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Submitted on 1 Jan 1989
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Low-temperature thermodynamic properties of
amorphous sputtered Zr 100-xCux alloys. Effect of
structural relaxation
F. Zougmoré, J.C. Lasjaunias, O. Béthoux
To cite this version:
Low-temperature
thermodynamic properties
of
amorphous
sputtered Zr100-xCux
alloys.
Effect of structural relaxation
F.
Zougmoré,
J. C.Lasjaunias
and O. BéthouxCentre de Recherches sur les Très Basses
Températures,
C.N.R.S., B.P. 166 X, 38042 GrenobleCedex, France
(Reçu
le 10 octobre 1988, révisé le 3janvier
1989,accepté
le 9janvier
1989)
Résumé. 2014 Nous
rapportons sur des mesures de chaleur
spécifique
à bassetempérature
d’alliages
Zr100-xCux
(19~
x~64)
préparés
parpulvérisation cathodique,
que nous comparons auxalliages
correspondants
obtenus par latechnique
d’ultra-trempe
de l’étatliquide.
Alors que latempérature
de transitionsupraconductrice Tc
est très voisine pour les deux typesd’alliages
amorphes,
indicationqu’elle
estpratiquement
insensible audegré
de désordre structuralplus
élevé induit par la
technique
depulvérisation,
par contre à la fois le coefficientélectronique
y et la contribution de réseau 03B2 T3 sontplus
élevés pour lesalliages
«pulvérisés
». Le caractère commun aux deuxalliages
d’une croissance de 03B3 avec la concentration en Zr est considérablement accentué dans le cas desalliages
«pulvérisés
».Cependant,
ces fortes valeurs de 03B3 assez surprenantes neconduisent pas à un comportement anormal pour le processus
supraconducteur,
ainsi que leprouve la condensation
électronique
totale en dessous deTc.
Tous lesparamètres
thermodynami-ques sont sensibles à la relaxation structurale, au contraire des
alliages trempés
duliquide,
tandis que la diminution de laTc
est similaire dans les deux typesd’alliages.
Abstract. 2014 We
report on
low-temperature specific
heat measurements ofsuperconducting
amorphous Zr100-xCux
(19 ~
x ~64)
alloys prepared by sputtering
that we compare tocorre-sponding alloys
obtainedby
fastliquid-quenching technique.
Whereas thesuperconducting
transition temperatureTc
is very close for these two kinds ofamorphous alloys, indicating
that it is almost insensitive to thehigher degree
of structural disorder inherent tosputtering,
both the electronic coefficient 03B3 and thelattice 03B2T3
contribution arelarger
for thesputtered alloys.
The common character of anincreasing
value of 03B3 with the Zr content isconsiderably
enhanced for thesputtered alloys.
However, suchsurprisingly high
y values do not lead to any anomalous behaviour for thesuperconductivity
process, asproved by
thecomplete
electronic condensation belowTc.
Allthermodynamic
parameters are sensitive to structural relaxation, at variance with theliquid-quenched
alloys,
whereas theTc depression
is of the samemagnitude
in both kinds ofalloys.
Classification
Physics
Abstracts 65.40 - 63.50 - 74.20F1. Introduction.
There is a
growing experimental
evidence for adependence
of numerousphysical properties
of
amorphous
metallicalloys
upon their conditions ofpreparation,
e.g. eitherby
vapor-quenching
(V.Q.)
orliquid-quenching
(L.Q.)
techniques.
Moreover,
upon theseconditions,
they
aredifferently
sensitive to structural relaxation[1].
It is now demonstrated
by X-ray
measurements, differentialscanning calorimetry
(DSC)
[2],
extendedX-ray
absorption
fine structure(EXAFS) [3]
and smallangle X-ray scattering
[4]
thatsputtered samples
exhibit a more disordered structure thanliquid-quenched
ones with adegree
of disorderprobably
intermediate between thin filmsvapor-quenched
onto a coldsubstrate and
melt-spun
ribbons.Furthermore,
properties
of materialsprepared by
vapor-quenching
onto a cold substrate can besignificantly
modifiedby
asubsequent
thermaltreatment,
contrary
to the case of theL.Q.
ones which have beenalready
« stabilized »during
quenching
from the melt. We hadpreviously
studied the effect of structural relaxation on thelow-temperature
thermalproperties
of Zr-basedsputtered alloys,
at Zrcomposition
close to75 at% : nominal
Zr76Ni24,
Zr76CU24, Zr80CU20 [5, 6].
In that case,thermodynamic properties
such as the electronic coefficient y, theDebye
temperature
BD,
thedensity
oflow-energy
excitations(or
two-levelsystems,
T.L.S.)
tend toward the values of thecorresponding
L.Q.
materials with initial densities for every kind of excitations
(electron,
phonon,
andT.L.S.)
whichlargely
exceed those ofL.Q.
alloys ;
in the sametime,
thesuperconducting
transitiontemperature
T,
decreases in a similar way as inL.Q.
alloys.
We have used the
possibility
by
varying continuously
the concentration andby
relaxing
thestructure to extend a similar
thermodynamic
study
to alarge
concentration range(19 --
x , 64at%)
of theZr,oo - xcux
system,
that wereport
here. Most of theprevious
conclusions areconfirmed,
concerning
theDebye
temperature,
thesuperconducting
transition and thelow-energy
T.L.S. excitations.However,
the behaviour of the electronicy coefficient
isquite
unexpected.
