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Proof of asymmetry in the Cd-arachidate bilayers of ultrathin Langmuir-Blodgett multilayer films via X-ray
interferometry
S. Xu, M. Murphy, S. Amador, J. Blasie
To cite this version:
S. Xu, M. Murphy, S. Amador, J. Blasie. Proof of asymmetry in the Cd-arachidate bilayers of ultrathin
Langmuir-Blodgett multilayer films via X-ray interferometry. Journal de Physique I, EDP Sciences,
1991, 1 (8), pp.1131-1144. �10.1051/jp1:1991195�. �jpa-00246398�
J.
Phys.
I France 1(1991)
l131-l144 Ao0T1991, PAGE l131Classification Physics Abstracts
61.10F
Proof of asymmetry in the Cd-arachidate bilayers of ultrathin
Langmuir-Blodgett n~ultilayer rams da X-ray interferometry
S.
Xu,
M. A.Murphy,
S. M. Amador(*)
and J. K. BlasieDepartment
ofChemistry,
and theLaboratory
for Research on the structure of Matter,University
ofPennsylvania, Philadelplfia,
PA I9I04, U-S-A-(Received10 April1991, accepted
30April 1991)
Amtract. X-ray
interferometry
was used tostudy
theprofile
structures of ultrathinLangmuir- Blodgett
films of Cd-arachidatedeposited
onalkylated gerrnanium/silicon multilayer
substrates.The relative electron
density
profiles of the one, two and threebilayer
films on theGe/Si multilayer
substrates, derived viaX-ray interferometry employing
ahighly
constrained, real spacerefinement
algorithm,
have shown the same kind of asymmetry in thebilayers
of such ultrathin filmsdeposited
onalkylated
silicon oralkylated glass,
as derived lessdirectly
and describedpreviously [lJ.
THs paper demonstratesexperimentally
the power of the X-rayinterferometry
method [2J forsolving
an unknown structureby placing
a known structure beside it, and furthermore proves the correctness of theupstroke-downstroke
asyInrnetry in the Cd-arachidatebilayers
due to theLangmuir-Blodgett deposition technique.
Inwoducfion.
X-ray
diffraction [3J can inprinciple
be used toinvestigate
the structure of very thinmultilayer
filmscontaining
from one to many molecularmonolayers deposited
on solid substratesby
theLangmuir-Blodgett (LB) technique.
One would like to ascertain whether the structures of the individualmonolayers
differ from one another andparticularly
whether the substrateperturbs specific
individualmonolayers
in the film. Previousanalyses
of the meridionalX-ray
diffraction from suchmultilayer
films haveemployed
either anonunique modeling
of themultilayer
electrondensity profile
to fit the observed diffraction data[4J,
or direct methods(multilayer profile
Patterson-function deconvolution[5-8J,
and counterionisomorphous replacement [9J)
touniquely
derive the electrondensity profile
of thepresumed symmetric biJayer (or bilayer pair) repeated
N times in themultilayer.
Anon-unique
box- refinementtechnique [1, 7, 8,
10J has been morerecently
utilized toprovide
the relative electrondensity profile
for the entiremultilayer
such that each individualmonolayer
in themultilayer
can bedistinguished. Although application
of the box-refinementtechnique
to ahomologous
series ofmultilayer
structures[7,
8Jprovides
furthersupport
for the correctness(*)
Present address:Physics
Deparhnent, Haverford College, Haverford, PA 19041, U-S-A-1132 JOURNAL DE PHYSIQUE I hf 8
of the derived
multilayer profile
structures where no assumptions ofbilayer
symmetry orrepetition
were made, theseprofile
structures must still beregarded
as non-unique.In this paper, we
employ,
apowerful
method foruniquely determining
theprofile
structure of an unknownmultilayer
structureplaced
next to a knownmultilayer profile
structure,namely X-ray interferometry
as firstproposed
in 1971[2].
Modern nanofabricationtechniques
make itpossible
to achieve this situationby depositing
the organicmultilayers
ofinterest via
Langmuir-Blodgett
orself-assembly
methods uponknown,
stable inorganicmultilayer
structures madeby sputtering [[[j
or Molecular BeamEpitaxy (MBE).
Phase information for the unknown structure in such acomposite
system can beobtained,
if theinorganic multilayer
structure is knownprecisely,
from the interference ofX-ray photons
diffracted
by
the known and unknown structures [2~1?].
Aprecise knowledge
of the electrondensity profile
of the known (orreference)
structure isessential,
and the reference structuremust be stable to the
deposition
of the unknownorganic multilayer
structure onto its surface.Synthetic inorganic Ge/Si multilayer
structures madeby
magnetronsputtering
or MBE can thereforeprovide
a suitable reference structure that can beindependently
determinedby
X- ray diffraction in the absence of theorganic multilayer.
We have collected accurate meridional
X-ray
diffraction data frommultilayers composed
of one, two and threebilayers
of Cd-arachidatedeposited
via theLangmuir-Blodgett technique
simultaneously
on bothalkylated
two or threebilayer
Ge/Simultilayer
substrates andalkylated
silicon substrates. Profile structures for the Cd-arachidatemultilayers
on thealkylated Ge/Si multilayer
substrates derived viaX-ray interferometry agreed
with those onalkylated
silicon derived via box-refinement as well as with those onalkylated glass
describedpreviously [I].
