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Comparison of 1D and 3D Electric Field Enhancement Analytical Models to Calculate the Dark Current Non Uniformity

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Comparison of 1D and 3D Electric Field Enhancement Analytical Models to Calculate the Dark Current Non

Uniformity

Kevin Lemiere, Christophe Inguimbert, Thierry Nuns

To cite this version:

Kevin Lemiere, Christophe Inguimbert, Thierry Nuns. Comparison of 1D and 3D Electric Field

Enhancement Analytical Models to Calculate the Dark Current Non Uniformity. NSREC 2019, Jul

2019, SAN ANTONIO, United States. �hal-02455988�

(2)

K. Lemiere (PHD student), T. Nuns and C. Inguimbert, are with ONERA-DPHY, 2 avenue E. Belin, 31055 Toulouse, France (tel.: 33 (0) 562252758, email: kevin.lemiere@onera.fr).

Comparison of 1D and 3D Electric Field

Enhancement Analytical Models to Calculate the Dark Current Non Uniformity

K. Lemiere, C. Inguimbert, T. Nuns

Abstract: A three-dimensional electric field enhancement model is proposed for our Monte Carlo tool used to calculate the Dark Current Non Uniformity, in order to better estimate the hot pixels number in the distribution tail.

I. INTRODUCTION

PACE is a hostile environment for electronic devices embedded in satellites. Light and heavy particles coming from different sources (supernovae, coronal mass ejection, solar wind, solar flares, radiation belts…) may induce transient and cumulative effects. This paper will be focused on cumulative non ionizing effects, the Displacement Damage Dose effects (DDD) [1]. It is the result of atomic displacements, consequence of the interactions occurring between incident space particles and the atoms of the bulk material. The resulting cascades of damage lead to the production of deep trap levels, which modify the electronic band structure of the semi-conductors.

In certain conditions, like in depleted regions where the density of free charge carriers is very low, the deep trap levels act as steps which enhance the emission of electron- holes pairs. In the presence of an electric field the thermal emission of charge carriers is amplified. As a result the dark current (intrinsic parasitic current) of reverse biased photodiodes is increased. As an example, in the worst case, these defects can severely damage the image sensor pixels and lead to increase the number of pixels which present a large dark current, the so-called hot pixels. It is thus important to be able to predict the degradation of the sensors in order to mitigate some undesirable effects onboard satellites. ONERA has developed an original Monte Carlo method dedicated to the prediction of the distribution of dark current through a pixel array, the Dark Current Non Uniformity (DCNU) [2]–[6]. Our Monte Carlo model, DAAN, estimates the DCNU through GEANT4 [7]

application and Universal Damage Factor (UDF) [8]. In first approximation, the Electric Field Enhancement (EFE) effect was taking into account with a one-dimensional approach [6]. But this approximation is known to overestimate the enhancement effect. A three-dimensional calculation is required to better estimate the distribution of hot pixels in the DCNU distribution tail. This paper proposes a new analytical formulation of a 3D EFE. It has been implemented in our DCNU Monte Carlo toolkit. The impact of this new model is investigated. After a reminder of the 1D model used in our tool in section II, a new 3D approach for the EFE mechanisms is presented in section III. The validation of this model is performed thanks to 3D TCAD simulations [9]. Finally the impact of this new 3D enhancement effect on the DCNU is evaluated. The comparison with new experimental data is also performed.

II. THEONE-DIMENSIONALELECTRICFIELD

ENHANCEMENTMODEL

Our Monte Carlo modeling tool has been described precisely in some previous works [2]–[6] and will not be detailed here. This section will focus only on the description of the EFE effect. The carrier generation can be enhanced by the electric field in two ways: the Poole-Frenkel (PF) effect and the Phonon-Assisted Tunneling effect (PAT). The Poole-Frenkel effect is a mechanism consisting into the generation of a carrier thermally generated assisted by the lowering of the potential barrier due to the presence of an electric field [10]. The phonon-assisted tunneling effect consists into the tunneling of a carrier thermally generated.

More precisely, we can decompose this mechanism in two steps: the thermal transition to a level under the top of the barrier and the tunneling through the potential barrier [11][12]. These effects are known to enhance the carrier generation in a depletion region of a PN junction and raise the so-called dark current.

