• Aucun résultat trouvé

HOLE-DIFFUSION LENGTH AND TRANSPORT PARAMETERS OF THIN CDS FILMS FROM A SCHOTTKY BARRIER

N/A
N/A
Protected

Academic year: 2021

Partager "HOLE-DIFFUSION LENGTH AND TRANSPORT PARAMETERS OF THIN CDS FILMS FROM A SCHOTTKY BARRIER"

Copied!
2
0
0

Texte intégral

(1)

HAL Id: jpa-00229661

https://hal.archives-ouvertes.fr/jpa-00229661

Submitted on 1 Jan 1989

HAL

is a multi-disciplinary open access archive for the deposit and dissemination of sci- entific research documents, whether they are pub- lished or not. The documents may come from teaching and research institutions in France or abroad, or from public or private research centers.

L’archive ouverte pluridisciplinaire

HAL, est

destinée au dépôt et à la diffusion de documents scientifiques de niveau recherche, publiés ou non, émanant des établissements d’enseignement et de recherche français ou étrangers, des laboratoires publics ou privés.

HOLE-DIFFUSION LENGTH AND TRANSPORT PARAMETERS OF THIN CDS FILMS FROM A

SCHOTTKY BARRIER

J. Ebothe

To cite this version:

J. Ebothe. HOLE-DIFFUSION LENGTH AND TRANSPORT PARAMETERS OF THIN CDS

FILMS FROM A SCHOTTKY BARRIER. Journal de Physique Colloques, 1989, 50 (C6), pp.C6-

176-C6-176. �10.1051/jphyscol:1989630�. �jpa-00229661�

(2)

R E W E DE PHYSIQUE APPLIQUEE

Colloque C6, Supplt5ment au n06, Tome 24, Juin 1989

HOLE-DIFFUSION LENGTH AND TRANSPORT PARAMETERS OF THIN CDS FILMS FROM A SCHOTTKY BARRIER

J. EBOTHE

Institut Lebel, Universit6 Louis Pasteur, 4, rue Blaise Pascal, F-67000 Strasbourg, France

The minority carrier diffusion length of semiconductor thin films in polycrystalline form is determined with a good precision by EBIC and LBIC techniques ( I 2 )

.

The electron or laser beam used is scan- ned across the junction. The principle applied in these cases might be attractive for the semiconducting hand side of liquid Schottky bar- riers. However, these techniques cannot be easily used for such junc- tions. The methods based on the Gardner approach ( 3 ) remain so far more convenient here, especially when very thin films are concerned. In this context, two independent techniques, namely, the surface photovoltage

( SPV) ( 4 ) and the photoelectrochemical ( 5 ) measurements served in this work.

The optoelectronic and transport properties of thin sprayed CdS films, having a thickness of less than 2 ym are reported ( 6 ) . The two techniques used led to a good agreement in the hole-diffusion length values. These range from 0 . 0 1 7 to 0 . 1 5 ym and behaved differently in two zones. A rapid increase of this parameter is observed below a film thickness of 0 , 4 ym. Above this thickness, the value obtained is constant Specific space-charge widths are expected because of the respective measurement conditions. The hole-diffusion length decreases as carrier density increases. The hole lifetime shows a regular decreases as the thickness factor increases, while the hole-diffusion coefficient and mobility patterns are similar to that of the photocurrent.

References

*

( 1 ) J.J. OAKES, I.G. GREENFIELD and L.D. PARTAIN, J. Appl. Phys., 4 8 ,

2 5 4 8 ( 1 9 7 7 )

( 2 ) J.E. MAHAN, T.W. EKSTEDT, R.I. FRANK and R. KAPLOW, IEEE, Trans.

Electron Dev. ED-26, 7 3 3 ( 1 9 7 9 ) ( 3 ) W.W. GARTNER, Phys. Rev. 8 4 ( 1 9 5 9 )

( 4 ) B.L. WHEELER, G. NAGASUBRAMANIAN and J. BARD, J. Electrochem. Soc.

1 3 1 , 1 0 3 8 ( 1 9 8 4 )

(5) P. SALVADOR, J. Appl. Phys. 55, 2 9 7 7 ( 1 9 8 4 ) ( 6 ) J

.

EBOTHE , J

.

&pl.Phys. 59, 2076 (1 986)

Article published online by EDP Sciences and available at http://dx.doi.org/10.1051/jphyscol:1989630

Références

Documents relatifs

For this purpose, we used two characterization techniques which are: the X-ray diffraction (PANalytical X-ray diffractometer) for determining the structure of the films and also,

A similar effect of Te content on the localized states concentration has been observed by us during dielectric measurements of these samples reported elsewhere

The conductivity of WSe2, MoS2, WS2 thin films, obtained by solid state reaction between the metal and the chalcogen sequentially deposited, is controlled by grain boundary

- Energy kigenvalues for the arrangements of figure la, b, c, d (in arbitrary units). b) The point shown by the arrow in figure 2 remem- bers of a localised surface

F. ELECTROMIGRATION IN THIN FILMS : THE EFFECT OF SOLUTE ATOMS ON GRAIN BOUNDARY DIFFUSION.. - Des Ctudes portant sur des conducteurs en couche mince d'Al, d'Au et de Cu ont

The scanning electron micrographs show that annealing under selenium pressure (group B sam- ples) introduces a change in films morphology. While in situ

This is a strong indication that the TRTS- mobilities are indeed minority carrier (electron) mobilities relevant for the estimation of charge carrier diffusion lengths and that the

L’archive ouverte pluridisciplinaire HAL, est destinée au dépôt et à la diffusion de documents scientifiques de niveau recherche, publiés ou non, émanant des