Theseunique
structural results achieved viaX-ray interferometry
therefore prove that thenon-unique
results obtainedpreviously using
the box-refinementtechnique
arecorrect, and
firmly
establish theupstroke-downstroke
asymmetry in thesebilayers deposited by
theLangmuir-Blodgett technique.
Methods.
Two types of substrates were used for this initial
study
withGe/Si multilayer
substrates. Thesesubstrates were manufactured
by
OvonicSynthetic
Materials(Troy, Michiganj using
magnetron
sputtering.
One type of substrate(Si)
was apolished
Si wafer 30 mil thick uponwhich was
deposited
a501layer
of Si toimprove
the smoothness of the substrate. Thesecond type of substrate
(Ge/Si)
was based on the first type upon which alternatelayers
ofgermanium
and silicon weredeposited
to result in a201
thickness for each Geor Si
layer
and a
bilayer
unit cell » with aprofile
thickness of401.
Thisprofile
thicknesswas chosen to
roughly
coincide with theprofile
thickness of thelipid bilayer
in theorganic multilayer
film to besubsequently deposited,
thusgenerating
strongX-ray
diffraction from the referenceGe/Si multilayer
structure overregions
ofreciprocal
spaceperpendicular
to the substrateplane,
I-e-along
the q=axis,
in which diffraction from theorganic multilayer
is also strong.Furthermore
by using
very fewbilayers
in the referencemultilayer,
e-g- two orthree,
one can generate continuousX-ray
diffraction over a broad range of q~ thusensuring
the maximumdegree
of interference with the diffraction from the unknownorganic multilayer
adsorbatesystem. Because of the fundamental limitations in the
sputtering technique,
eachmonolayer
so
produced
cannot be much thinner and caneasily
have anuncertainty
of ±21
the formerseverely
limits the maximum value of q= to which diffraction from the referencemultilayer,
and hence the essential interference
phenomena,
can be detected.The
preparation
of theorganic multilayers
via the LBtechnique
waspreviously
described [7] and willonly
be summarized. Substrates of each type diced to an area I cmby
2 cm werethoroughly
cleaned and renderedhydrophobic by covalently attaching
amonolayer
ofbt 8 X-RAY INTERFEROMETRY AND BILAYER ASYMMETRY IN LB FILMS I133
octadecyltrichlorosilane (OTS)
to the surface[13J.
A monomolecularlayer
of arachidic acidwas
spread
onto a clean air-water interface. Thesubphase
was a 0.25mM solution ofCdcl~
inMilli-Q
filtered water with 0.I mMNaHCO~
or TItIS buffer ofpH
-~ 7 at the
temperature
of17.5 °C. Thespread
films werecompressed
to a constant surface pressure of30dyne/cm,
which was maintainedduring deposition.
One of each of the two types ofsubstrates,
I-e-alkylated
Si andalkylated Ge/Si,
werepassed simultaneously through
themonomolecular
layer-water
interfacecyclically
at a rate of3mm/min
toproduce
a twomonolayer (one bilayer)
film on each substrate percycle.
Theresulting bilayer
is « head-to- head », where thecarboxyl
end groups arejuxtaposed
at the center of thebilayer.
Thiscycle
was
repeated
N times toproduce
anN-bilayer
film. Wethereby
made one, two and threebilayer
films of Cd-arachidatesimultaneously
on bothtypes
of substrates. The LBtrough system, monolayer
filmproperties,
and details of thedeposition
are further describedelsewhere
[14J.
Meridional
X-ray
diffraction was obtained from these variousmultilayer specimens
as afunction of
(qz
= 2 sin
IA ) corresponding
to elasticphoton
momentum transferparallel
to the z-axisperpendicular
to the substrateplane.
This meridionalX-ray
diffraction arises from theprojection
of the three dimensionalmultilayer
electrondensity
distributionalong
radial vectorslying
in thelayer planes perpendicular
to the z-axis onto the z-axis ; thisprojection
is defined as the electrondensity profile
for themultilayer.
The incidentX-ray
beam defines anangle
w with the substrate(xy) plane.
MeridionalX-ray
diffraction is observed forw
equal
to @, where 2@ is theangle
between the incident and scattered beams. Themultilayers
were thereforepositioned
on the w axis of a 4-circle diffractometer which was oscillated over anappropriate
range of D-valuespermitting
the collection of the meridional diffraction data with a lowimpedance position-sensitive
detector(PSD) aligned along
theq~ direction and mounted on the 2 axis
[7J.
An Elliott(GX-13) rotating
anodeX-ray
generator operating
at atarget loading
of 27kW/mm~
was used toproduce
the incident Cuemission
spectrum.
TheCuKaj
line(A
=
1.5411)
was selected
using
acylindrically
bentGe(I
II)
monochromatorcrystal
whichproduced
a line-focusedX-ray
beam. Thespecimen
to detector distance was 350 mm.X-ray
beam width and the PSD system resolution resulted in aAq~
resolution of~0.001l~'
The fullheight
of the diffracted line-focused beam wasintercepted by
the3-mm-high
entranceaperture
of the PSD for all diffraction maxima. The full 100-mm activelength
of the PSD wasdigitized
into 1024 channelsby
a multichannelanalyzer.