A. The Poole-Frenkel effect

As a first approximation in our tool, the Poole-Frenkel effect and its combination with the phonon-assisted tunneling mechanism were computed in one dimension. The Poole-Frenkel effect induces a lowering of the potential barrier ∆𝐸𝑖 as illustrated on Fig.1. In the following of this abstract, we only exposed the equations concerning the electrons and not the holes for a clarity reason, because the equations for holes are very similar to those for electrons and follow the same principle. Holes will be considered more in details in the final paper. The thermal charge carrier emission of a trap 𝑒𝑛 (𝑐𝑎𝑟𝑟𝑖𝑒𝑟𝑠. 𝑠−1) can be evaluated from the principle of detailed balance:

𝑒𝑛= 𝜎𝑛𝑣𝑡ℎ,𝑛𝑁𝐶𝑒𝑥𝑝 (− 𝐸𝑖

𝑘𝐵𝑇) (1) with 𝜎𝑛 the capture cross section (𝑚²) of electrons, 𝑣𝑡ℎ,𝑛

the thermal velocity (𝑚. 𝑠−1) of electrons, 𝑁𝐶 the density of electrons in the conduction band (𝑚−3), 𝑘𝐵 the Boltzmann’s constant (𝑒𝑉/𝐾), 𝑇 the lattice temperature (𝐾) and 𝐸𝑖 the ionization energy (𝑒𝑉), the energy between the conduction band and the deep trap energy level. When considering the Poole-Frenkel effect, we can rewrite (1) introducing the barrier lowering ∆𝐸𝑖:

𝑒𝑛 = 𝜎𝑛𝑣𝑡ℎ,𝑛𝑁𝐶𝑒𝑥𝑝 (−𝐸𝑖− ∆𝐸𝑖

𝑘𝐵𝑇 ) = 𝑒𝑛𝑒𝑥𝑝 (∆𝐸𝑖 𝑘𝐵𝑇) (2) The electric field enhancement by Poole-Frenkel effect for a coulombic trap is then expressed:

𝑒𝑛

𝑒𝑛= 𝑒𝑥𝑝 (∆𝐸𝑖

𝑘𝐵𝑇) (3)

S

(3)

where the potential barrier lowering is expressed as ∆𝐸𝑖= (𝑞𝜋𝜀3𝐹)

1

2with 𝜀 the material permittivity and 𝐹 the electric field. The Poole-Frenkel is only dependent on material type and electric field.

Fig.1 : Field-induced mechanisms: Poole-Frenkel effect corresponds to a potential lowering barrier ∆𝐸𝒊. The Phonon-Assisted Tunneling is a two- step mechanism, first a thermal transition occurs then the charge carrier crosses the potential barrier

B. The Phonon-Assisted Tunneling mechanism

In order to express the phonon-assisted tunneling effect;

we have first to write the transparency 𝑇 of a barrier, first by considering a Dirac center in order to remove the Poole- Frenkel effect:

𝑇 = 𝑒𝑥𝑝 (−4 3

(2𝑚)1 2 𝐸𝑖3 2

𝑞ħ𝐹 ) (4)

with 𝑚 the effective mass (𝑘𝑔) of the charge carrier. The probability for a charge carrier to reach an energy band through phonon-assisted tunneling effect is the product of the probability of a charge carrier to be thermally emitted to a virtual level and the probability of crossing the potential barrier. In the literature [13], one can find the charge carrier emission enhancement for electrons:

𝑒𝑛

𝑒𝑛= 1 + ∫(𝐸𝐶−𝐸𝑡) 𝑘𝐵𝑇𝑒𝑥𝑝 (𝑧 − 𝑧3 2

0

(5) (4

3

(2𝑚)1 2 (𝑘𝐵𝑇)3 2 𝑞ħ𝐹 )) 𝑑𝑧

with 𝑧 is a possible energy transition normalized by thermal energy 𝑘𝐵𝑇. For a Dirac center, there is no Poole- Frenkel effect, and only the PAT applies.