Itsmagnitude
remainsalways larger
than forL.Q.
Zr-Cualloys,
especially
athigh
Zr content where the structuralstability
of thealloy
decreases.Moreover,
y is very sensitive to thermal treatments, even toageing
at roomtemperature,
with senses ofvariation which
depend
on the concentration range of thealloy.
The paper is subdivised as
following :
in section 2 we describesamples preparation
andcharacterization,
and theacquisition
ofspecific
heat datatechnique,
i.e. theanalysis
of the transient responses to an heatpulse ;
in section3,
we describe results andanalysis
in the wholetemperature
range,including
the determination of7c
and the electronic contributionCe
in both normal andsuperconducting
states ; in section4,
we discuss the normal stateproperties
and the relation ofTc
with the electronic andphonon
densities of states. In a final section5,
we discuss thesuperconducting
state, with the electronic condensation process, thephonon
contribution at very lowtemperature
and the onset on the T.L.S contribution.Elsewhere is
reported [7]
theanalysis
of the TLSexcitations,
which are known to be acharacteristic of these
amorphous
materials. 2.Experimental.
2.1 SAMPLES PREPARATION AND CHARACTERIZATION. - The
amorphous samples
ofnominal concentration
varying
between 20 -- x -- 65 wereprepared by
ahigh-rate
(10 jim/h)
D.C.
magnetron
sputtering
technique [6]
at adeposition
temperature
of 77K,
in the form of foils about 2 x 4cm2,
80 to 100 m inthickness,
about 0.5 gweight.
In all theseries,
hydrogen
which could bepresent
at ratherlarge
concentration insputtered
films[8],
is notdetected
by
chemicalanalysis
[9]
within the limit ofdetection,
i.e. 10-2
weight
% or about1 at%. The absence of
hydrogen
in these bulksamples
is confirmedby
the excellentagreement
of7c
withL.Q.
ZrCu,
since7c
is known to be very sensitive to the presence ofhydrogen
in Zr-basedalloys
[ZrPd,
Zr-Ni,
...] [10].
The exact
composition,
obtainedby
absorption
chemicalanalysis,
indicates that incomparison
to the nominal concentration of thetarget,
there is adepletion
in Cu whichincreases from about 1 at% for
ZrSOCu20
to about 2 at% forZr5oCu5o
andZr3SCu6S.
In theCharacterization results.
1)
Thehomogeneity
of thesamples
isproved by
the massdensity
measurementssystematically performed
[by
Archimede method with toluene asacting
fluid]
on each of thefive or six foils of a same
deposition
batch,
and whichgenerally
differby
less than0.03
g.cm- 3.
These fluctuations of massdensity,
between differentfoils,
can be accounted forby
those ofconcentrations,
of the order or less than 1 at%. Weverify
the verygood
agreement
between our values(Tab.
1 andFig. 1)
and those forL. Q.
alloys
from two groups[11, 12],
which differ between themby
about 2 %. The effect of densification(-
0.25%)
onthermal
annealing, previously pointed
out on a same foil ofZr77CU23 [6]
could not be detected for othercompositions, being
within theuncertainty
of the measurements(about
0.01
g.cm- 3).
As well as for densificationeffects,
a decrease oflength
could beexpected
due to theannealing
of the frozen-in free volume. Irreversible contraction¥
of about 2 x10- 4
has been measuredby
Hillairet et al. in a similarsputtered Zr76Ni24 alloy,
whichTable I. - Characterization data
of sputtered
ZrlOO-xCux
samples.
* See also reference
[6].
Fig.
1. - Massdensity
versus the copper concentration x ofsputtered samples
(symbol 0)
and twoseries of
liquid-quenched
from reference[11] (Symbol e)
and reference[12] (symbol Âà, ).
Data ofcorresponds
to an(almost undetectable)
densification effect of the order or less than10- 3
[13].
2)
Similargood
agreement
withL.Q.
ZrCualloys
[11,
12]
is obtained for theposition
(2 () m)
of the mainX-ray
di f fraction
halo(Tab.
1 with thecorresponding
transfert momentumQp = 4 sin
()m
(À-
with À = 1.542À
forCu-Ka).
These6max
values are notnotably
affected
by
heat treatment either forL.Q.
orsputtered alloys.
But oneobserves,
for thesputtered
ones, anarrowing
(-10%)
of the width of the halo which indicates areorganisation
of theshort-range
structural order[4b].
Whencomparison
is made(e.g.
Zr6Ni24
prepared
in the same way[4c]),
the first halo is a little bit broader(-
10%)
for thesputtered
samples.
In a
general
way, these results for() m (Q p)
anddensity
confirm thesimilarity
of the averagestructural
parameters
for both kinds of materials.3)
Differential
thermalanalysis
data,
generally
obtained at aheating
rate of 20K/min,
areshown on
figures
2 and 3. Athigh
Zr content i.e. x -- 28 at%(Fig. 2),
recrystallization
occursin two
stages,
asalready
discussed[7] :
the first broad exothermicpeak
(symbol A
inFig.
3)
is the formation of metastableco-Zr,
which thereafter transforms inequilibrium
cy-Zr above400 °C
[4b].
We note that this wcrystallization
occurs at arapidly decreasing
temperature
for anincreasing
Zr content. The secondsharp peak
(symbol e
inFig.