A PDP 11/24 computer (Digital Equipment Corp., Marlboro, MA)
was used tocontrol the diffractometer and the electronics associated with the PSD. Further details
regarding multilayer sample
conditionsduring
diffraction data collection and w scanparameters
have been described in aprevious
paper[8J.
The meridional
X-ray
diffraction data were also collected from these samespecimens utilizing
the BiostructuresParticipating
Research Team beamline X-9A at the NationalSynchrotron Light
Source~NSLS),
Brookhaven NationalLaboratory (Upton, NY), using
much more intense
X-ray
beams toget
bettercounting
statistics athigher
values ofq~,
especially
for the onebilayer
films of Cd-arachidate on bothalkylated
Si andalkylated Ge/Si
substrates.During
data collection thesynchrotron operated
at an electron energy of 2.5GeV,
and the current in thering decayed during
a fill from 200 to 90 mA. A constant-exit-height,
doubleSi(ill) crystal
monochromator was used to select the energy of theX-ray
radiation incident on thesamples.
Radiation from the monochromator(FWHM
2.5elf~
was collected andlinearly
focusedusing
acylindrically-bent
horizontal mirror~Ni-coated A1)
withits center at 1340 cm from the
bending-magnet
source. Thescattering geometry
andinstrumental setup were otherwise the same as those described above
using
therotating-
anode
X-ray
source. To protect the total-count-rate limitedPSD,
we utilized an automated1134 JOURNAL DE PHYSIQUE t4~ 8
Al foil
changer»
to attenuate the incident beamintensity appropriately
which was monitoredby
aN~-filled
ionization chamberpositioned
between the beamdefining
slits and theguard
slitsimmediately
upstream from thespecimen
chamber.Omega
scans wererecorded
by
bothoscillating
themultilayer
over theangular
range 0.3°~ w ~ 6.5° for data
collection over the full range of q= and over the more limited
angular
range 1.8°~ w ~ 6.5°
for better
counting-statistics
data collection athigher
values of q=. Further details of the diffraction instrumentation aregiven
in references[15,16].
Results.
Figure
shows the three meridional diffractedintensity
functionsI~(q=),
corrected forspecular scattering
and a Lorentz factor of q= aspreviously
described[7J,
relevant for the onebilayer
Cd-arachidatefilm, namely (a)
thealkylated
threebilayer Ge/Si
substrate16)
onebilayer
Cd-arachidate on thealkylated
Si substrate(c)
onebilayer
Cd-arachidate on thealkylated
threebilayer Ge/'Si
substrate. The structure factor modulussquared
for the Cd- arachidatebilayer
on theGe/Si multilayer
will be denoted here as)Fjc~s~~~~~~j~(q=))~.
Following
reference[5],
theintensity
functionIc(q=)
forfigure
lc isgiven by equation II):
~ ~ ~
l~lGe,S~)jAA
)~
(~z
~l~jGe
S~h(~=)
+FjAA
)1(~=~ ~ )l~(Ge S~)~(~z) )l~(AAIi
(~r)
C°SII
~Ice S>j~(~=)
l)
~IAA)jlq=11
+ 2 "qz A(GeS~)~IAA) )where
)Fjc~s,~~(q=))~
is the structure factor modulussquared
for the Ge/Simultilayer
provided by I~(q~)
fromfigure
la,Fj~~ ~~(q.)
~is the structure factor modulus square for the Cd-arachidatebilayer provided by I~(q~)
fromfigure 16,
#r~~~s~~~(q~) and#r~~~~~(q=)
are thephases
of theirrespective
structure factors(each
referenced to the center of mass of theirrespective profile
structure), and A~c~,s~~~j~~j~ is the distancealong
z between the center ofmass of the
Ge/Si multilayer
and the Cd-arachidatebilayer.
Given the kinematical diffractionexpression
ofequation II),
theI~(q~)
functions offigure
have all been truncated for thesame q~ ~ (q=)~~~ 0.02
l~
' since thespecular scattering
from the bulk silicon substrate surface tends to dominate the totalscattering plus
diffractionalong
q~ from thespecimens
for lowerq=-values.
The effect of the third term inequation (I),
the critical interference between theGe/Si multilayer
and the Cd-arachidatebilayer,
is mostreadily
apparent in theI~(q~)
function offigure
lcby
the presence of zero-level minima atq~-values
for which theI~(q~
) functions offigures
la and 16 are notsimultaneously
zero andby
thehigher-frequency
modulations not present in the
I~(q~)
functions offigures
la or 16. We note here that thelarge profile
width of the Ge and Silayers
in theGe/Si multilayer ii-e-
20hi severely
limits thedetectability
ofI~(q~)
from theGe/Si multilayer
for q~~
lqz)~~,
=
0.09
l~
' and likewise thedetectability
of the critical interference term infigure
lcThe Fourier transform of the corrected meridional
intensity
functionI~(q~) yields
the autocorrelation function P z) of thecorresponding multilayer
relative electrondensity profile
&p
(z) [7, 8].
That P(=)
is the autocorrelation of the relative and not the absolutemultilayer
electron
density profile ii-e-
&p(=)
vs. p(z) itself~
is asimple
consequence of the truncation ofI~(q=j
for q~~
(q=)~,~
mentioned above. Such autocorrelation functions for thealkylated
three
bilayer Ge/Si
substrate, the one Cd-arachidatebilayer
on thealkylated
Si substrate andone Cd-arachidate
bilayer
on the threebilayer Ge/Si
substrate are shown infigure
2. Thesetypical multilayer profile
autocorrelation functions eachdecay monotonically
toessentially
bt 8 X-RAY INTERFEROMETRY AND BILAYER ASYMMETRY IN LB FILMS lI35
(a)
iox
~s
N (~)
$
w H(c)
O.OO O.03 O.08 o-lo O.13 O.16
q~(I-i)
Fig.