C. Association of Poole-Frenkel effect and Phonon- Assisted Tunneling mechanism

In the case of a coulombic center, the Poole-Frenkel and phonon-assisted tunneling both apply. Moreover, it is possible to consider a hyperbolic potential barrier. [13] has approximated the expression of charge carrier emission with a semi empirical method:

𝑒𝑛

𝑒𝑛= 𝑒𝑥𝑝 (∆𝐸𝑖

𝑘𝐵𝑇) + ∫ 𝑒𝑥𝑝(𝑧 − 𝑧3 2

(𝐸𝐶−𝐸𝑡) 𝑘 𝐵𝑇

∆𝐸𝑖𝑘𝐵𝑇

(6) (4

3

(2𝑚)1 2 (𝑘𝐵𝑇)3 2

𝑞ħ𝐹 ) (1 − (∆𝐸𝑖 𝑧𝑘𝐵𝑇)

5 3

)) 𝑑𝑧

This equation has no simple solution and has to be solved numerically. [14] and [15] mentioned that the one- dimensional Poole-Frenkel effect overestimated the enhancement of carrier generation because it is only calculated at its maximum value, reached for an angle 𝜃 = 0 where 𝜃 represents the angle between the direction of charge carrier emission and the direction of the electric field [14].

The one-dimensional modeling was a first approach for our tool but the fact that it overestimates the enhancement leads us to use a three-dimensional approach in our calculations, presented in section III.

III. THETHREE-DIMENSIONALELECTRICFIELD

ENHANCEMENTMODEL

We now consider that the electric field carrier generation enhancement is depending on the angle 𝜃. This assumption introduces dependence on 𝜃 of the expression of the potential barrier lowering. In three-dimensional calculation, we have to make a correction on the potential depending on the carrier emission direction. We can rewrite (3) with 𝜃 dependence:

∆𝐸𝑖(𝜃) = (𝑞3𝐹𝑐𝑜𝑠𝜃 𝜋𝜀 )

1 2

(7) In order to calculate the enhanced charge carrier emission of electrons, we need to integrate on all possible directions of emission, characterized by 𝜃 and 𝜙. The calculation of the three-dimensional Poole-Frenkel effect is well known (see [14][15][16]) but in this paper we propose to combine the phonon-assisted tunneling effect with the three- dimensional Poole-Frenkel effect. First, we write the integration of charge carrier emission enhanced by Poole- Frenkel effect on all emission directions:

𝑒𝑛

𝑒𝑛= 1

4𝜋 ∫ 𝑒𝑥𝑝 (∆𝐸𝑖(𝜃)

𝑘𝐵𝑇 ) 𝑠𝑖𝑛𝜃𝑑𝜃 ∫ 𝑑𝜙2𝜋

0 𝜋

0

(8) Following the assumption made by [16] and [15], one supposes that the emission of a charge carrier is field independent for the hemisphere 𝜋 2⁄ ≤ 𝜃 ≤ 𝜋 . Hence we can rewrite (3):

𝑒𝑛 𝑒𝑛= 1

4𝜋[∫ 𝑒𝑥𝑝 (∆𝐸𝑖(𝜃)

𝑘𝐵𝑇 ) 𝑠𝑖𝑛𝜃𝑑𝜃 ∫ 𝑑𝜙

2𝜋 0 𝜋 2

0 (9)

+ ∫ 𝑠𝑖𝑛𝜃𝑑𝜃 ∫ 𝑑𝜙

2𝜋 0 𝜋

𝜋 2 ]

By introducing 𝑡 = 𝑐𝑜𝑠𝜃 and resolving the integral, we obtain the three-dimensional Poole-Frenkel enhancement [15] :

𝑒𝑛

𝑒𝑛= 1

2+ 1 + (∆𝐸𝑖

𝑘𝐵𝑇 − 1) 𝑒𝑥𝑝 (∆𝐸𝑖

𝑘𝐵𝑇) (∆𝐸𝑖

𝑘𝐵𝑇)

2 (10)

To extend the work done previously in [6], we choose to combine the three-dimensional Poole-Frenkel effect with the phonon-assisted tunneling effect. To do this, like for the three-dimensional Poole-Frenkel effect, we need to integrate on all over 𝜃 because of the spatial dependence of ∆𝐸𝑖 in this case:

