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Electron states and recombination velocities at semiconductor surfaces and interfaces
M. Lannoo
To cite this version:
M. Lannoo. Electron states and recombination velocities at semiconductor surfaces and interfaces.
Revue de Physique Appliquée, Société française de physique / EDP, 1987, 22 (8), pp.789-795.
�10.1051/rphysap:01987002208078900�. �jpa-00245612�
Electron states and recombination velocities at semiconductor surfaces and interfaces
M. Lannoo
Laboratoire des Surfaces et Interfaces
(*)
InstitutSupérieur d’Electronique
duNord,
41, boulevard Vauban, 59046 LilleCedex,
France(Reçu
le 2février 1987, accepté
le 16 avril1987)
Résumé. 2014 Le concept d’état associé aux liaisons
pendantes
estpassé
en revue. Il est montré que la hauteur de barrière deSchottky
peut être corrélée àl’énergie
propre moyenne des liaisonspendantes
de surface. La mêmepropriété
s’avère vraie pour les discontinuités de bandes auxhétérojonctions
entre semiconducteurs. Le modèleexplique
la relation trouvée par Tersoff entre ces deuxquantités.
La deuxièmepartie
est consacrée à la déterminationthéorique
des vitesses de recombinaison de surface. Il est montré que le modèle de Stevenson-Keyes
estcapable
de donner des vitesses de recombinaison de l’ordre de105 à 107
cm/s. Des travaux récents surInP sont discutés. Finalement une
expression semi-classique
des sections de capturemultiphonons
est utilisée, apportant des informationssupplémentaires
sur les états de surfacequi
dominent la recombinaison.Abstract. 2014 The concept of
dangling
bond states is reviewed. It is shown that theSchottky
barrierheight
canbe correlated with the average self energy of surface
dangling
bonds. The same property holds true for band offsets at semiconductorheterojunctions.
The modelexplains
the relation foundby
Tersoff between these twoquantities.
A second part is devoted to the theoretical determination of surface recombination velocities. TheStevenson-Keyes
model is shown to be able toprovide
recombination velocities of order105
to107
cm/s. Recent work on InP is discussed.Finally
a semiclassicalexpression
of themultiphonon
capture cross sections is used,providing
more information on the surface states which dominate recombination.Classification
Physics
Abstracts72.20J - 73.40 - 73.40V
1. Introduction.
Semiconductor device
performance
is oftengoverned by
the existence of surface or interface states. Suchstates can be due to the presence of
defects,
for instance trivalent silicon at theSi-Si02
interface orexcess arsenic at the
GaAs-oxyde
interface. Fermi levelpinning
atSchottky
barriers is also due tointerface states which are either metal induced gap states
[1]
or defect induced states[2].
Even the sidesurfaces of field effect transistors exhibit defect states which
play
animportant
role in deviceoperation.
One aim of this paper is first to
present
evidence that most of theexperimental
results can be con-nected
together through
theconcept
ofdangling
bonds. Such
dangling
bondsnaturally
occur at freesurfaces and for trivalent silicon at the
Si-Si02
interface. However we show that
they
must beimportant
as resonant states atSchottky
barriers and(*)
Unité Associée au C.N.R.S. N° 253,
that
they implicitely
govern band offsets at semicon- ductorheterojunctions. They
thusprovide
asimple physical
basis to understand Tersoffs modelrelating Schottky
barrierheights
and band offsets.They
arealso
important
for many kinds of defects.The second
part
will be devoted to a discussion of the surface recombinationvelocity
S. We reexaminethe
Stevenson-Keyes
formula[3, 4]
both in the low andhigh injection regimes.
We show that it canprovide
reasonable orders ofmagnitude
for S(
2013105
to107 cm/s)
in avariety
of situations. We then make an estimate of themultiphonon capture
cross-sectionsusing
a semiclassicaltheory
valid inthe
large temperature
limit. Weapply
it to recentwork on InP and show that it can serve as a test of the coherence between
spectroscopic
and electricinformations.