3)
is the formation ofZr2Cu
at a rather constanttemperature
of 340 °C. For copper contentlarger
than 28at%,
the w-Zrcrystallization
stage
is no more detected.Instead,
theunique crystallization peak
Fig.
2. -D.S.C.
thermograms
of parts ofsputtered samples
(exact
composition
reported)
at aheating
rate T = 20 K
min- l.
The dashed line is the base-linecorresponding
to therecrystallized
state. For(T.,
symbol
0 inFig.
3)
ispreceeded
by
a broad endothermicsignal
characteristic of aglass
transition
( TG,
symbol
0 for x =32,
38,
48at%)
defined as thebeginning
of the endothermiceffect.’
Also in that case a verygood
agreement
for bothTG
andT.
is obtained between thesesputtered alloys
and theL.Q.
ones(Fig. 3).
Fig.
3.- Sputtered samples : crystallization
(T.,
symbol
D)
andglass-transition
(TG,
symbol
0)
temperatures versus x. Below x = 28 at%, 8 and. represent the two
crystallization
stages(see
Fig.
2 andtext) ;
symbols
(D and M representTG
andTx
ofsputtered Zr40Cu60
fromWalmsley
et al.[16]
(T =
20 Kmin-l) ;
the dashed-lines formelt-spun
from reference[12] ( T
= 10 Kmin- 1).
A characteristic difference between both kinds of
alloys
lies in thelarger
irreversible exothermic effect for thesputtered alloys,
measuredby
sensitive differentialscanning
calorimetry
(DSC)
on the firstheating
above roomtemperature
[2].
ForZrg1Cu19
andZr77CU23,
the heat release is of the order of 1 kJ/mole[14].
This effect has been ascribed to adecrease of the
configurational enthalpy,
which islarger
in the initial state ofsputtered alloys,
due tohigher
disorder[15].
4)
Sensitive structuralinvestigations
such as extendedX-ray
absorption fine
structure(EXAFS)
andsmall-angle
X-ray
scattering
(SAXS)
wereperformed
on somesamples.
Bothtechniques
confirm thehigher degree
of structural disorder incomparison
to L.Q.alloys.
InSAXS,
the flat Lauescattering
of the« as-sputtered » samples
is the indication of anhomogeneous
medium[4b].
Thermal treatments cause
tiny,
but stilldetectable,
variations of the structuralparameters.
There is a trend for
clustering
of the Zr atoms inZr77Cu23
as shownby
EXAFS[3].
5)
Another characteristic difference between the two kinds ofalloys
is the irreversible decrease of the electricalresistivity
on firstheating
(by
about 1%)
insputtered alloys
(Zr76Ni24, [13]),
whereas it is almost absent($
lo- 4)
inL. Q.
This relaxation effect is ascribedto a
topological reorganization
on a local scale[13].
In
conclusion,
sputtered alloys
are in ahigher degree
o f structural
disorder thanL.0.
on therecent
study
of theirdependence
upon the conditions oflow-temperature deposition
foramorphous
H20
orD20
films[17].
The effects of structural relaxation areconsequently larger
in
sputtered alloys
than inL.Q.
However,
no structuralinhomogeneities
such asphases
separation
have been detected in thesesamples,
eitherby
X-ray
investigations
[4, 18]
or fromtheir
superconducting properties by
theunicity
of the transition.At
last,
EXAFSinvestigations
[3, 19]
do notpoint
out chemical short range order(C.S.R.O.)
in the Zr-Cusystem,
either forsputtered
(Zr77CU23, Zr8lCU19-II)
orL. Q. ,
except
athigh
Cu content(Zr40CU60-L.O.).
This is at variance with the Zr-Nisystem.
Thermal Treatments.
Samples
have been measuredfirstly
in their «as-prepared »
state, afterbeing
removed from thedeposition
apparatus
at roomtemperature,
andsecondly generally
after anisothermal
annealing
of onehour,
under anatmosphere
ofultra-pure
argon, attemperature
Ta
well blow thecrystallization
temperature
( Ta
= 200 °C for 19 -- x --38,
Ta
= 250 °C forx =
48),
orageing
at roomtemperature.
Between the measurements,samples
are stored inliquid nitrogen.
2.2 SPECIFIC HEAT TECHNIQUE. - The
specific
heat of about 1 to 1.5 g of material(two
orthree
foils)
was measured on aHe3-He4
dilutionrefrigerator by
means of a transient heatpulse technique.
Thetemperature
variesstep
by
step,
over a range(0.08
K to 7.5K)
which includes thesuperconducting
transitionT,.
Thevalidity
of the transienttechnique
is based onthe condition that the internal time constant due to the thermal
coupling
between thesample
foils must remain small
compared
to T which characterizes theexponential
temperature
decay
back to thermal
equilibrium,
and which isequal
to theproduct
of the total heatcapacity
times the thermal resistanceRe
of the link to the cold sink[20a].
In thepresent
case, this is obtainedby
asample
holderarrangement
welladapted
to thesample
geometry
and which ensures agood
thermaldiffusivity, especially
at very lowtemperatures
(T« Tc)
where no moreelectronic
diffusivity
ispresent :
thesample
foils arepressed
between two siliconplates
of similarsurface,
one of those isequipped
with theheater,
and theopposite
with thethermometer and the thermal
link,
with anadapted
value ofRp .