𝑒𝑛

𝑒𝑛= ∫ 𝑑𝜙

2𝜋

0 ∫ [∫ 𝑒𝑥𝑝(𝑧 − 𝑧3 2

(𝐸𝐶−𝐸𝑡) 𝑘 𝐵𝑇

∆𝐸𝑖(𝜃) 𝑘 𝐵𝑇 𝜋 2

0 (11)

(43(2𝑚)1 2𝑞ħ𝐹(𝑘𝐵𝑇)3 2 ) (1 − (∆𝐸𝑧𝑘𝑖(𝜃)

𝐵𝑇)5 3 )) 𝑑𝑧] 𝑠𝑖𝑛𝜃𝑑𝜃

(4)

Like equation (6), this equation has no simple solution. To solve it numerically, one has to take care about the fact that the bottom limit of the integral depends on 𝜃: for each charge carrier emission direction, the potential barrier lowering is different so the impact on phonon-assisted tunneling is different as well. The impact of using a three- dimensional electric field enhancement model in our tool instead of 1D model is shown in the section IV.

IV. VALIDATIONOFTHREE-DIMENSIONALMODEL A. Simulation parameters

In order to analyze the results of our simulation with TCAD simulations, we have to remind all parameters that can be handled. First we fix the temperature both for our tool and TCAD simulation at 294.15K because in section IV.C the models will be compared to experimental data acquired at this temperature. A population of divacancy defects in his one negative state charge V2-/0, found to be place at approximately 0.71 eV from the valence band in the silicon bandgap [17][18] has been considered. This choice has been supported by the fact that the divacancy is a well- known and characterized defect, present at ambient temperature. The capture cross sections of electrons and holes are equal to 5 × 10−15 𝑐𝑚2. More details will be given in the final paper concerning the choice of trap parameters, followed with parametric studies to evaluate the impact of trap parameters on simulation and EFE. The analytical expression has been compared to TCAD simulations. A simplified model of a PN junction by juxtaposing two blocks of silicon (N+P type) has been modeled with TCAD. The N+ block is 1 × 1018 𝑐𝑚−3 doped and the P block is 1 × 1016 𝑐𝑚−3 doped. The PN junction has been reverse biased in order to obtain an electric field distribution close to a real pixel sensor. In our TCAD simulations, only the electric field distribution of the low doping level side is considered because the depletion region extends a hundred times more than in the high doping level side, and the free major carrier density is so high in N+

block that the net generation rate is too much impacted to be able to compare it with the generation rate of a depleted region.

B. Confrontation of our tool with TCAD simulations On Fig. 2 and Fig. 3, the electron-hole pair generation rate versus the electric field is plotted in logarithmic scale for X axis. This kind of plots gives us the electron-hole pair emission for a single trap level characterized by its cross sections at a given temperature for an electric field range.

The Poole-Frenkel effect is calculated for the divacancy trap level by our tool and in our TCAD simulation.

For this bias, from an electric field value of 3 × 106 𝑉/𝑚, our analytical model gives a low percentage error (approximately 7% from 3 × 106 𝑉/𝑚 to 1.5 × 107 𝑉/𝑚 in the worst case, below 2% beyond this electric field range) with the TCAD simulation. Nevertheless, under 3 × 106 𝑉/𝑚, a discrepancy between the two models can be observed. It can be explained by the fact that in TCAD simulations the free carrier density is taken into account in the calculation of the electron-hole pair generation: the free carrier density is not neglected. Contrary to TCAD simulations, our model calculates the thermal generation of a perfect depleted region, with no free carriers. In TCAD simulations, at the interface between depleted and neutral

regions (limit of the space charge region), the electric field is not strong enough to separate the free carriers from the depleted region. If there are free carriers near defects, they can act as recombination centres, not generation centres.

The sudden increase from 2 × 106 𝑉/𝑚 to 3 × 106 𝑉/𝑚 of the generation rate is explained by this mechanism: the electric field starts to strongly increase; the free charge carriers are removed, so the generation rate tends to increase to its theoretical value. This discrepancy does not impact our tool because we only look at the defects generating charge carriers in the depleted region of the pixel.

We now look at the generation rate when considering the Poole-Frenkel and phonon-assisted tunnelling effects in DAAN. We have to precise that in TCAD there are no simple models for the phonon-assisted tunnelling mechanism. We chose the Hurkx [19] enhancement model because is including PAT and band-to-band tunnelling, but the last effect occurs only for high electric field, so we can consider that this contribution is negligible. We keep the same trap level properties at the same temperature and the same PN junction model. The results are reported on Fig. 3.