2. The nature of
dangling
bond states.We
only
consider here zinc-blende semiconductors which are characterizedby
the existence of fourArticle published online by EDP Sciences and available at http://dx.doi.org/10.1051/rphysap:01987002208078900
790
covalent
(and eventually partly ionic)
bonds.Any
time such bonds are broken
(Le.
atvacancies, surfaces, etc.)
there remain undercoordinated atoms withdangling
bonds. There isample experimental
evidence that these
dangling
bonds induce gap states. The best known case iscertainly
the vacancy in silicon for which severaldangling
bond levelscorresponding
to differentcharge
states have beenobserved
[5].
Howeverby
far thesimplest system
corresponds
to the isolateddangling
bond character-istic of the trivalent silicon atoms which exist in a Si
or at the
Si-Si02
interface. Such adangling
bond ischaracterized
by
one gap level[6, 7]
which can befilled
by
zero, one or twoelectrons, leading respect- ively
to theD+ , Do
and D-charge
states.Exper-
imental values of the energy levels
correspond
toionization
energies
whichobviously depend
oncharge
state..
Fig. 1.
-sp3 hybrid
orbitals involved in a covalent bond.The
simplest understanding
of theorigin
ofdangl- ing
bond states comes from thetight binding approxi-
mation. Here the wave function of the valence electrons is
expanded
in a minimal free atom basisset
consisting
of one « s » and three « p » wave functions per atom. Toclassify
the interactionsby
order of
importance
it is best toperform
a basischange
and build fourequivalent sp3
combinationson every atom, each of them
strongly pointing
towards a nearest
neighbour (see Fig. 1).
The domi-nant interactions will thus connect
pairs
ofsp3
hybrids
involved in the same bond. The energy level scheme of suchpairs
isanalogous
to the one ofdiatomic molecules and consists in one
bonding
statefilled with two electrons and one
empty antibonding
state. Interactions between bonds broaden the
bonding
states into the valence band and the anti-bonding
states into the conduction band(Fig. 2).
Insuch a scheme the
dangling
bondscorrespond
to asp3 hybrid
that has nopartner.
To lowest order its energy will remain thesp3
atomic energy. Further interactions act to shift itslightly
so that it becomes agap state as shown in
figure
2.Fig.
2. - Formation of the valence and conduction bands in zinc-blende semiconductors from thebonding
andantibonding
levels. Also shown is thedangling
bondenergy which, in the III-V,
splits
into two levels : one for cations, one for anions.This
simple picture
allows to understandeasily
thebehaviour of surface states. For instance the unre-
constructed
Si(lll)
surfacecorresponds
to an array ofparallel dangling
bonds. Their interaction broadens the isolateddangling
bond state into a halffilled band
(since the
neutral surfacecorresponds
toone electron per
dangling bond).
Under a 2 x 1reconstruction this band
splits
into a filled and anempty
subband(Fig. 3a).
The case of the(110)
faceof III-V
compounds
isslightly
different. There isnow one anion and one cation
dangling
bond theformer one
being
at lower energy. The situation for the unrelaxed surface is shown infigure
3b. However relaxation acts to shift these bands in such away’that
the gap is
emptied
as shown infigure
3c. The(100)
faces are a little more
complex involving
someamount of dimerization.
3.
Dangling bonds, Schottky
barrierheights
andband offsets.
It has been shown for some time that
Schottky
barriers on most III-V semiconductors are charac- terized
by
apinning
of the Fermi level(see
Ref.[8]
for a
review)
which ispractically independent
of thenature of the metal. Such
pinning already
occurs at afraction (- 0.2)
of amonolayer
ofdeposited
metal.These facts have led
Spicer
to propose hisdefect
model[2]
based on thehypothesis
that the Fermi level ispinned
on gap states, inducedby
semiconduc- tor surfacedefects,
whoseposition might
remainindependent
of the nature of the metal. This model has beenanalysed theoretically by Sankey et
al.[9]
Fig. 3.
