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Radiation Hardening of Digital Color CMOS Camera-on-a-Chip Building Blocks for Grad Total Ionizing Dose Environments

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an author's h ttps://oatao.univ-toulouse.fr/23034

Rizzolo, Serena and Goiffon, Vincent and Corbière, Franck ,... [et al.] Radiation Hardening of Digital Color CMOS Camera-on-a-Chip Building Blocks for Grad Total Ionizing Dose Environments. (2016) In: Radiation Effects on Optoelectronic Detectors (CNES Workshop), 16 September 2016 (Toulouse, France). Unpublished

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Radiation Effects on Optoelectronic Detectors, 16th September 2016, Toulouse

Radiation Hardening of

Digital Color CMOS Camera-on-a-Chip Building Blocks

for Grad Total Ionizing Dose Environments

S. Rizzolo, V. Goiffon, F. Corbière, S. Rolando,A. Chabane, J. Baer, M. Estribeau, P. Magnan, O. Marcelot; ISAE-SUPAERO, Univ. Toulouse, France

S. Girard and T. Allanche; Univ. Saint-Etienne, Laboratoire Hubert Curien, France P. Paillet, M. Gaillardin and C. Marcandella; CEA DAM DIF, Arpajon, France M. Van Uffelen and L. Mont Casellas; Fusion for Energy (F4E), Barcelona, Spain R. Scott; Oxford Technologies Ltd.(OTL), Abingdon, UK

(3)

Context and Motivations

ITER remote handling operations require imaging systems

o Compact, lightweight and low power/voltage

o Radiation hard (failure TID >> 1MGy(SiO2)(>>100 Mrad))

Gamma radiation only (plasma OFF) o Color and high definition (≥ 1Mpix)

Tube camera, not suitable because of

o Size, cabling, voltage, resolution and reliability

Existing solid-state image sensor based camera

o Limited by their radiation hardness: ≤100 kGy

Dedicated development required

(4)

What can be found in literature:

o A few dark current measurements on STAR250 Active Pixel Sensor (APS) up to 1MGy (Bogaerts et al. 2003) (old non-CIS process)

o A few dark current measurements up to 2 MGy on CMOS APS developed for Electron Microscopy based on standard (non-CIS) CMOS process (Contarato et al. 2012)

What is missing:

o No result ever published on CIS processes in the MGy range

o An image captured with an APS/CIS exposed to 1MGy (=100Mrad) or more has never been published

o No data on the TID effects on opto-electrical performances of

APS/CIS in the MGy range

Rad-Hard CIS State of the art (MGy range)

(5)

Camera Radiation Hardening Strategy

4

Integrate all the required electronics

on a single Rad Hard (RH) CMOS IC

o No need for additional MGy RH electronics o Very compact

o Complete control of the radiation hardness

Pixel Array

ADC Decoders

Sequencer Color Filter Array

Readout chain

Associated RH developments

o Rad-Hard optical system (led by Univ. Saint-Etienne)

o Rad-Hard LED based illumination system (led by CEA)

RH Camera-on-a-Chip (this work)

(6)

Feasibility of a CMOS based Multi-MGy

Rad-Hard Color Camera-on-a-Chip?

Goal of this work:

o Demonstrate that CMOS Image Sensor (CIS) can withstand a TID of 1MGy or more

o Explore original mitigation techniques to improve the image sensor performances

o Analyze MGy radiation effects on CFA and on a basic imager ADC

5

Same building blocks in the ADC But hardness to improve But performances to improve Pixel Array ADC Decoders Sequencer Color Filter Array

(CFA)

Readout chain

( )

(7)

Presentazione della srategia con i due sensori

RAD HARD FUSEV

(8)

7

Experimental Details:

CIS overview & Irradiation Details

128x128 10µm pitch pixels Most sensitive part: 3.3V analog circuits Irradiation details: - 10keV X-rays

- CIS biased (sequenced)

- Room temperature - Dose rate: 180kGy/h - Dose values in Gy(SiO2)

Pure 1.8V digital and I/O pads: IMEC-ESA Rad-Hard DARE Library

3.3V Analog/Mixed signal circuits and pixels  Rad-Hard by

ISAE

180 nm commercial CIS technology

(60Co -ray in the paper)

GND in the paper

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CMOS Image Sensor (CIS) Design : photodiode

radiation hardening

Four 3T photodiode designs have been studied:

Standard Photodiode P+ Surround

P++

Classical Gated Diode (gate aligned N implant)

Gate (N-aligned)

Most Promising Designs for High Dose :

Gate with

voluntary N-overlap (0.3 µm)

Proposed Improvement: Gate Overlap Design

(10)

Post Irradiation Results: Raw Images

(no image correction)

9

Before Irradiation

@4 MGy (400 Mrad)

@10 MGy (1 Grad)

Standard Photodiode

Proposed Gate Overlap

Classical Gated

Surround P+

Gate Overlap

Acceptable image degradation

even after 1 Grad (10 MGy)!

(11)

Main Radiation Effects:

3.3V ELT PMOST Threshold Voltage Shift

Very limited 3.3V NMOST ELT degradation (<200mV Vth)

Large (& surprising) 3.3V PMOST ELTVth (>1V!)