Such anarrangement
has been tested and used in numeroussamples
of bad thermaldiffusivity
[6,
20a-b,
21].
The accuracy of determination of
C p
has beenimproved by
an automatic dataacquisition
and
analysis
of theexponential
transients(Figs.
4a andb).
During
a set ofacquisition,
the referencetemperature
of the copper screen around thesample
holder isregulated by
afour-wire
probe bridge
within10- 4
of the fixedtemperature.
Thesignal
of the measurementresistance is also
amplified by
an a.c.( f
= 90Hz)
bridge.
Theprocedure
is thefollowing :
a)
for the definition of the baseline,
corresponding
to the referencetemperature,
10 datapoints
are taken. Each of them is the average of 4points
taken atmicrocomputer
clock pace(every
10ms).
Sothey give
a well-defined baseline,
parallel
to the x axis(time) ;
b)
at the 10thpoint,
a heatpulse
of energyR 2 t
isautomatically
sent on thesample
during
alaps
of time t.Throughout
the 40th datapoint
after the maximum(kl
onFig.
4a),
datapoints
are taken withoutaveraging,
at a pace which isgenerally
10 timesgreater
than for theaveraged points.
So onegets
experimental
data(S,,,,p)
very close to the realsignal
in the criticalregion
for thespecific
heat calculation :heating
up,decay
of thesignal
down to orbeyond
the inflexionpoint
(k2
inFig.
4a),
whichcorresponds
to the onset of theexponential
decay regime
of thetemperature,
when thermalequilibrium
is established within the wholesample
and also between thesample
and the differentaddenda ;
Fig.
4.- a)
shows the temperaturedecay
after a heatpulse
and itsanalysis by
means of amicrocomputer
for determination of theexponential
variation : + forexperimental decay
(Se.,P) ;
dashed-line for theoretical one(Sth).
K2
andK3
can be moved forfitting
as close aspossible
theexperimental
data ;b)
is aplot
of AS =Sth -
S,,,p
versus times(arbitrary units).
It shows that the fit offigure
4a is within about 1 % of thesignal.
d)
between k2
andk3,
thepoint
at which thesignal equals
20 % of the maximumdeflection,
theexponential decay
is fitted toexp (- ak
+ b),
calledSthe,,, ; a
and bbeing
determinedby
alinear
regression ;
e)
thereafter,
we determinekI, point
of the idealized instantaneous heatjump
of thesample, by equalization
of areas A and B offigure
4a,
corresponding
to the conservation of energy sent into thesample :
or
where the
integration
ofSexp
isperformed by
atrapezoidal approximation
method in thisregion
withlarge density
of datapoints.
Then,
from abscissakI,
onegets
the finalR
f( oc Sf = exp ak, + b ])
and initialR;
(
oc S;
ofFig.
4a)
resistance values of thethermometer,
and from the calibration law the initial and finaltemperatures
(Ti, T f) .
The three coefficientsAi, Bi
andCi
i of the standardization law of the thermometer[Log Ri = Ai (Log. T)2 + Bi (Log., T) + Ci]
aredetermined for each value of the resistance
Ri by fitting
the calibration curve to aparabola
throughout
the i -3, i - 2, i - 1, i, i
+1, i
+2, i
+3,
points
of calibration[20a].
This determination of 3parameters
Ai, Bi
andCi,
welladapted
to theSi-doped
thermometers,
ismore
precise
and continuous than the usual method ofapproximation by polynomials
ofhigher degree
over alarger
number of calibrationpoints.
The thermometers
presently
used are Si sheetsdoped
with P or Bby
ionicimplantation.
They
show a remarkablestability against
the thermalcycles.
In thepresent
case,along
thisseries of
experiments
(about 20),
the resistance variedby
less than 0.05 Q over 80 at 4.2K,
corresponding
to a variation intemperature
less than 10 mK.At
last,
if W is the electrical power(Rf t)
used forheating,
the total heatcapacity,
including
Waddenda,
ismC
= Tf - Ti
Thespecific
heat of thesample
is obtained aftersubtracting
the3.
Spécifie
heat dataanalysis
and results. 3.1 DATA ANALYSIS. - Wecan
distinguish
threetemperature
ranges, characterizedby
different
weights
forphonon,
electronic or T.L.S. contributions :i)
betweenT,
and7 K,
there is agood
agreement
ofC p
with the usualy T +
,8
T3 law,
as shownby
theplot
C/T
versusT 2in
figure
5 for somesamples
of the series. Such avariation,
including
sometimeshigher
power terms(oc
T5),
isgenerally
alsoobeyed
for Zr-basedmelt-spun alloys
in similarT-range
[22-24],
and moregenerally
for numerousamorphous
metallicalloys
[25].
From the electronic coefficient y one obtains thedensity
ofstates at Fermi level :
N, (EF)
=3 y
(states.
e v- 1 .
atom- 1,
with y in mJ.mole - 1 .
K- 2) ;
,7r 2 k2.- .-lu
and from the lattice
T3
term, theDebye
temperature :
Fig.
5. -Cp/T
versusT2 for sputtered amorphous samples.
All data, but for x = 19 at%(sample II),
correspond
to annealedsamples.
The continuous lines represent the fit to thel’ T + f3 T3 law
aboveTc.
ii)
the electronicspecific
heatCe,
obtained fromCp
aftersubtracting
thephonon
ceT
Fi
12 . Thecontribution {3
T3,
can beplotted
asT
versus T(Fig. 6)
orlog
Ce
versusT
(Fig. 12).