As expected from the previous plot, a sudden increase of the generation rate at 2 × 106 𝑉/𝑚 can be observed. For electric fields comprise between 3 × 106 𝑉/𝑚 and 1.3 × 107 𝑉/𝑚, in the worst case an underestimation from the TCAD model of approximately 7.8% can be observed. For higher electric field, we observe in the worst case an overestimation compared to the TCAD model of 20.8% is shown. The discrepancy observed for higher electric field comes from the fact that in TCAD model the Poole-Frenkel and phonon-assisted tunnelling are only added, but our model shows a synergy mechanism between the two effects:

the Poole-Frenkel mechanism reduces the potential barrier Fig. 2 : Evolution of the electron-hole pair generation rate with the electric field for Poole-Frenkel effect only. The orange curve is the three- dimensional model, the blue curve is the TCAD simulation

Fig. 3 : Evolution of the electron-hole pair generation rate with the electric field for Poole-Frenkel effect associated with phonon-assisted tunneling mechanism. The parameters considered are the same as in Fig. 2

(5)

Fig. 4 : Distribution of the dark current density (DCNU) for one and three- dimensional models (black and red curves respectively) and experimental data (blue curve). SAPHIRRE experimental data comes from 6.5MeV one month after proton irradiation at a fluence of 3.89e9 p+/cm² at 294.15K.

but also enhanced the phonon-assisted tunnelling phenomenon itself.

C. Confrontation of our tool with new experimental data and with one dimensional model

In this section the results of our model in one dimension and three dimensions are compared to new experimental data. The SAPPHIRE image sensor is a product of Teledyne e2v [20]. SAPPHIRE component has been irradiated at Synergy Health facilities (Harwell, UK) for 6.5MeV energy and PSI facilities (Switzerland) from 72.8MeV to 200MeV at different fluences. Irradiation experimental data are also available for JADE (Teledyne e2V) CIS image sensor but not presented in this abstract. Comparison with JADE measurements will be presented in the final paper in order to link this paper to [6]. The experimental data for a proton irradiation at 6.5MeV for a fluence of 3.89e9 p+/cm² after one month is presented in Fig. 4. The DCNU is plotted for one and three-dimensional models as well as the experimental data for SAPPHIRE components on Fig. 4 in logarithmic scale for both X and Y axis.

The variation of electric field with depth in the pixel is given by Teledyne e2V and the electric field is determined randomly from this electric field map for each nuclear interaction in our simulations.

Fig. 4 shows that the three-dimensional model diminishes the highest dark currents by a factor from 2 to 3 compared to the one-dimensional model. The three-dimensional model allows a better fit of the experimental data for the dark current distribution tail.

The amplitude of high dark currents is reduced because the three-dimensional model does not overestimate the electric field enhancement. The discrepancy between the simulations and the experimental results that can be observed at low dark current values can be due to the fact that the Total Ionizing Dose (TID) effect is neglected in our model. The TID is responsible for the formation of shallow trap levels with a low dark current contribution contrary to non- ionizing dose. The TID is rather homogeneous and only affect the DCNU distribution peak. The choice of a divacancy with parameters presented in section IV.A seems to be consistent with the experimental data, but the consideration of another dark current contributor trap like the interstitial carbon-interstitial oxygen complex CiOi [21]

can help to improve our modelling of the DCNU. In the final paper, parametric studies on energy levels and cross sections of different traps are planned in order to study their impacts on the DCNU.

V. CONCLUSIONS

In this work is presented the implementation in our DCNU predicting tool of a 3D Electric Field Enhancement mechanism. The use of a three-dimensional approach allows avoiding the overestimation of one-dimensional electric field enhancement model. The amplitude of the highest simulated dark currents has been reduced by a factor from 2 to 3. This three-dimensional model has been compared to TCAD simulations performed in a PN junction. We have seen a good agreement between the TCAD approach and our analytical tool.

Finally the three-dimensional calculation has been compared to some experimental data obtained on the SAPPHIRE device from Teledyne e2v. It has shown that the 3D enhancement model better fits the experimental DCNU.