I.-Meridionalintensity
functionsI~(qz)
for(a)
analkylated
threebilayer Ge/si multilayer
substrate; 16) one bilayer of Cd-arachidate on analkylated
si substrate; (c) onebilayer
of Cd-arachidate on an
alkylated
threebilayer Ge/si multilayer
substrate.(a)
i
(b)
M
~
~
~
(c)
i
O. 67. 133. 200. 267. 333. 400.
z (i)
Fig.
2.Multilayer profile
autocorrelation function or Patterson functionP(z)
for(a)
analkylated
three bilayerGe/si multilayer
substrate ; (b) onebilayer
of Cd-arachidate on analkylated
Si substrate(c)
onebilayer
of Cd-arachidate on analkylated
threebilayer Ge/si multilayer
substrate. The variousP(z)
havenonsignificant
fluctuations for z~ z~~~ indicated
by
the arrows in(a)-(c).
l136 JOURNAL DE PHYSIQUE ~ 8
zero for =~z~~~ which defines the extent of the
corresponding multilayer profile
z~~~ was
thereby
found to be~1501, ~1001
and~2501
for the threebilayer
Ge,/Simultilayer
substrate, one Cd-arachidatebilayer
and one Cd-arachidatebilayer
on Ge,>'Sirespectively.
Themultilayer profile
autocorrelation functions all contain smallamplitude.
low~frequency
oscillations around the zero-baseline for =~ =~~~ due to the truncation of the corrected
intensity
functionsI~(q~)
for q~~
(q=)~,~
m
0.0?
l~
'Again following
reference[2],
the autocorrelation function for themultilayer
relative electrondensity profile
for the Cd-arachidate
bilayer
on thealkylated
threebilayer
Ge/Simultilayer
substrate denotedby
~lGe>S~)~j~~
)~
(Z)
"hP
jGe<S~);IAAl~
IT)
*hP
jGe S~)/AA Ii (~ Z "
l'(Ge
S>h(AA )j Z IS g'V~Tl
b)
equation (2).
~lGe Si)~i~A)i(Z
~0)
~
l'(Ge
S>)~(Z ~0)
+I'jAA
Ii
IT ~ 0)
+ hP jGe
S>)~~
~)
* hP(AA )j
(+ Z)
* ~ (Z ~jGe 91;1,iA11 (2) where
~iGe
S~)~(Z)"
Ap
jGe'S>)~(Z) *Ap
(Ge S>)~(~ Z)
,
l'(AA) (Z)
"
Ap
~A )~(Z) * hP
j~~ )1~ °
and * denotes the convolution
operation.
Hence, for z less than thelarger
of(z~~, )j~~
s~j~ or(=~~~
jj~~~~, Pjc~,s,~~j~~
j,(=)
is dominatedby
thesuperposition
of the first two autocorrelation function terms ofequation (2). Only
the third term of equation(2),
the cross-correlation of&p jc~js~j~(z)
with&p
~~~j~
(=
centered about == + A
~c~ s,~~j~~
~~
can exist for z greater than the
larger
of (=~~,)~~~,,s,~~ or(=~~~)j~~~~
this cross-correlation term arisesexplicitly
from the interference term ofequation (I).
Hence, thesignificant
features inPj~~,s,~~j~~ j,(=
shown infigure
2c for=~1501
are a direct manifestation of the critical interference effects of
figure
lc.la)
lox
r~
#
(b)~/
u e
(c)
O.00 O.03 O.05 O.08 o-lo 0.13 O.16
qz('-~)
~ig. 3.- Meridional intensity functions
I~(q=)
for (a) analkylated
threebilayer
Ge,Si muliilajer substrate : dotted line is the calculated intensity function for the best electrondensity profile
model of thealkylated
threebilayer
Ge,'Simultilayer
substrate 16 twobilayers
of cd-arachidate on analkylated
Si substrate, (c) two bilayers of cd-arachidate on an alkylated three bilayer Gel'si multilayer substrate.
bt 8 X-RAY INTERFEROMETRY AND BILAYER ASYMMETRY IN LB FILMS l13?
Figure
3 contains theIc(q=)
functions for(a)
thealkylated
threebilayer Ge/Si multilayer substrate, (b)
twobilayers
of Cd-arachidate on analkylated
Si substrate and(c)
twobilayers
of Cd-arachidate on the
alkylated
threebilayer Ge/Si multilayer
substrate. The critical interferenceeffects,
as identified above for the one Cd-arachidatebilayer
on thealkylated
three
bilayer Ge/Si multilayer substrate,
arereadily apparent
infigure
3c for q= w(q~)~~~
=0.091~ '.
Forq~ ~
0.101~ ',
theIc(q~)
forfigure
3c isessentially
that offigure
3b for the twobilayer
Cd-arachidatemultilayer only, again
due to the presence ofonly
broad201wide
features in the
Ge/Si multilayer profile.
Thecorresponding
autocorrelation functions areshown in
figure4.