TheT
’Y Tc
Tfirst
diagram
enables the determination of7c by
the criterion ofequalization
ofentropy
for theexperimental
transition and for the idealizedspecific
heatjump
at T =Tc ;
it also enablesan
improved
determination of y incomparison
tofigure
5. The seconddiagram allows
one toverify
theexponential
decay
of the electronic contributionC es
below7c
(starting
at7"
20132).
This determination is alsoimproved
if one subtracts the T.L.Scontribution,
asT
)
pdiscussed in section 5.
iii)
this T.L.S. contribution becomespredominant
fortemperatures
below 0.5K,
or more7"
precisely
whenCes
hasvanished,
i.e.for ) ±
6(Fig. 12).
h Y es
Fig. 6.
against
T. Thisdiagram
allows the determination ofT, by
theequalization
of entropy for bothexperimental
and idealizedspecific
heatjump
atT,.
It also allows agood
determinationof the electronic coefficient y above
Tc;
; here y = 11.7 ±0.2 mJ.mole-l.K-2 for
ZrS1Cu19
(II)
and7.45 ± 0.1
rnJ.mole-l.K-2
forZrCu32 (annealed).
3.2 RESULTS FOR THE NORMAL STATE.
3.2.1 Electronic
density
of
states. - In table Il andfigure
7 are collected values ofN y(EF).
These values determined from yn aboveT,,
have been submitted to the criterion ofequality
ofentropy
insuperconducting
and normal states. If we assume the same lattice/3 T3
term in the two states, one must haveSn (Tc)
=Ss(Tc),
and therefore :There is a
good
agreement
for the whole series : calculated ys agrees with the measured Ynabove Tc
within 1 to 6 %(with Ys> Yn),
except
forZrg1Cu19 (I)
and(II)
where ysexceeds
ynby
11-14 %. But we note that at thishigh
Zr content, there is anuncertainty
concerning
the lattice contribution in thesuperconducting
state which is veryprobably
smaller than aboveTc
[Ref. [6]
and Sect.5]
and which couldparly explain
thediscrepancy.
For
Zr52Cu48,
there is aslight discontinuity
at T = 1.9 K(see
Fig.
5)
which can beanalysed
as an increase in yby
about 5 % below thistemperature,
feature which is not modifiedby
subsequent annealing.
A similar feature has been observed inZr60Cu40
[23]
and inZr62.9Ni37.1 [29],
which,
for the second case, has been ascribed to the presence of a secondamorphous phase,
but undetectableby X-rays.
The main results forN y (EF)
are thefollowing :
a)
the electronic D.O.S. is very sensitive to heat treatment or toageing
effects.Figure
8a shows the effect of astay
of a fewdays
at roomtemperature,
between twosuccessive
experiments.
One observes a variation of 10 % of the electronicy T
term, without anychange
either for0 D or
forT,.
Table II. -
Superconducting
andthermodynamic
parametersof sputtered Zr,oo - xcux
samples.
(1)
From reference[5].
(2)
From reference[6].
It seems that there is a cross-over effect for
Zrg1Cu19
(I)
between two «equilibrium
» values(Fig. 8b) :
firstly,
onageing
at roomtemperature
overperiod
of a fewmonths, y decreases
toward a value rather similar to
L.Q.
alloys
(points
1,
2,
3),
and also close to heat-treatedZr77CU23,
about 5mJ/mole.K2.
After a thermal treatment at 200 °C andduring subsequent
storage
at -20 °C,
y tends toward a muchhigher
value of about 11mJ/mole.K2 (points
4,
5,
6).
Note also infigure
8b that in the same time there is a small variation ofTc, following
the initial decrease which appears as ageneral
consequence of structural relaxation(see below).
This
strong
sensitivity
to thermal treatments is at variance toL.Q.
Zr-Cualloys,
where nosystematic
and much smaller variations(increase)
can be detected(in
Zr54Cu46
[26]
andZr72CU28
[27]) ;
b)
values ofNy (EF)
considerably
exceed those ofL.Q.
alloys,
obtainedby melt-spinning
[22, 23].
There is an overall trend ofNy (EF)
to increase athigh
Zr content. ForL. Q .
alloys,
the variation is almost linear with concentration. It is also the case for the extreme maximum values of the
sputtered alloys,
which concern the concentrations x = 19(1),
38,
48 at%(relaxed state)
and x = 19(II), 27, 63.5
at%(as-prepared state).
The differences ofamplitude
between these linear variations decrease when x
increases,
as does the difference between thevalues of
crystalline
andamorphous phases,
with a trend to a common value atlarge
Cucontent. This confirms the
predominant
role of Zr in the electronic D.O.S. of theseFig.
7. - Electronic coefficienty and
corresponding
D.O.S. versus the concentration for :sputtered
samples :
ZrSlCu19 (I),
seefigure
8b ; for othersamples :
(0)
as-prepared,
(A)
annealed state.Upper
dashed line is drawn
through
thehigh
y values for both annealed(Zr81Cu19 (I), Zr62Cu3g,
Zr,2CU48)
andas-prepared
state(Zrg1Cu19 (II),
Zr73CuZ7,
Zr36.5Cu63.5)·
Melt spun :(x )
from reference[23] ; (0)
from reference[22].
