• Aucun résultat trouvé

The effect of the oxygen ratio control of DC reactive magnetron sputtering on as-deposited non stoichiometric NiO thin films

N/A
N/A
Info
Télécharger
Protected

Academic year: 2021

Partager "The effect of the oxygen ratio control of DC reactive magnetron sputtering on as-deposited non stoichiometric NiO thin films"

Copied!
8
0
0

Chargement.... (Voir le texte intégral maintenant)

Texte intégral

Figure

Fig. 1. a) GI-XRD patterns of samples #01 to #13 deposited at different oxygen partial pressure p O2
Fig. 3. XPS and Raman analysis spectra of the Ni-O thin films sputtered under different p O2 atmospheres: a) Ni 2p3/2 XPS spectra and comparison with bibliographical data from refs
Fig. 5. Optical properties of NiO thin films sputtered under different p O2 atmosphere

Références

Télécharger maintenant ( PDF - 8 Page - 1.54 MB )

Documents relatifs

Effect of total pressure on La 2 NiO 4 coatings deposited by reactive magnetron sputtering using plasma emission monitoring

A porosity gradient La Ni O coating was deposited by co sputtering of La and Ni metallic targets in the presence of reactive argon oxygen gas mixtures using Plasma Emission

Plasma-oxygen Interaction During Thin Films Deposition By Laser Ablation: Determination Of The Interaction Pressure Threshold And Effect On The Thin Films Propertiese

Collected ions number as a function of the oxygen pressure Figure 3 shows the texture investigated by X-ray diffraction of the target and the vanadium oxide films deposited at