BothP~c~js;~~(z)
andP~AA~~(z)
have nosignificant
features forz ~z~~~
=1501
whileP~~jsi~~~A~~~(z)
hassignificant
featuresextending
to z~~~ m3001 thereby again directly verifying
the presence of the critical interference effects in theIc(q=)
function of thecorresponding figure
3c.(a)
i
(b)
I
~
2
(c)
i
O. 67. 133. 200. 267. 333. 400.
z(1)
Fig. 4.-Multilayer profile
autocorrelation function or Patterson functionP(z)
for(a)
analkylated
three
bilayer
Ge/simultilayer
substrate ; dotted line is the calculated Patterson function for the best electrondensity profile
model of the alkylated threebilayer Ge/si multilayer
substrate ; 16) two bilayers of Cd-arachidate on analkylated
si substrate ;(c)
twobilayers
of Cd-arachidate on analkylated
threebilayer Ge/si multilayer
substrate. The variousP(z)
havenonsignificant
fluctuations for z>z~~~indicated
by
the arrows in(a)-(c).
Figure
5 contain theIc(q~)
functions for(a)
thealkylated
twobilayer Ge/Si multilayer substrate, ~b)
the threebilayers
Cd-arachidatemultilayer
on analkylated
Si substrate and(c)
three
bilayers
of Cd-arachidate on thealkylated
twobilayer Ge/Si multilayer
substrate. The critical interferenceeffects,
as identified above for one or twobilayers
of Cd-arachidate on the threebilayer Ge/Si multilayer substrate,
are not soreadily apparent
in theIc(qz)
offigure
5c for tills case.Nevertheless, inspection
of thecorresponding
autocorrelationfunctions of
figure
6 shows thatP~~~js~~~(z)
has nosignificant
features for z ~ z~~ 1001
andl138 JOURNAL DE PHYSIQUE t4~ 8
(a)
lox
rN
#
(b)$
H
(c)
O.00 O.03 O.05 O.08 o-lo O.13 O.16
qz(I-1)
Fig.5.-Meridional
intensity functionsI~(q=)
for (al an alkylated two bilayer Ge/Si multilayer substrate (bj threebilayers
of cd-arachidate on an alkylated Si substrate. (c) three bilayers of cd-arachidate
on an alkylated t~40 bilayer Ge/Si multilayer substrate
(a)
(b)
N ~
~
~
(c) 1
0. 67. 133. 200. 267. 333. 400
z (i)
Fig. 6. Multilayer
profile
autocorrelation function or Patterson function Pin) for (a) an alkylated t~,obilayer Ge,'Si
multilayer
substrate (b) three bilayers of cd-arachidate on an alkylated Si substrate, (c) three bilayers of cd-arachidate on an alkylated two bilayer Ge,'Si multilayer substrate The various P(=) ha~e nonsignificant fluctuations for ± ~=~~, indicated by the arrows in (a)-(c)bt 8 X-RAY INTERFEROMETRY AND BILAYER ASYMMETRY IN LB FILMS 1139
that
P~~~~~
has nosignifibant
features for z~z~~~-~2001
whileP~~~js~~~~~~~~ does have
significant
featuresextending
out to z w z~~~3301. Hence,
the critical interference effects do indeed exist in theIc(qz)
function offigure
5c for qz w(qz)~~~
= 0.09
l~ '.
Hence,
asimple inspection
of these three different sets of the corrected meridionalintensity
functions and theircorresponding
Fourier transforms as described above forfigures
1-6firmly
establishes the existence of the effects of interference between theX-ray
diffraction from the two differentGe/Si multilayer
substrates and the diffraction fromthi
three different Cd-arachidate
multilayers
on thealkylated
surfaces of these substrates for 0.02l~~
=
(qz)m~n « qz «
(qz)max
0.09A~
Analysis.
The
multilayer
electrondensity profile
can be determinedby computing
the inverse Fourier transform of the structure factor[8J
for theprofile. However,
since the corrected meridional diffractedintensity
function isproportional
to the modulussquared
of the structure factor for themultilayer profile,
it therefore appears not to contain thephase angle
informationrequired
to compute the inverse Fourier transform. Thephase angle
information isgenerally
not
explicitly
measuredexperimentally,
and one must use either direct or indirect methods to determine the lostphase
information. As described in theIntroduction,
the direct methodsare based on
assumptions,
e-g-repetition
of asymmetric
unit cellprofile
toprovide
aperiodic multilayer profile,
which are notnecessarily
true in the real systems[7J.
An indirectmethod,
box-refinement,
which makes useonly
of the fact that the relative electrondensity profile
fora
multilayer
with a finite number oflayers
must be nonzeroonly
over a finite range of theprofile
coordinate z, canprovide
a valid solution to thephase problem,
but the solutioncannot be proven
unique [17,18J.
In thefollowing analysis,
thephase problem
was solvedunambiguously utilizing X-ray interferometry employing
a knownprofile
structure tophase
the
adjacent
unknownprofile
structure. Theseunique
results were thencompared
to those obtainedpreviously [7, 10,
19J via box-refinement.In this paper, we choose to use a
highly constrained,
real space refinementalgorithm
toimplement
the interferometricphasing
rather than thepoint by point phasing
in qz-space asdescribed in reference
[2J.