Dashed line : mean value of electronic D.O.S. fromHc2
and p measurement of bothsputtered
samples
(either
as-prepared
or annealedstate)
and L. Q.samples
(Refs. [11,
23,28]).
The effect ofannealing
onZr54Cu46 (Ref. [26])
is indicated.Crystalline :
(8.)
from reference[22].
c)
within the G.L.A.G.(Ginzburg,
Landau,
Abrikosov,
Gor’kov)
theory
forweak-coupling superconductors
in thedirty
limit,
one can also determine the D.O.S. at the Fermi level from electricalresistivity
p and upper critical fieldHc2
measurements[28]
by :
with
These determinations show that there is no effect of thermal treatment on
’Y He2
and that theD.O.S. determined in that way decreases
linearly
with x asNH (EF)
=
2.5 (1 - x)
[states.eV-1,
atom -1
],
ingood
agreement
with the values ofL.Q.
alloys
(shown
by
the lower dashed line inFig.
7).
Therefore,
there is adiscrepancy
betweenN ’B1 1 (EF)
andN H e2 (EF)
for thesputtered alloys,
which is muchlarger
than thatpreviously reported
forL.Q.
Zr-Cu or Zr-Ni[23, 29].
3.2.2
Debye
temperature.
- In table II andfigure
9 are alsoreported
the values of the latticecoefficient
/3
andOD.
However,
we have to take care inusing
theDebye
model for theFig. 8a.
Fig.
8b.Fig.
8. -Sensitivity
of the electronic coefficient y on thermal treatments :a)
asubsequent experiment
following
a stay of a fewdays
at room temperature indicates an increase of y without anychange
either for0 D
or7c ;
b)
a cross-over effect of y is observed forZr81Cu19 (I)
with the thermalhistory : points
(1),
(2), (3) :
as-prepared
state thenageing
of 45days
and 4 months at room temperature,point
(4) :
effect ofannealing
(200
°C-1h) ;
points
(5)
and(6) :
ageing
at around - 20 °C after heat treatment. On theright
side thecorresponding
superconducting
transition temperatureTc
(0
andA,,&
respectively aged,
annealed and
highly-relaxed
states).
Note thequasi-invariance
of7c
for the annealed state while y hadlargely
increased.Fig. 9. - Debye
temperature0 D
(calculated
from the cubic term of thespecific
heat)
versus x.Sputtered samples :
(0)
as-prepared,
(A)
annealed,(À)
highly-relaxed : ZrSlCu19 (I).
Melt-spun :
(x)
from reference[23], (0)
from reference[22] ;
the effect of thermalannealing
onZr54CU4
[26]
is indicated.Crystalline
(0)
from reference[22] ;
thedrop
of6D for Zr40Cu60
has been ascribed to thedescription
of vibrationalspectra
at lowfrequencies
in disordered solids :despite
aT3 specific
heat contribution in theseamorphous alloys,
there is someexperimental
evidenceof additional excitations to the actual
ùj 2 phonon
contribution.Hitherto,
published
acoustic data areonly
available inL.Q.
Zr4oCu6o [30]
which indicate an acoustic determinationOacoustic
= 272 Khigher
than the calorimetric one :(Jcalor.
= 230 K[22].
We did notpresently
get
systematic experimental
values of sound velocities which allow us to determineexactly
80
[by
-4 oc
(p,
the massdensity)].
However,
we intend to define a calorimetric(JD
PVDOD
value that we can compare to those ofL.Q.
alloys
determined in the same way.The main results are :
a)
OD
ofsputtered samples
are lower than forL. Q. ,
even after structural relaxationby
subsequent
heat treatment ;b)
like for y, at variance toL. Q.
alloys,
OD iS
sensitive to structural relaxation. One observes asystematic
increase,
whereas such variations are notsystematic
inmelt-spun
samples :
e.g.only
inZr60Cu40 (increase
of 10 %[27])
and inZrS4Cu46
(surprisingly
a decreaseof 2 %
[26]).
3.2.3
Superconducting
transition.a)
Thesuperconducting
transitiontempe rature Tc
(Tab.
Il andFig.
10)
exhibits universalproperties
for the different kinds of Zr-Cuamorphous
alloys. Firstly,
similar values in theas-prepared
state,despite
the differentdegree
of structural disorder. The calorimetric transition width is somewhatlarger
for thesputtered samples
(0.30
to 0.45K)
than forL.Q.
(0.1
to 0.4K).
Notice that this ratherlarge
width cannot beentirely
accounted forby
the chemical concentration fluctuations which are of about 1 at% between the mean values of differentfoils,
or up to 2 at% within a same foil of asputtered sample,
and which wouldcorrespond
towidths of 0.1 to 0.2 K.
Fig.
10. -Superconducting
transition temperature versus x.Sputtered :
samesymbols
as infigure
9 ;melt
spun(as-prepared state) : (e)
from reference[11] [resistive measurement] ;
(x)
from reference[23].
The effect of thermalannealing
is indicated formelt-spun
Zr54CU46 [0,
Ref.[26]].
Despite
the very different numerical values and behaviour of the electronic D.O.S., theTc
seems to be universal with adT
relative
decreaseà T,:
of about 0.1 K/at%.Secondly,
after heat treatment,Tc drops by
about 0.3-0.4 Kindependently
of thealloy
concentration,
but the width remains almostunchanged. Again
this behaviour is universal for the different kinds ofalloys, despite
the different behaviour on relaxation of thephysical
parameters
which aresupposed
to governTc,
mainly (JD
and N(EF).