Parametric studies are planned to deeper investigate the trap parameters on the DCNU.

VI. REFERENCES

[1] J. R. Srour and J. W. Palko, « Displacement Damage Effects in Irradiated Semiconductor Devices », IEEE Trans. Nucl. Sci., vol. 60, no 3, p. 17401766, june 2013.

[2] C. Inguimbert, T. Nuns, E. Martin, D. Falguère, and O. Gilard, Monte Carlo based dcnu modeling. RADECS, 2012.

[3] C. Inguimbert et al., « Modeling the Dark Current Non-Uniformity of Image Sensors With GEANT4 », IEEE Trans. Nucl. Sci., vol. 61, no 6, p. 3323‑3330, dec. 2014.

[4] M. C. Ursule, C. Inguimbert, and T. Nuns, « Impact of the Border Crossing Effects on the DCNU for Pixel Arrays Irradiated With High Energy Protons », IEEE Trans. Nucl. Sci., vol. 63, no 4, p. 2159 2167, aug. 2016.

[5] M. C. Ursule, C. Inguimbert, T. Nuns, and J. Morio, « Comparison of Methods to Calculate the Dark Current Nonuniformity », IEEE Trans. Nucl. Sci., vol. 65, no 7, p. 13451354, july 2018.

[6] M. C. Ursule, T. Nuns, C. Inguimbert, H. Bugnet, F. Mayer, and J.

Pratlong, « Impact of the Electric Field in the Modelling of the Dark Current Non Uniformity in Pixel Arrays », IEEE Trans. Nucl. Sci., RADECS proceedings, 2018

[7] https://geant4.web.cern.ch/.

[8] J. R. Srour and D. H. Lo, « Universal damage factor for radiation- induced dark current in silicon devices », IEEE Trans. Nucl. Sci., vol.

47, no 6, p. 2451–2459, 2000.

[9] https://www.synopsys.com/silicon/tcad.html

[10] J. Frenkel, « On Pre-Breakdown Phenomena in Insulators and Electronic Semi-Conductors », Phys. Rev., vol. 54, no 8, p. 647‑648, oct. 1938.

[11] L. Kleinman, « Theory of Phonon-Assisted Tunneling in Semiconductors », Phys Rev 140 A637, 1965.

[12] D. Pons et S. Makram-Ebeid, « Phonon assisted tunnel emission of electrons from deep levels in GaAs », J. Phys., vol. 40, no 12, p. 1161

1172, 1979.

[13] G. Vincent, A. Chantre, and D. Bois, « Electric field effect on the thermal emission of traps in semiconductor junctions », J. Appl.

Phys., vol. 50, no 8, p. 5484‑5487, aug. 1979.

[14] A. K. Jonscher, « Electronic properties of amorphous dielectric films », Thin Solid Films, vol. 1, no 3, p. 213‑234, nov. 1967.

[15] P. A. Martin, B. G. Streetman, et K. Hess, « Electric field enhanced emission from non‐Coulombic traps in semiconductors », J. Appl.

Phys., vol. 52, no 12, p. 7409‑7415, dec. 1981.

[16] J. L. Hartke, « The Three‐Dimensional Poole‐Frenkel Effect », J.

Appl. Phys., vol. 39, no 10, p. 4871‑4873, sept. 1968.

[17] G. D. Watkins, « Intrinsic defects in silicon », Mater. Sci. Semicond.

Process., vol. 3, no 4, p. 227235, aug. 2000.

[18] J. C. Bourgoin and N. de Angelis, « Radiation-induced defects in solar cell materials », Sol. Energy Mater. Sol. Cells, vol. 66, no 1, p.

467‑477, febr. 2001.

[19] G. A. M. Hurkx, D. B. M. Klaassen, et M. P. G. Knuvers, « A new recombination model for device simulation including tunneling », IEEE Trans. Electron Devices, vol. 39, no 2, p. 331‑338, febr. 1992.

[20] https://www.teledyne-e2v.com/products/imaging/

[21] J. M. Trombetta and G. D. Watkins, « Identification of an interstitial carbon‐interstitial oxygen complex in silicon », Appl. Phys. Lett., vol.

51, no 14, p. 1103‑1105, oct. 1987.

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