Theadvantage
of thisalgorithm
is that we can avoid severalsources of error to which the qz-space
point by point phasing
ishighly sensitive, especially
cofinting
statistics errors overregions
of qz for which the structure factor for either the knownor unknown
profile
structure is small and errors in the relativescaling
of the three different meridionalintensity
functionsemployed [2J.
For either of the aboveapproaches
toimplement
interferometric
phasing,
we first need to establish the relative electrondensity profile
for the« known »
Ge/Si multilayer
substrate. The initial models for the two and threebilayer Ge/Si multilayer
substrates were established on an absolute electrondensity
scaleguided by
ourspecifications
for their fabrication. Electrondensity
levels foramorphous
Ge and Si were calculated based on relevant data in the reference[20].
The initial calculated values foramorphous
Ge and Si in absolute electrondensity
scale were1.40e~/l~
and0.70e~/l~
respectively
in this case. The initial models were then relaxed via a model refinementprocedure utilizing comparisons
of the calculated meridionalintensity
and Patterson functions for the models with theirrespective experimental intensity
andcorresponding
Patterson functions. The same values of(qz)~d~
and(qz)~~~
truncation described for theexperimental intensity
functions(see Results)
wereapplied
to the modelintensity
functions in order toproperly
match theexperimental intensity
andcorresponding
Patterson function data and thusproduce (see below)
a relative electrondensity profile
for the two and threebilayer Ge/Si multilayer
substratesfully
consistent with such truncation.By successively adjusting
theseJOURNAL DE PHYSIQUE I T I, M 8,AOOT [WI 45
1140 JOURNAL DE PHYSIQUE I M 8
absolute electron
density
models within their fabrication errors, we were able to finalize themodels
yielding
the best agreement with theexperimental intensity
andcorresponding
Patterson functions. The best three
bilayer Ge/Si multilayer
absolute electrondensity
model is shown forexample
infigure
7a and its calculatedintensity
andcorresponding
Pattersonfunctions are shown as the dotted lines in
figures 3a,
4a. The calculatedintensity
function for the best model of the threebilayer Ge/Si multilayer
substrates was then eitherdoubly
Fouriertransformed,
orsubjected
to box-refinement[17,18] utilizing
anarbitrary
trial function(phase-shifted cosine), using
the same(q~)~,~
and(qz)~~~
truncation toprovide
the relati~e electrondensity profiles
for the best model.Figure
7b, c shows forexample
these relative electrondensity profiles
so calculated for thethereby
known threebilayer Ge/Si multilayer substrate,
assubject
to the(q~)~,~
and(q~)~~~
truncationoperative
in theseinterferometry experiments (see Results).
Twopoints
should be noteda)
theidentity
of the small features denotedby
« Si » and CDS » at thealkylated
surface of the twoslightly
different relative electrondensity profiles
so-calculated for the threebilayer Ge/Si
substrate have beenfirmly
established
by
theirunique correspondence
with variation of thesharpness
of these known features in the absolute electrondensity
model andb)
the best absolute electrondensity
model isactually
an excellent fit to theexperimental intensity
andcorresponding
Pattersonfunctions
[this
can be moredirectly
evaluatedby utilizing
forexample
the relative electrondensity profile
offigure
7c(which
has the dotted lineintensity
and Patterson functions ofGe Ge Go
I I I
(b)
Go Go G.
i I ~~~
(a)
~
Ii
(c)~ N
m ~
i
c~~
~
'Nj I
~
CDS
~~ ~~~
Si Si
© (d)
(
-200. -67. 200.
z >)
I I
S oos
-200. -67. 67. 200
z(i)
Fig.
7. (a) Electrondensity profile
p (=j for the best alkylated threebilayer
Gel'si multilayer modelon an absolute scale
(b) corresponding
relative electrondensity profile
&p (z) for the best three bilayer Ge/Si multilayer model via box-refinement; (cj corresponding relative electron density profile Ap(±)
for the best threebilayer
Ge/Simultilayer
model via double Fourier transformation. (d)fully-
relaxed relative electron
density profile &p(z)
for the best threebilayer Ge/'Si
multilayer model i,iahighly-constrained,
real space refinement. «CDS» in (a)-(d) indicates the alkylated octadecylsilane chain feature.bt 8 X-RAY INTERFEROMETRY AND BILAYER ASYMMETRY IN LB FILMS 1141
Figs. 3a, 4a)
as the trial function in ahighly-constrained,
real space refinement described below toproduce
thethereby fully
relaxed relative electrondensity profile
offigure
7d(which
has the
experimental
solid lineintensity
and Patterson functions ofFigs. 3a,
4aFigs.
7d and 7c arenearly
identical over theprofile
extent of the threebilayer Ge/Si multilayer
for1241«
z w
41).
A
highly-constrained,
real space refinementalgorithm utilizing
the normal box constraint and theespecially
restrictive known relative electrondensity profile
of theappropriate Ge/Si multilayer
substrate as the trial structure was thenapplied
to the meridionalintensity
functions from one, two and three
bilayers
of Cd-arachidatedeposited
on analkylated Ge/Si multilayer
substrate. The box-refinementalgorithm
is well known to converge to the local structure solution closest to the trial structure[17, 18J.