Forexample,
the increase of0 D
onannealing,
which couldexplain
the7c
depression,
is notsystematic
forL.Q.
alloys.
As
previously reported
[28, 31],
this calorimetric determination is ingood
agreement
with the electricalresistivity
transition whichnaturally corresponds
to thehigher
side of the calorimetric one, and with a width of the order of 100mK,
in betteragreement
with the concentration fluctuations for a much smallerpiece
ofsample
used in theresistivity
experiments
(about
1 mm x 15mm).
b)
Electron-phonon coupling strength.
In absence oftunneling
measurements on thesealloys,
we use thegeneral
McMillan numerical formula[32]
for transition metallicalloys,
which determines the
coupling
parameter À
fromTe and OD :
with
* = 0.13 for transition metals .(1)
Values of À
[Tab. II]
indicate that thecoupling strength
deviatesprogressively
from weak tointermediate when the Zr concentration increases from 35 to 80 at%. This
progressive
and very continuous behaviour has also beenpointed
outby
theprecise analysis
of thethermodynamic
critical fieldHc(T)
determined fromCes (T)
belowTc,
and estimation of the B.C.S.parameters
such as the condensation energy, or the deviation function ofH (T) [31].
After heattreatment, À
decreasesby
0.03-0.04.For the «
as-prepared
»alloys, À
for thesputtered
ishigher
than forL. Q.
by
about 0.05 inthe whole concentration range. Since their
Tc’s
are similar(cf.
Fig.
10),
we suppose that the use of McMillan formulaimplies
that the increase of À iscompensated by
the decrease of0 D.
However,
in absence oftunneling
measurements which wouldgive directly
the value ofÀ,
this
hypothesis
remains to be confirmed.c)
At thetransition,
one can determine as indicated infigure
6 thespecific
heatjump
AC and estimate the value
of T âC
=Ces (Tc) - Cen(Tc)
which
arereported
in table II.They
Y TC
Tc C en (Tc)
are
systematically
somewhatlarger
(for x --
50at%)
than the B.C.S. value of 1.43 for weakcoupling superconductors,
and almost similar toL.Q.
alloys,
without a clear trend to increase with the Zr content, as one couldexpect
for anincreasing coupling strength.
4. Discussion of the normal state and
T,.
4.1 CONCERNINGN (EF)
ANDOD-
- In ageneral
way, it has been shown before thatsputtered alloys
are in ahigher degree
of structural disorder thanL. Q.
ones on every scale ofthe structure :
short,
medium andlong-range
order. We intend totry
to connect thisspecificity
to the differentcontributions,
mainly
those ofphonons
andelectrons,
whereas this connection appears the most obvious for thelow-energy
excitations,
as discussed elsewhere[7].
a)
With thisproperty,
are consistent theDebye
temperature
(OD)
values,
which are lowerthan in
L.Q.
alloys,
due to a moreloosely
connected lattice. This issupported
by
atigth-binding
modelproposed by Cyrot-Lackmann
[33]
whichexplains
semi-quantitatively,
forthe shear
modulus,
which is related to the lattice soundvelocity by
v,= ( 2013 ) ,
pbeing
theP
mass
density.
Thetheory predicts
a variation ofOD
of the order of 10 %betwèen
theamorphous
and thecrystalline
states. Butexperiments
in Zr-Cu(Fig. 9)
indicate thatindeed,
it can be more
higher ;
thedrop
ofOD
increases with anincreasing
structural disorder of theamorphous
state as shownby
thefollowing
results forZr68Cu32 :
crystalline
state :0 D
= 315K ;
liquid
quenched
(amorphous) :
189 K(40
% of relativevariation) ;
sputtered :
annealed(amorphous)
(JD
= 163 K(48 %)
andas-prepared, OD
=156 K
(50
% of relativevariation).
Annealing
induces in thesputtered alloys
asystematic
increase of6D,
due to an increase of stiffness of the material. A rather similar behaviour occurs for thelow-energy
(TLS)
excitations[7] :
a muchlarger
density
of statescomparatively
toL.Q.
alloys
and itssystematic
reduction on
annealing.
Bothcorrespond
to a muchhigher
overall D.O.S. of thelow-energy
vibrationalspectrum
(including
theTLS,
defined asconfigurational
localizedexcitations)
which isdepressed by
the structural relaxation.b)
The consequence of a less stable structure isparticularly striking
in the case of the electronic D.O. S. at the Fermi level :N y(Ep)
values are muchlarger
than forL.O.
alloys,
especially
athigh
Zr content. ForZrSlCu19,
acomposition
which cannot beprepared by
melt-spinning,
the variation ofN,(EF)
between two differentsamples
(I
andII)
or for a samesample
(I)
upon the thermalhistory,
reaches a factor of two ! Asreported
previously,
there is a cross-over effect ofNY(EF)
at thishigh
Zr content. Note thatlarger
effectiveNy
values reflect veryprobably higher
D.O.S. of the band structure atEp,
N(0),
since renormalizationeffects,
supposed
here to be limited toelectron-phonon
interactions,
aresimilar for both kinds of
materials,
sputtered
andL.Q.
A first
explanation
for these differences could be in differences in the chemicalshort-range
order[C.S.R.O.].
