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TEMPERATURE DEPENDENCE OF THE
ELECTRICAL RESISTIVITY OF (V1-xCrx)3Si
SINGLE CRYSTALS
K. Berthel, B. Pietrass
To cite this version:
JOURNAL DE PHYSIQUE Colloque C6, suppldment au no 8, Tome 39, aofit 1978, page
C6-383
K.H. Berthel and B. Pietrass
Zentralinstitut ftlr FestkBrperphysik und Werkstofforschung der A& der DDR, 8027 Dresden,DDR
Rlsum6.- Nous avons mesur6 la rbsistivitg de la phase (VI-XCrX)3Si monocristalline (x = O...l) entre 4,2 K et 400 K. Lorsque la concentration de Cr augmente, la resistance P basse temperature Bvolue continuement de p ~ ~ ( x = O ) 1 @T5 (x=l). Les rlsultats sont discutBs dans le cadre d'un modile P 2 ban- des (s-d) avec un pic logarithmique pour la densitl d'ltat de la bande d. Le modile dlcrit la discon- tinuitd observle dans la pente de la rlsistivitd 1 la transition de la phase cubique 1 la phase t6tra- gonale dans V,Si, ainsi que les dlviations 1 la linBarit6 observBes 1 hautes tempgratures.
Abstract.- Theelectrical resistivity of single phase (VI-xCr,)gSi single crystals (x = 0...1) has been measured between 4.2 K and 400 K. With increasing Cr-content the resistance at low temperature changes continuously from p~~ (x=O) to p T 5 (x=l). The experimental results are discussed on the basis of a two-band (s-d) model with a logarithmic peak in the d-band density of states. The model describes the observed discontinuity in the slope of the resistivity at the cubic-tetragonal phase transition in V3Si as well as the deviation from linearity at higher temperatures.
EXPERIMENTAL RESULTS.- The investigation of the electrical resistivity of A15 intermetallic com- pounds can contribute to a better understanding of the electronic structure of these materials which have attracted much interest because of their unu- sual properties/l,2/. The V3Si and (Vl-xCrx)3Si sin- gle crystals used in our measurements were 0.5 cm in diameter and of 5 cm length/3/. The electrical resistivity was determined by dc current potentio- meter methods. In order to measure the resistance of superconducting samples below Tc a longitudinal magnetic field up to 190 kG was applied. The resi- dual resistance ratio of the best V3Si single crys- tals reached values R(300K)/R(17,5K) 2 80.
In figure 1 experimental results are given of the temperature dependent par pi = p-p of the re- sistivity of (V Cr ) Si single crystals between
I-x x 3
4.2 K and 400 K, where pr is the residual resistan- ce. With increasing Cr concentration the supercon- ducting transition temperature Tc decreases and the resistivity curves are changing substantially. The magnitude of the temperature dependent part and the bending of the resistivity curves at room tempera- ture decrease. In particular, the T2 and T~ depen- dent parts of the resistivity become smaller. For
creased oxygen content (sample 4). Increasing de- viation from the stoichiometric composition increa- ses the residual resistivity p and decreases the lattice transformation temperature T as well as
m
the magnitude of the kink in the resistivity curves at Tm. Oxygen impurities also increase the residual resistance, and the kink at T but they do not chan-
m ge T essentially.
m
DISCUSSION.- The experimental results are discussed within a simple two-band model. For this purpose the
traditional s-d-model/4/ has been modified to inclu- de the sharp peak in the d-band density of states near the Fermi-energy. Assuming a logarithmic peak
151,
D~(E)%~~(E~/1
E1
),
with the cut-of f energy Ec, the resulting expressions allow to fit the observed temperature dependence of the resistivity, in parti- cular the deviation from the linear behaviour above % 200 K and the anomalous behaviour at the cubic-tetragonal lattice transformation.
Under the influence of a tetragonal deforma- tion the peak in the density of states splits up in two peaks,
CrgSi a T' law the resistivity has been found
where the splitting energy 3A is proportional to the at low temperatures.
magnitude of the tetragonal deformation. For the In figure 2 the temperature dependence of the
residual resistivity we find the expression resistivity near the cubic-tetragonal lattice
2 p+A 1 p-2A
+
7
s(T)9s(T)}
transformation is shown for V3Si-samples of diffe- Pr = pO+pl"n T (2)
rent stoichiometry (salnples 1, 2 and 3) and with in- where is the chemical potential and and are
constants. The monotonic function S(x) introduced by Gorkov/5/ is proportional to -x2 for x?O and has the asymptotic behaviour S(x)bln(l. 13
1
XI
) for1x1 j r n
Fig. 1 : Temperature dependent part of the electri- cal resistivity pi = p(T)-pr of (Vl-xCrx) Si single crystals. : (I) x = 0, Tc = 16.7 K, or<] pdcm ; (2)
x = 0.05, Tc = 14.7 K,pr = 37 pncm ; (3) x = 0.2, Tc =8.4 K,p, =
41
W c m ; (4) x = 1, Tc<O.l K, pr=2 pacrn.It is noted that due to the narrow peak in the den- sity of states the residual resistivity depends on temperature, directly as well as indirectly over the chemical potential and the spontaneous tetra- gonal deformation.
Necr T where A/T is small, the residual m
'
resistivity (2) can be expanded in powers of A/T. To second order we find
p, = pr(A=O)+pI ($)2~'7
($1
+.. .
(3)Fig. 2 : Reduced resistivity ratio Ar(T) = {R(T)- R(17,5 ~)}/{~(293 K)
-
R(17,5 K)} as function df T~of V3+ySil-y single crystals, both without and with 02 impurities : (1) yLO.001, r" : 0.015, Tm=22.3 K; (2) y=0.003, rX=0.032, T,=21.2
K,
(3) y=0.010, rx0.078, no lattice transformation;.
(4) g=0.04, rX=0.14 (oxygen impurities), Tm=20.7 K. (r = R(17.5 K)/(R(293 K)-
R(17.5 K)).the tetragonal deformation. Moreover, it is negative if the Fermi energy is near the center of the peak in the density of states (
I
EFI
/Tm 6 1 ).
Hence, we conclude that (3) describes well the experimental facts expressed in figure 2.The authors wish to thank Dr. M. Jurisch and G. Behr for the preparation of the siqgle crystals.
References
/I/ Weger,M. and Goldberg,I.B., Solid State Phys. 28 (1973) 1
-
/2/ Milewits,M., Williamson,S.J. and Taub,H., Phys. Rev.
B13
(1976) 5199/3/ Jurisch,M., Berthe1,K.H. and Ullrich,H.J., Phys. Status Solidi (a)
66
(1977) 277/4/ Wilson,A.H., The Theory of Metals (Cambridge) 1954
/5/ Gorkov,L.P.and Dorokhov,O.N., J. low Temp. Phys. 22 (1976) 1