The «especially
restrictive nature of the known relative electrondensity profiles
for theseparticular Ge/Si multilayer substrates, namely
forso-determining
the relative electrondensity profiles
of theseparticular
ultrathinCd-arachidate
multilayers,
iseasily
understoodby
consideration of theexpression:
F(Ge/s>)~(AA
)~(qz)
=F(Ge/si)~ (qz)
+ F(AA)~(qz) (3)
in the
complex plane
where #i~~~js~~~(qz) is known ;#i~~~~~(qz)
and ji~~~js~~~~AA~~(qz) are both unknown. The pressure for iteration of thephase #i~c~js;~~~~~~~(q~)
function away from the initial trialphase
function#i~~~js;~~(qz)
isgenerated by
the difference between the moduli)F~o~js;~~~~~~~(qz))
vs.)F~~js~~~(qz)). Thus,
asF~c~js~~~(qz) progressively
becomes more dominate overF~AA~~(qz), #i~~js;~~~~~~~(qz) necessarily approaches #i~c~jsi~~(qz).
Given that the contrast in&p ~~js;~~(z)
isgreater
than that withinAp ~~A~~(z),
this situation is therefore best satisfiedby
the p~~js;~~~~~~~
(z) profile
structure and least satisfiedby
the p ~c~js;~~~~~~~(z)profile
structure in this work.Therefore,
thehighly constrained,
real space refinementalgorithm
utilized in this work forimplementation
of the interferometricphasing
of F~~~jsi~~~AA~~(qz)simply
uses this dominance of the known reference structure factorF~~~js~~~(qz)
to force the box-refinementalgorithm
to converge to the correct solution forAp
~~~js;~ ~AA)(z)
among the severalpossible
solutions[18] by initiating
the refinement in the~' ~
(qz)max
correct solution's local minimum in the function
[)F~c~js~~~~AA~(qz)(~-
qz)n~n
~
(qz)mm
Ic(qz)Jdqz/ I~(q~) dqz. Finally,
normal box-refinementusing only
the box-constraintqz)min
and an
arbitrary
cosine trial function were alsoapplied
to the meridionalintensity
functions from one, two and threebilayers
of Cd-arachidate on analkylated
Si substrate forcomparison
with the
unique
results obtained with the interferometric method. The box constraint for eachmultilayer sample
was determined from the extent of its Patterson function for themultilayer profile [7J
and the same values of(qz)~~
and(qz)~~~
were utilized in all cases. The derived relative electrondensity profiles
for one, two and threebilayers
of Cd-arachidate asdeposited simultaneously
onalkylated Ge/Si multilayer
substrates and onalkylated
Si substrates are shown infigure
8.Discussion.
Figures
7b and c show the twoslightly
different versions(see Analysis section)
of the known relative electrondensity profiles
for thealkylated
threebilayer Ge/Si multilayer
substrates assubject
to the(qz)~~~
and(qz)~~~
truncation described. In the threebilayer Ge/Si multilayer
1142 JOURNAL DE PHYSIQUE I hf 8
Ge Ge Ge
I I I
ii,,,
i, (a) (b)
i
, 'i i (CGG>~cd
'( '( ' 1~ j
J'~
i '(
/-,---,
I I I I
Si Sl Sl CH~ CH~
~s (C) I (d)
N ~/
~i ~
~3
(e) (f)
-200 -67. 67. 200. -200. -67. 67. 200,
z(i) z(1)
Fig. 8. Relative electron density
profiles
&p (z) for (a) one bilayer ofCd~arach14ate
on an alkylated threebilayer
Gel'si multilayer substrate using either the highly-constraining trial function offigure
7b (solid line) or offigure
7c (dotted line) ; (b) onebilayer
of cd~arachidate on analkylated
Si substrate, (c) twobilayers
of cd-arachidate on analkylated
three bilayer Ge/Simultilayer
substrate, (d) twobilayers
of cd-arachidate on an alkylated Si substrate; (e) threebilayers
of cd-arachidaie on analkylated
twobilayer
Ge/Simultilayer
substrate (f~ threebilayers
of cd-arachidate on an alk~lated St substrate. The boxes outline the cd-arachidate bilayer(s) m each case,case, there are three electron dense
germanium peaks
and two electron deficient silicontroughs,
and two lessprominent
features at theright edge uniquely
due to the surface siliconlayer
and thealkylated
chainlayer respectively.
The twobilayer Ge/Si multilayer
case i~similar to the three
bilayer
case except that it contains one lessbilayer (not sho~&,nj.
The results obtained viaX-ray interferometry
as describedusing
theseprofiles
as the kno~&nprofile
structure are shown infigures
8a, c and e. The left side of each contains theappropriate
two or threebilayer Ge/Si multilayer profile
while theright
side of each contains theprofile
of one, two or threebilayers
of Cd-arachidate. Each Cd-arachidatebilay.er.
at thisspatial
resolution determinedby (q~)~~, truncation,
contains twopredominant troughs
andone
predominant
centralpeak representing
the two electron deficient terminalmethyl
end group and the electron densecarboxyl
head group features of the head-to-headbilayer.
