamples
look ratherblurred,
onaccount of the disorder of the last
layer.
These features areprobably
dependent
also on the filmstructure which we shall examine now.
4.4 STRUCTURE ALONG THE NORMAL TO THE LAYERS. -
Bilayer
spacing
can beeasily
obtained from the lastpart
of thepattern
(Fig. 4c).
Here,
only
main
Bragg
peaks
arevisible,
subsidiariesbeing
drowned in thebackground scattering.
Interlamellarperiodicity
obtained fromBragg
peaks
up to(007)
was found to be :
d001
= 60.0 ± 0.1A.
This result issurprising
since itcorresponds
precisely
to twice thelength
of a behenic acidmolecule,
thusinvolving
untilteddisposition
of molecules within the unit cell. To ourknowledge,
structures observed so far in L.B. films of behenic acid were similar to known bulkcrystalline
structures oflong
normal chaincarboxylic
acid ;
all these forms(A,
B orC)
involve non zero tiltangles
[25, 26].
Notethat,
since the film thickness(815
A)
corresponds
to 27 times thelayer
thickness(60.0
Å/2),
then all thelayers
have the same structure.The electronic
density
profile
within a unit cell can be obtained from theanalysis
of theBragg
peak
intensities(i.e.
the structurefactor).
The first feature which can be noticed is the very weakamplitude
of even orderBragg
peaks.
This results from both excess and lack of electrons due tohydrophilic
heads(-COOH groups)
and interchainspacing
respect-ively, separated
by
half aperiod [2, 27].
It should bepointed
out that the structure factor decreasesstrongly
andonly
seven orders can be observed. For acomparison
we observed up to 24 orders in films of C-form structure under similar conditions. This means that the electronicdensity profile
within the unit cell is rather smooth. This fact may indicate that thissystem
should be astacking
of two dimensionallayers weakly
correlated.Another
argument
for that wassuggested
by
observation of the surfaceby
means of electronmicroscopy
onreplicas.
Contrary
tomultilayers
of C-form behenicacid,
their surfaces do not exhibitmultistep
defects(extra
islands ofholes)
[24]
but look rather blurred.Using
the formalismgiven
in section3.1,
the684
profile
8 (z)
is known. Thereflectivity
curve calcu-latedusing
the8 (z)
profile
given
infigure
5(solid
line inFig.
4)
is found to fit theexperimental
data verywell,
after convolutionby
the instrumentalresolution.
The fitted values found for 8(z )
are closeto the theoretical ones, calculated
by
taking
intoaccount the steric
hindrance,
atomiccomposition
and standard distances between atoms. Theabsorp-tion for this kind of
layers
is very small(A - 2 x 10-8 )
and can beneglected
forangles
greater
than the criticalangle.
Concerning
thelayer
structure, one can assume, since the molecules arenot
tilted,
that their lateralstacking
within alayer
ishexagonal.
Fig.
5. - Model of the indexprofile
for the27-layer
sample along
the z-axis. The mean value of the real part of the index of the film is5f
= 7.6 x10-6
and thecorrespond-ing
imaginary
part 8
f = 2 x10-g.
For the siliconsub-strate :
6, = 17.1 x 10-6
andBs = 0. 8
x10-6.
5. Calculation of
the
interference structure.The
previous
section showed thatparticular
interfer-ence features are visible at smallangles
on thereflectivity
curve. The main drawback of theoptical
matrix formalism(Sect. 3.1)
isthat,
concerning
oursystems,
it does not show theorigins
of the different features on thereflectivity
pattern.
Fortunately,
forangles
greater
than a fewOc,
multiple
diffraction effects are weak(reflectivities
aresmall)
so that kinematicalapproximation (i.e. single scattering)
is valid(Sect. 3.2).
Analytic expressions
can therefore beobtained,
showing
clearly
the effects we aim to discuss. We shall assume that thesystems
arecomposed
of identicalmonolayers. For
the sake ofclarity,
calcula-tions will be made in all cases with the samestructure within the unit cell and with
step-like
interfaces. The four cases offigure
1 will be revie-wed.5.1 EVEN NUMBER OF LAYERS. - The easiest
case deals with films
including
even numbers ofdeposited
layers
since these areperiodic
systems
with aninteger
number(N)
ofbilayers.
