• Aucun résultat trouvé

SILICON CARBIDE CHEMICAL VAPOUR INFILTRATION

N/A
N/A
Protected

Academic year: 2021

Partager "SILICON CARBIDE CHEMICAL VAPOUR INFILTRATION"

Copied!
2
0
0

Texte intégral

(1)

HAL Id: jpa-00229557

https://hal.archives-ouvertes.fr/jpa-00229557

Submitted on 1 Jan 1989

HAL is a multi-disciplinary open access archive for the deposit and dissemination of sci- entific research documents, whether they are pub- lished or not. The documents may come from teaching and research institutions in France or abroad, or from public or private research centers.

L’archive ouverte pluridisciplinaire HAL, est destinée au dépôt et à la diffusion de documents scientifiques de niveau recherche, publiés ou non, émanant des établissements d’enseignement et de recherche français ou étrangers, des laboratoires publics ou privés.

SILICON CARBIDE CHEMICAL VAPOUR INFILTRATION

Y. Roman, L. Wolff

To cite this version:

Y. Roman, L. Wolff. SILICON CARBIDE CHEMICAL VAPOUR INFILTRATION. Journal de

Physique Colloques, 1989, 50 (C5), pp.C5-281-C5-281. �10.1051/jphyscol:1989534�. �jpa-00229557�

(2)

JOURNAL DE PHYSIQUE

Colloque C5, supplement au n05, Tome 50, mai 1989

SILICON CARBIDE CHEMICAL VAPOUR INFILTRATION

Y.G. ROMAN and L.R. WOLFF

Centre

for

Technical Ceramics, PO Box 513, NL-5600 M B Eindhoven, The Netherlands

The kinetics of a Sic chemical vapour deposition and infiltration process were studied. Sill and C284 were used as precursors:

S i S tg)

*

1/2C2a(~-Pi~(s) + 311t(g)

The composition and microstructure of the resulting coatings were investigated. Furthermore the deposition rate on the surface as well as in pores of the substrate were studied.

To this end, graphite substrates vere used rhac were provided with model pores: cylindrical holes 200-1000 n in diameter. The thickness profile of the Sic coating on the pore wall was measured using Scanning Electron Microscopy.

The dependency of this profile on the various process parameters like:

temperature, total pressure, gas composition and flow rate was studied. The results obtained in the present investigation vere compared to those obtained by other investigators (Fitzer, van den Brekel, Bossignol) and their respective chemical vapour infiltration models.

Apart from this f u n d ~ e n t a l approach to the CVI procese, a CVI apparatus is being developed for manufacfuring ceramic/cersmic composites. Fibrous preforms of either graphite or silicon carbide will be densified in this apparatus by CVI. The main goal of the present project is to produce denoe ceramic composite8 in this apparatus using CYK in a combined temperature and pressure gradient accroas the fibrous preform.

The resulting C/SiC and SiC/SiC composites will be characterized in terms of their microstructure and porousity, vith special attention being given to the fibre-matrix interface. Furthermore high temperature mechanical and corroeion properties will be determined in various atmospheres.

Article published online by EDP Sciences and available at http://dx.doi.org/10.1051/jphyscol:1989534

Références

Documents relatifs

Mode ex´ecutif : Matlab ex´ecute ligne par ligne un ’fichier.m’ (programme en langage Matlab.) Matlab s’occupe de d´eterminer le type et la taille des variables mises en

The work on the XFEL accelerating modules enters now the phase when all the series productions of the different components need to start to supply the final assembly at CEA

O of the lagoon deep waters correspond to present day surface ocean waters and support the view that these waters are indeed a remnant of oceanic waters from the time when the

II.2 Définition de la lithiase urinaire La lithiase urinaire est une maladie fréquente, résultant de la formation de biominéraux, les calculs ou “pierres”, autrefois appelées

El guante es complementado con telas algodonadas, lona suave, lino o mezclilla o de tipo Drill de colores claros (blanco, kaki, amarillo, etc.) material utilizado para

Oxidation stages of aluminium nitride thin films obtained by plasma-enhanced chemical vapour deposition (PECVD)... Oxidation Stages of Aluminium Nitride Thin Films Obtained

L’archive ouverte pluridisciplinaire HAL, est destinée au dépôt et à la diffusion de documents scientifiques de niveau recherche, publiés ou non, émanant des

The chemical affinity between Fe and Ni, provided by the Fe powder and thebinder respectively, derived on the formation of the (Fe, Ni) solid solution and FeNi3