Additional Cd-arachidate
bilayers
are thusrecognized
uponcomparison
of the one, two and three Cd-arachidatebilaj,er multilayers
on thealkylated
Ge/Simultilayer
substrates.Figures
8b,d,
f contain thecorresponding multilayer profile
for one, t~&>o and threebilayers
of Cd-arachidate assimultaneously deposited
onalkylated
Si substrates and obtained via box- refinement.Note,
as will be discussedbelow,
theseprofiles
had to be somewhat smoothed iia convolution with a Gaussian function of width(FWHM)
=
201
m order to facilitate thecomparison
with their counterparts infigure 8a,
c, e. Otherwise, thepredominant fatty-acid
chain
endgroup
features and the lesspredominant
(at thisspatial resolution) intervening
chainbt 8 X-RAY INTERFEROMETRY AND BILAYER ASYMMETRY IN LB FILMS 1143
methylene
group features of the various Cd-arachidatebilayers
onalkylated
Si substrates arevirtually
identical to those of thecorresponding
Cd-arachidatebilayers
onalkylated Ge/Si multilayer
substrates.Hence,
thenon-unique
Cd-arachidatebilayer profiles similarly
derivedpreviously
via box-refinement for ultrathinmultilayers containing
one, two, three and fivebilayers deposited
onalkylated glass [1, 7, 8, 10,
19J ca1K now be considered as proven via X- rayinterferometry.
Inparticular,
a number ofphenomena previously
described at substan-tially higher spatial
resolution for theseparticular Langmuir-Blodgett deposition
conditions havethereby
been even morefirmly established; namely a)
disorder of the arachidatemonolayer
at themultilayerlair
interface[7, 10J, b) upstroke-downstroke asymmetry
in thearachidate
bilayers
causedby
averagearea/chain
differences andincomplete overlayer-
induced
ordering
of the disordered surfacemonolayer [1, 19J,
andc)
thedependence
of the lowtemperature
thermalmelting
of the less denseupstroke
arachidatemonolayers
on thenumber of arachidate
bilayers
in themultilayer [19J.
There are several other
aspects
of this work ofworthy
discussion.Firstly,
these Cd- arachidatemultilayers
containasymmetric (upstroke/downstroke) bilayers
and exhibit the effects of lattice disorder of the second kind[3J propagating
outward from thealkylated
substratesurface,
aspreviously
described[8J. Thus,
the macromolecular featuresdistinguish-
able in a
bilayer profile
at aparticular spatial
resolution are mostapparent
for thebilayer
onthe
alkylated
substrate surface and these features becomeprogressively
broadened(smeared)
for
bilayers increasingly
further from the substrate surface. This disorder is aproperty
of theparticular fatty-acid coupled
with thedeposition
conditionsemployed
and not a result of substrate surfaceroughness
it is manifested in the meridionalintensity
functionI~(qz)
viainterference of the structure factor for the Cd-arachidate
multilayer profile F~AA~~(qz)
with itself toprovide F~~~~~ (qz)
~.Secondly,
we noted above that the various features of Cd-arachidatebilayer profiles
in the ultrathinmultilayers deposited
onalkylated Ge/Si multilayer
substrates were more broad(at
constant
spatial
resolution via the same(qz)~~J
withrespect
to those for the otherwiseidentical
multilayers deposited simultaneously
onalkylated
Si substrates. Since the Cd- arachidatemultilayer profile
appears on the surface of thealkylated Ge/Si multilayer profile
via the critical interference of the
Ge/Si multilayer profile
structure factorF~~js~~~(qz)
withthe Cd-arachidate
multilayer profile
structure factorF~~~~~(qz), roughness
of theGe/Si
interfaces in the
Ge/Si multilayer
substrate is mostlikely responsible
for thisDebye-Waller [3J type
effect on the interference term ofequation (I).
Finally,
weagain
note that(qz)~~~
and hence thespatial
resolution of themultilayer
electron
density profiles
determinedunambiguously
viaX-ray interferometry,
wasseverely
limited in thisstudy by
the minimum thickness(m 201)
of the electrondensity
contrastproducing
Ge and Silayers
in theGe/Si multilayer
substrates achievableby
magnetronsputtering. Ge/Si multilayers produced by
MBE should notonly
remove this limitation since the Gelayer
thickness can be reduced to asingle
atomicmonolayer,
but it should alsoprovide
for
improvement
in the smoothness of theGe/Si
interfaces in themultilayer.
Conclusions.
We have utilized
X-ray interferometry employing
ahighly constrained,
real space refinementalgorithm,
to deriveunambiguously
the relative electrondensity profiles
of ultrathinmultilayers composed
of from one to threebilayers
of Cd-arachidatedeposited
via theLangmuir-Blodgett technique
on thealkylated
surface ofsynthetic Ge/Si multilayer
subs- trates. These results confirm several earlier results for such ultrathin arachidatemultilayers
onalkylated glass
or Si substratesutilizing
thenon-unique
box-refinement method forphasing
l144 JOURNAL DE PHYSIQUE I hf 8
the meridional
X-ray
diffractiondata, including
asymmetry within eachbilayer
of themultilayer
associated with theupstroke/downstroke
of theLangmuir-Blodgett deposition.
Realization of the
X-ray
interferometric method as describedprovides
apowerful
method forunambiguously deriving
theprofile
structure of bothperiodic
andnonperiodic organic/bio- organic monolayer
ormultilayer
systemsplaced
on orimmediately adjacent
to the surface ofan
appropriate
knownmultilayer profile
structure.Acknowledgments.
This work was
supported by
the National Science Foundation(NSF)
Materials ResearchLaboratofles
(MRL) Project
under Grant No. DMR-85-19059 and the National Institute ofHealth
(NIH) grants
GM-33525 and RR01633.References
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