The indexprofile
isrepresented by
aperiodic
function ofperiod d
(bilayer spacing)
between z = 0 and z = - Nd.Setting
ð(z)= (ð(z)-ðf)+ðf
whereðf
f is the mean value of the index within thefilm,
onegets,
performing
the Fourier transform(1) :
where
F (q )
is defined as :(F
isproportional
to the structure factor for the unitcell.)
It is assumed from the
deposition
mode that the cell iscentrosymmetric
so that F is real. F ispositive
in case 3 offigure
1 andnegative
in case 2.The leftmost two terms in the brackets in
equation
(3)
are theKiessig fringes
contribution. Theexpression
is the same asequation
(2)
where theroughnesses
have been taken to beequal
to zero. The third termcorresponds
toBragg
peaks
withsecondary
maxima. Theirintensity
isproportional
tothe
squared
structure factor. Theexpression
isexactly
the same as for a finite sizeoptical grating.
Therightmost
term is the interference termbe-tween the two
previous phenomena.
In thepresent
case, this term is small since
(2
8f -
8s)
is small : the meandensity
of the film(8 f
=7.6)
is close to halfthe
density
of silicon(8 =17.1).
Figure
6 shows aplot
ofseparate
contributions ofKiessig fringes
and of(001)
Bragg
peak,
then the result of all the terms ofequation (3).
Due tothe
small interference
term,
intensitiesmerely
add and there isonly
aslight
difference between the cases(F
0)
and(F > 0).
Note thatKiessig fringes
have the samespacing
assecondary Bragg peaks,
but are shiftedby
half aperiod. Fringes
on both sides of thepeaks
have about the sameamplitude,
and nosignificant
shift of the mainBragg
peak
can be detected.5.2 ODD NUMBER OF LAYERS. - The calculations
are in this case somewhat more tedious since the
Fig. 1).
Thesimplest
way to tackle thisproblem
is toconsider the
system
as a succession of(N) bilayers
and an additionalmonolayer
(the
lastlayer
in thedeposition
sequence forinstance).
This lastlayer
can bereplaced by
ahomogeneous
laminahaving
themean index of the film : this includes its contribution
to the
phase
difference between the reflected waves,but
neglects
its small contribution toBragg
peak
intensity.
Under thisassumption,
the Fouriertrans-form
becomes :’
with the same notation as in
(3).
The value of
qd
corresponding
to a(00 )
Bragg
peak
is l7T. It can be seen that the last interferenceterm is the sum of two
opposite
terms for even 1 and the difference of these terms for odd 1. As the absolute values of these terms are close to eachother,
the interference term is small in one case(even 0
butlarge
in the other(odd 1).
Figure
7 shows the interference effect around the(001)
Bragg
peak.
In this case,fringes
andsecondary
maximacoincide,
so that the interference has a verylarge
effect on theintensity
of subsidiaries. Thesign
change
of thelarge
interference term from one side of theBragg
peak
to the other results in a verystrong
damping
of thefringes.
The ratio of theirintensity
before and after thepeak
isactually
about 100. The calculationspredict
that thisstriking
effect should be inverted in the case of adeposition
over anhydrophobic
substrate(Fig. 1-4)
since this casefol-Fig.
6. -Interference between
Kiessig fringes
andsub-sidiary
maxima of the(001)
Bragg
peak
for an evennumber of
layers.
The data used in the calculationcorrespond
to behenic acid,assuming
noroughnesses
norabsorption.
Numbers 2 and 3 refer to cases 2 and 3 infigure
1.Fig.
7. - Interference structure around(001)
for odd number oflayers.
Numbers 1 and 4 refer to cases 1 and 4 infigure
1.lows from the
previous
oneby
solely
changing
theterm F into - F.
The unusual
shape
for the mainBragg peak
is alsodirectly explained
by
this interference process : afringe
is added on the lowangle
side of the mainpeak
and subtracted on the other side. Theampli-tude of the
displacement
of thepeak
maximadepends
on the relativeheights
ofKiessig fringes
andBragg
peaks
(i.e.
onN, F,
SF,
6J.