1Grad 1Mrad

>1V

For more details on ELT MGy irrad. see: M. Gaillardin & al. “Multi-MGy ionizing dose effects in CMOS devices: from micron to decananometer technologies”

Limited MOVS reduction

Possible Mitigation Technique:

Full NMOST Readout Chain

• Compensated by decreasing PMOST current source bias voltage

Limited Maximum Output Voltage Swing (MOVS) decrease

(12)

Main Radiation Effects:

Dark Current Increase

Standard PD: 107X dark current rise @10kGy (1Mrad)

▪ no longer functional at higher radiation dose

Gate Overlap: best performances over the whole range

22°C

1Mrad 1Grad

Possible further improvements:

- Thinner gate oxide (GO2 GO1)

- Overlap distance optimization

10X or more possible improvement?

Gate N P SCR >104 X improvement 11

(13)

Strategy for Hardness Improvement

Large threshold voltage shifts in 3.3V ELT* P-MOSFETs

(>1V after several MGy)

2 mitigation techniques proposed

Only use 1.8V ELT* MOSFETs

Only use ELT* N-MOSFETs (3.3V)

Future work

Studied here

CMOS process:  Commercial CMOS Image Sensor 180 nm Irradiation:  60Co gamma irradiation (SCK-CEN) up to 6MGy(SiO2) (600Mrad) * = Enclosed Layout Transistor 12

(14)

1.8V architecture

clear radiation hardness improvement

RHBD Analog Readout Chain: Hardness Improvement

13

ELT P-MOSFET Vthreshold

3.3V

(previous work) 1.8V

(this work)

Electrical Transfer Function Acceptable swing reduction

6 MGy

prerad

TID

Only PMOST degradation!

(15)

1.8V RHBD pixel array organization

9 pixel design variations 2 discussed here (A and E)

Half of the sensor covered by a

Color Filter Array (CFA)

14

256 pixels

128 p

ixels

Non-irradiated

6 MGy

(SiO

2

) /

600 Mrad

Raw images captured by the manufactured CMOS image sensor:

(16)

Studied RHBD photodiode designs

Two gated photodiodes:

with an

overlap

between the gate and the N region

Which differ by their

pixel-to-pixel isolation

15

Pixel A:

P+ isolation

Pixel E:

gate isolation

N CIS

N CIS

gate

gate

(17)

Dark Current: Influence of Gate Voltage

0.1 MGy(SiO2), 22°C 3.3V P+ isolation 1.8V P+ isolation

Similar behavior between 3.3V and 1.8V pixels

Same behavior between P+ and gate isolation for Vgate<0

Gate isolation pixel : large dark current reduction for Vgate>0

N

GIDL (trap assisted

tunneling)

High field tunneling junction N P+ N optimum N N Gate Pwell No more tunneling junction 1.8V gate isolation

But why is the dark current dropping

so much?

(18)

Dark Current Compensation Mechanism?

17

Possible explanation:

▪ When the gate is depleted, part of the dark electrons diffuse toward the nearest N+ VDD contact through the STI weak inversion region

▪ Photo-electron are not collected by STI thanks to the P-Well barrier PMD Gate STI N CIS N+ e- e- Photo-electron (useful signal) Dark current electrons VDD junction STI trapped charge Pwell e- Dark current compensation path

(19)

Dark Current: Evolution with TID

18

1.8V design

▪  5X reduction

Gate isolation pixel

▪  2X further reduction

▪ Even larger reduction if

Vgate is increased further 3.3V pixel 22°C 1.8V P+ isolation 1.8V gate isolation Vgate = +0.7V

Between 5X and 10X dark current reduction

compared to previous 3.3V design

10X

(20)

RHBD Analog to Digital Converter (ADC)

Reasonable degradation after 6 MGy Not limiting the performance

19 Pixel array R ow sel ecti on

Sample & Hold

u p /d o wn c o u n te r u p /d o wn c o u n te r u p /d o wn c o u n te r u p /d o wn c o u n te r u p /d o wn c o u n te r Column selection Ramp generator Comparator Output buffer 10 bits Studied ADC test structure Clk 26 // Single Slope ADCs DNL 0.1 LSB INL 0.5 LSB Unirradiated DNL 0.2 LSB INL 2 LSB 6 MGy

TID

(21)

Color Filter Array:

Radiation Hardness Evaluation

20 No significant color filter degradation

Unirradiated 6 MGy(SiO

2

)

Color images captured by the manufactured CMOS

image sensor:

(22)

Conclusions

21 Sequencer Hardness improved Hardness validated

( )

Hardness validated After 1 Grad/10 MGy the CIS can still provide useful images

Multi MGy Rad-Hard Color Digital Camera-on-a-chip appears feasible

Development shall continue:

▪ Integrate all the functions in a single HD sensor

Exploration of alternative solutions to improve further the

performances (e.g. dark current? dynamic range?)

Hardness validated

( )

To be confirmed on a real sequencer Pixel Array ADC Decoders

Color Filter Array

Readout chain

The large 3.3V ELT

PMOST Vth is reduced in

the full 1.8V RHBD CIS

5-10X dark current reduction in the full 1.8V RHBD CIS

(23)

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