- Schematicrepresentation
of thedangling
bondsurface bands for :
a) Si(lll)
2 x 1,b) GaAs(110)
before reconstruction,c) GaAs(110)
after reconstruction.who indeed
obtained,
from atight binding
calcu-lation,
astriking
correlation between the Fermi levelposition Eps
at the surface and gap statescorrespond- ing
to surface cation antisites.’
On the other hand Tersoff
[10]
haspointed
outthat there is a relation between
Eps
and the band offset at semiconductorheterojunctions.
Tersoff stheory
ofSchottky
barrierheights
is based on theexistence of metal induced gap states
[1, 8],
i.e. acontinuum of states that
overlaps
the semiconductor gap and whose wave functionsdecay exponentially
into the semiconductor. For the semiconductor it
uses the
concept
of acharge neutrality
levelEB (introduced by Tejedor
et al.[11])
whichplays
arole
analogous
to the Fermi levelEF
in a metal. Ifone
accepts
this view theSchottky
barrierheight
isthen determined
by aligning EF
andEB
characteristicof
each semiconductor.A direct check of this
theory
can be madeby considering
the interface between Au and many semiconductors. If one uses the observed barrierheights
asexperimental
values ofEB,
then onegets good predictions
for the band offsets. Tersoff has alsoproposed
a more or less ad hoc theoretical ruleto determine
EB [10]
from the bulk semiconductor band structure.Although
this rule worksremarkably
well its
physical origin
is not clear. Inparticular heterojunctions
do notnecessarily
involve interface states andEB
should be related in some way to surfacedangling
bond states. It is this relation which is examined in thefollowing
whereEB
will beidentified with the average self energy of
dangling
bonds.
Before
discussing
thispoint
further it is us,eful to have a look at thepresent
state of thetheory concerning
thepredictions
of band offsets. Arecent
review of this matter and of
Schottky
barriers isgiven
in reference[8].
Inpractice
available theoriesof band offsets are not
capable
ofpredicting
themwith the desired accuracy of 0.1 eV. Even the
experimental
values are notyet completely
re-liable
[12].
Atpresent
the most successfulpredictions
have been obtained from
simple semiempirical
theories. However there have also been
systematic
local
density [13]
as well astight binding
cal-culations
[14, 15]. Typical
results arègiven
in table 1showing
the kind ofagreement
that can be obtained.Table I. -
Theoretical and experimental values o.f valence band o.ffsets(in eV) .for d(fferent heterojunctions.
(a) Theory,
Localdensity [13].
(b) Theory, Tight binding
localneutrality [14].
(c) Theory,
Tersof’s model[lo].
(d)
This work with the parameters of reference[27].
(e)
This work with the parameters of reference[28].
792
Let us now come back to the relation between
EB
and thedangling
bond states. For this we firstexamine the interface betweén a metal and a cova-
lent semiconductor. As we have seen in section 2 the semiconductor surface is characterized
by
the exist-ence of localized
dangling
bond states. It is theircoupling
with the metal states that will dominate the electronicproperties
of the interface. Tosimplify
letus consider the
coupling
of eachdangling
bondseparately.
The situation ispictured schematically
infigure
4a where one can see that thedangling
bondstate becomes a resonant state, i.e. is shifted and broadened
by
its interaction with the continuum of metallic states. The broadeneddensity
of statescontains one state per
dangling
bond. The metal Fermi levelEF
must thenalign
with thebarycentre EB
of thisdensity
of states. Forreasonably symmetri-
cal
coupling
the shift of the resonant state withrespect
to the free surface energy is small so thatEB ~ Edb,
the free surfacedangling
bond energy.The conclusion is then that the role of Tersoffs
Fig.
4. -Broadening
of thedangling
bond stater into aresonant state :
a)
for covalentsemiconductors, b)
for anon-polar
face of III-V semiconductors.neutrality
level isplayed by
thedangling
bondenergy
Edb.
This
reasoning
can be extended to thenon-polar
surfaces of
compounds.
