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Submitted on 1 Jan 1986
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AMORPHOUS HYDROGENATED ALLOYS : A COMPARATIVE EXAFS STUDY OF a-Si1-xCx : H, a-Si1- xGex : H, a-SiNx : H AT THE SILICON K-EDGE
A. Filipponi, P. Fiorini, F. Evangelisti, A. Balerna, S. Mobilio
To cite this version:
A. Filipponi, P. Fiorini, F. Evangelisti, A. Balerna, S. Mobilio. AMORPHOUS HYDROGENATED ALLOYS : A COMPARATIVE EXAFS STUDY OF a-Si1-xCx : H, a-Si1- xGex : H, a-SiNx : H AT THE SILICON K-EDGE. Journal de Physique Colloques, 1986, 47 (C8), pp.C8-357-C8-361.
�10.1051/jphyscol:1986870�. �jpa-00226192�
Colloque C8, supplement au n o 12, Tome 47, decembre 1986
AMORPHOUS HYDROGENATED ALLOYS : A COMPARATIVE EXAFS S'ruuf OF
.- - .-
azSil - Cx :H, a-Si, - Gex :H, a-SiNx :H AT THE SILICON K-EDGE'
I )A. FILIPPONI , P . FIORINI , F . EVANGELISTI, A. BALERNA' and S. MOBILIO"
Dipartimento di Fisica, ~niversit; "La ~ a p i e n z a " , I-00185 Roma, Italy
" I N F N Laboratori Nazionali d i Frascati, C.P. 1 3 , I-00044 Frascati, Italy
ABSTRACT
a-Sil-,C,
:H, a-Si,..,Ge,
:R , a-SiNx
:R alloys have been studied at the Si K-edge. Si-SI and Si-A (A being C, N, Ge) bond lengths have been determined as a function of composition. The Si-C distance was found to vary significantly, while the Si-Ge and Si-N distances remain almost constant. A high frequency signal has been detected in the a-SiI-,C, :H and a-SiN, :H films at large x due to a second shell contribution. The compositions of the first coordination shell are also reportedand discussed in terms of different local coordination models.
The study of semiconducting binary alloys is of great interest from the fundamental as well as applied point of-view. This is even more true for the hydrogenated amorphous alloys based on a-Si due to the flexibility of the deposition processes, 8.g. glow discharge, and an apparent continuous miscibility of the elements. This seems to be the case also for silicon-carbon and silicon-nitrogen that in the crystalline phase form a definite compound and are not miscible. Up to now no direct structural measurements have been reported on a-Sil-,Cx:II and a-SiNx:H while a-Si,xGex:H bas been already studied at the Ge K-edge [1,21.
In thispaper we report the first EXAFS study performed at the Si K-edge on three silicon based alloys : a-Si,-,C ,:H, a-Sit-,Ge, :H, a-SiN, :H.
EXPERIMENTAL AND DATA ANALYSIS
Three series of samples of a-Sil-,C, :H . a-Sil-,Ge, :X , a-SIN, :H were deposited by glow-discharge from binary gas mixtures of SiB4, GeH,. NH3 -- , CH, on berillium. quartz and silicon substrates.
(')work partially supported by PFE 11-ENEA