In ourexample
infigure 7,
the shift of the maxima isð.(J(J
= 4 % and theintensity change by
a factor oft7
two. Note that we also
computed
the interferencepattern
offigures
6-7using
matrix formalism.Apart
from a smallangular
shift due to therefraction,
no difference with theplot
ofequations
(3)
and(4)
was detected.5.3 EXPERIMENTAL INTERFERENCE PATTERN.
-Figure
8 shows theexperimental reflectivity
data around the(001)
Bragg
peak
for different sequences ofdeposition. Figure
8adisplays
thereflectivity
for a686
Fig.
8. -Experimental
results for the interference struc-ture around(001)
Bragg
peak.
a)
26-layer
sample
onhydrophobic
substrate(case
3 inFig. 1), b) Sample
plan-ned to be
27-layer
onhydrophobic
substrate(case
4 inFig. 1).
The lastlayer actually
went off so that the sequence is the same as for the26-layer sample.
c)
27-layer sample
onhydrophilic
substrate - case 1 infigure
1.in
Fig. 1).
The main features that we mentioned in section 5.1 are observed : there is nospecial
damping
of the subsidiaries from one side of the(001)
Bragg
peak
to the other one and noimportant
shift of theposition
from the theoretical value. It should be noted however that the intensities of bothKiessig
fringes
andBragg peaks
are much smaller for the26-layer
than for the27-layer sample.
Thisoriginates
in the substrate treatment, which increases itsrough-ness and
changes
thequality
oflayer
deposition.
Apart
from this overalldamping,
the structure factor remains the same.Figure
8bdisplays
the sameangular
range for asample
which wasdesigned
to include27 layers
deposited
over anhydrophobic
substrate(i.e.
case 4 inFig. 1).
The curve does not show theexpected
feature but has a similarshape
as theprevious
one. This indicates that the lastlayer
went offduring
the finaldecompression.
This fact is alsosupported by
ameasurement of the film thickness which indicates less than
27 layers.
For the same reasons, similarproblems
were encountered onsamples
correspond-ing to
the case 2 infigure
1.(Even
number oflayers
onhydrophilic substrates.)
Thepatterns
we obtained weretypical
of odd numbersamples
onhydrophilic
substrates
(case
1 ofFig. 1).
Figure
8creproduces
anexample
of suchpatterns
taken fromfigure
4b(27
layer
sample) ;
all the features described in section 5.2 andplotted
infigure
7 are visible. 6. Conclusion.Interference
phenomena play a major
role inX-ray
reflectivity
studies oflayered
thin films. We saw that these effects arelarge
in the smallangle
part
of thereflectivity
curve and thatthey strongly
alter classical diffraction features. Theseeffects,
which must be taken into account in structure factordetermination,
may be used to
investigate
the boundaries of the film : thedeposition
sequence, i.e. the orientation of the first and the lastlayer
may bestraightforwardly
determined. The method isactually
moregeneral :
we illustrate hereonly
casesdiffering
from each otherby
the presence of one additionallayer
but it is clear that other casesinvolving
alayer
with tiltedmolecules,
a half filledlayer
and so on arepossible.
All willchange
thephase
difference between the wavescoming
from the boundaries and thosecoming
from the structureitself ;
thus the interferencepattern
will be modified and one can takeadvantage
of this fact to set one withrespect
to the other.This kind of
investigation
can beperformed ideally
on L.B. films since the L.B.technique
allows thedeposition
of agiven
number ofhighly regular
layers.
Our results obtained on behenic acid enabled us to describe a new untilted form for this molecule as well as to confirm various observations on L.B. films(i.e.
mainly
the existence of a disordered lastlayer).
Furtherexperiments
on newsamples
built under different conditions(especially
toprevent
thedeparture
of the lastlayer
whenhydrophilic)
will be carried out. Moreover this method may beapplied
to thestudy
ofoverturning
mechanism andX-type
layers.
X-ray
reflectivity study
of many othersystems,
such as
composition
modulatedamorphous
thin films or MBE grownlayers
[28],
may also be veryinteresting,
since a verylarge
variety
of artificialstructures
may bedesigned
with thesetechniques.
Acknowledgments.
We wish to thank E.
Chastaing
for technical assist-ance and M.Dupeyrat
forhelpful
discussions.References
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