In such cases there are oneanion and one cation
dangling
bond levels which arebroadened as shown in
figure
4b. There are two states and two electrons perpair
ofdangling
bonds.For
reasonably symmetrical
situationsEF
must nowalign
withEdb
=2
the averagedangling
bond energy.
A more mathematical derivation of the identifica- tion
EB
=Édb
isgiven
in reference[25].
To substan- tiate this identification we have alsoperformed
atight binding
calculation of theposition Édb
forcovalent and III-V semiconductors
by
a selfconsis- tenttight binding technique analogous
to that usedfor the vacancy in Si
[14, 26]
and atheterojunctions.
The results are
compared
infigure 5,
for two sets ofparameters [27, 28],
to theexperimental position
ofthe surface Fermi level for Au on different semicon- ductors. The
agreement
isimpressive
and the trendis
clearly reproduced
for both sets ofparameters.
Fig. 5.
- SurfaceFermy
energy for Au on different semiconductors.Comparison
between theexperimental
value
( )
and the averagedangling
bond energy obtained with the parameters of reference[27] (---)
orreference
[28] (-.-.-.).
It remains to show
why
band offsets atheterojunc-
tions should be related to
Edb.
For lattice matchedsystems dangling
bond states willcouple by pairs
across the interface to form
bonding
andantibonding
states. For one
type
ofdangling
bondcharge
transferacross the interface is
directly imposed by
thedifference in
Eab
on each side. However in such covalent semiconductorsscreening
is very efficient and thischarge
transfer ispractically
reduced tozero, which
corresponds
to analignment
ofÉdb
oneach side. The
argument
can be extended to twotypes
ofdangling
bonds[25] showing
thatÉdb plays
the role of a surface Fermi
level, exactly
as waspostulated by
Tersoff. The theoretical offsets ob- tained in this way arecompared
toexperiment
intable 1.
4. Recombination velocities.
As
pointed
outby Aspnes [29]
there is adifficulty
in
understanding
the observed values of the recombi- nationvelocity (
~105
to107 cm/s)
whenusing
theStevenson-Keyes
formula[3, 4].
We shall then re-examine this
problem
in thelight
of recent work[30]
and with the
help
of theoreticalexpressions
for thecapture
cross-sections. TheStevenson-Keyes
ex-pression
is valid when thefollowing
conditions arerealized :
i) steady
state,ii)
constantquasi-Fermi
levels across the space
charge region
andiii) injected
carrier densities much smaller than bulk
doping.
Then,
the surface recombinationvelocity S
can bewritten
[4] :
In this
expression Ns
is the number of recombinationcenters per unit
surface,
of electrical levelET,
nb
andpo
are theequilibrium
bulk carrierdensities,
ni and
Ei
are the intrinsic concentration and surface Fermilevel, Fn
andFp
are thequasi
Fermi levels andF
their average. The term v03C3represents
thequantity
J Kn Kp,
whereKn
andKp
are thecapture prob-
abilities defined in
[4].
These areusually
rewritten asproducts
of thermal velocities(vn, vp)
timescapture
cross-sections
(03C3n, 0- p).
Thus v and u aregeometrical
averages of these
quantities. Finally,
as in refer-ence
[4]
we define uoby
which reflects the
asymmetry
incapture prob-
abilities.
A first estimation can be made in a
simple
situation where the
injection
level is low(F.
=Fp ),
the Fermi level is
pined
onET
and uo = 0. With reasonable valuesappropriate
to GaAs or InP(v =107 cm/s, Ns - 1013 cm- 2, nb
=1011 CM- 3
@ni
=107 cm- 3)
onegets
Under conditions where
pinning
is atmidgap ET
=Eu
uo = 0 and a --10- 15 CM2
then S is of order1014
cm/s i.e. about seven to nine order ofmagni-
tudes
larger
than observed values. Thishuge discrep-
ancy can be remedied
by reducing cr
to1O- 22,
10-24 cm2 (considered
asunphysically
smallby
sev-eral authors
[29, 30])
orby increasing
the de-nominator
or
by
any intermediate combination of the two.However recent work on InP
[30]
haspointed
outthe
importance
oftaking
into account the influenceof the
injection
level inexpression (1). In
theirsituation where
F. - Fp
= 1eV, F - Ei = -02eV nO-3x1017cm-3 n.=2x107cm-3
@Ns =1014 cm- 2
it is reasonable to assumethat,
in(1),
the denominator is dominatedby
the second term. One thengets
If,
with the authors[30],
one assumes that uo =0,
then onegets
a correct order ofmagnitude
S ~
105
cm/s with 0- =10- 15 CM2.
However thisanswer is not
unique
and it isimportant
to havesome
feeling
about the value which should beexpected
for 03C3.For this we make use of the
theory
ofcapture
withmultiphonon
emission that has beendeveloped
forpoint
defects. In this case non-radiative transitionsare induced
by
the electron-latticecoupling and,
athigh enough temperatures,
one can use a semiclassi- cal treatment which leads to794
where a = n or p and
03C303B1,0
201310- Il CM2 [31, 32].
Ifone
neglects
the smoothtemperature dependence
ofthe
prefactor,
thenEBn
andEBp represent simply
theclassical barriers for
capture pictured
on the con-figuration
coordinatediagram
infigure
6. This dia-gram
represents
the relevant total electronicenergies
of the
system
as a function of one normalized lattice coordinateQ
assumed to dominate the electron-lattice
coupling.
To fix the ideas we consider asingle
donor state and draw three curves :
Ev (Q)
when thedefect is in its
positive charge
state,Ec(Q)
afterexcitation of an electron-hole
pair through
the gap, andEo(Q)
when the defect hascaptured
an electronand there remains a free hole in the valence band.
The
simplest
treatment assumes that thethree
curves are
parabola
with the same curvature,Eo (Q ) being
shiftedby
an amountQo.
The par-ameters
defining
theproblem
are eg and the Franck- Condon shiftdFc
defined infigure
6. It is easy to show thatFrom this one
directly
deduces .and
A first remark is
that,
since u 0 -z CM2@
it ishard to
get
o- of order10-15 cm2 since,
even in the most favorable case where BO - 0 this wouldimply
that
duc - 1 eV,
which is anunrealistically large
value. The
only
way toget
some reasonable answerfrom
(4)
would be to assume that the denominator isunity,
i.e. uo -F - Ei 02 eV
. Then o, can beunity,
i.e. Mo 2013kT kT
° Then o- can bedecreased to
10- 19 CM2
which would now lead todFc
= 0.5eV,
much more reasonable. From the value of uo andusing (8)
one can nowget
an idea of eo which isequal
to 0.3 eV.A very interesting
conclusion can be drawn from these numbers. In reference[30]
it was deducedfrom different
spectroscopic techniques
that thesurface states of interest were located near the valence band maximum. However in the
configur-
ation coordinate
diagram
it isapparent
thatoptical
Fig. 6.
-Configuration
coordinatediagram (see text).
Eo
is theoptical
threshold in a Franck-Condon transition.transitions towards conduction band states are
shifted
by dFc
withrespect
tothermally
inducedtransitions. This means that the
apparent spectro-
scopic
distance in energy between surface states and the conduction band isequal
toEG/2 -
Eo + 2dFc which,
with the valuesquoted above,
isequal
to1.37 eV. This
exactly corresponds
toEG,
ingood agreement
withexperiment.
We have thus shown that the
apparent discrepancy
between observed values of S and
theory
can beeasily
resolvedalong
differentpossible
lines. Inparticular
conventionaltheory
ofmultiphonon
cap- ture can behelpful
in theanalysis
ofexperimental
data.
5. Conclusion.
We have
produced
evidence thatpinning
of theFermi level at
Schottky
barriers and band offsets at semiconductorheterojunctions
are relatedtogether through
the self energy ofdangling
bonds. In asecond
part
we have discussed in some detail conven-tional
theory
of surface recombinationvelocity
andhave shown that it can
provide
correct orders ofmagnitude.
We have also made use of a semiclassicalexpression
for thecapture
cross section toanalyse
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