Forexample, studying
the Zr-Nisystem,
Kroeger et
al.[29]
found apeculiar
behaviour ofNY(EF).
They
observedrapid
variations ofNY(EF)
between 60 and 65 at% Zr. These values exceededby
20-25 % those observedby
Altounian and Strom-Olsen[11],
obtained fromH,2
and resistive measurements, at about the same concentrations. These features have been ascribed torapid changes
of the C.S.R.O. due to acompetition
of twoamorphous phases
Zr3Ni2
andZr2Ni.
But in our case, thisinterpretation
is notexpectable :
EXAFS measurements show that C.S.R.O. is absent in the
sputtered Zr77Cu23
andZrg1Cu19 ;
instead,
there is aslight tendency
toclustering
for Zr atoms[3].
Moregenerally,
itseems that chemical
short-range
order does not characterize the ZrCusystem
when Zrcontent is
higher
than 50 at%[19],
at variance with ZrNi. It is therefore difficult to test the role of C.S.R.O. in the ZrCualloys,
which has beensuggested
[34]
to lead to a decrease of N(EF).
On the other
hand,
our data agree with thegeneral
ideas of Morruzi et al.[35]
about therelationship
between the electronic d-bandproperties
and thestability
of transition-metalglasses. They
argue thathigh
D.O.S. at Fermi level are characteristic of the relativeinstability
of their
short-range
atomicarrangements.
Atvariance,
energetically
favorable atomicarrangements
will lead to smallN (EF).
That is to say that ahigh
N (EF )
implies
ahigh
free energy, less-stableconfiguration.
Thesearguments
were tested on the y values ofcrystalline
and
amorphous
Zr-Nialloys
by
Kuentzler[36].
Characterization
data,
particularly
the irreversibledecay
onannealing
of theenthalpy
andof the electrical
resistivity
(Zr77CU23),
muchhigher
insputtered
than inL.O.
alloys,
areconsistent with this less stable
configuration
insputtered alloys.
Thishypothesis
is also consistent with both the smallerDebye
temperature,
indicative of less cohesive localexcess free-volume.
Hence,
are understandable thegeneral
higher
values ofN,(EF).
However,
theunexpectable
sense of variation of y onannealing
cannot agree with asystematic
trend toward a more « stabilized » state.According
to theseideas,
one can also account for the differences inNY(EF)
between different series ofL.Q.
alloys
and thesensitivity
of some of them to thermal treatment,features which have still not been matter of discussion. Since
L.Q.
alloys,
due to their much lower effectivequenching
rate than forsputtering,
havealready
reached a more « stabilized »state, one could
expect
almost similar values ofN,(EF).
However,
experimental
data showthat,
even amongL. Q. ,
there exist differences which exceedlargely
the uncertainties of theexperiments.
For
example,
in the ZrNisystem,
values ofN y
from references[29]
and[24]
exceedlargely
those of Onn et al.[37] ;
and thestriking
behaviour ofN y
at Zr content around 60-65 at% describedby Kroeger et
al.[29]
has not been seenby
other groups[11, 37].
In the case ofreference
[29],
samples
wereprepared by
arc-hammertechnique
incomparison
tomelt-spinning
for two other groups. ForZrCu,
results of Garoche et al.[22]
indicatehigher
values than Samwer andLôhneysen
[23],
both groupsusing
themelt-spinning technique.
Within the scheme of Moruzzi etal.,
one couldexplain
these differencesby
differences in thecooling
rates
during
theglass-forming
process, which lead to more or less « stabilized » structures,and therefore to different electronic
D.O.S. ;
and some of them will besignificantly
sensitiveto thermal treatment. This is
supported, firstly, by
the results ofKroeger et
al. onZrNi,
andsecondly
forZrCu,
by
the observable effects(increase
by
5-10%)
of structural relaxation onZrS4Cu46 [26], Zr72Cu28
andZr6gCu32
[27]
whereas no effect wasreported
inZr6oCu4o [27]
andZr70CU30 [38].
c)
Anunexpected
feature is thediscrepancy
which exists between the values ofN y (EF)
andN H,:2
(EF),
the electronic D.a.S. determined within the GLAGtheory, by
theresistivity
p and theslope
ofHc2 at T,,
withN y
always exceeding
N H,:2*
Thisdisagreement
could result from these two different ways
(local
electronictransport property
orglobal
thermodynamic
property)
used tostudy
thesuperconductivity,
asalready
discussedby
Laborde et al.[31]
and in reference[29].
But,
it isstriking
that theamplitude
of thisdiscrepancy
variesaccordingly
to thetechnique
ofpreparation
of theamorphous
state :- for the series ZrCu obtained
by melt-spinning,
thisamplitude
varies between 6 % and 17%[11,
22,
23] ;
- for ZrNi obtained
by
the arc-hammertechnique,
it is about 20 %[11, 29] ;
- for
sputtered
ZrNi[31]
or ZrCu[28],
it varies between 20 %[Zr77CU23 ]
and 100 %[Zr8lCU19].
Note that forZr-Cu,
NH "2(EF)
is similar for both kinds ofalloys.
An extended discussion
[40]
about the determination of y from p and theslope
ofHc2 at Tc,
shows that one must be careful whenusing
this method for calculation of the D.O.S.at
EF.
Indeed,
experimental
uncertainties aretypically
of about 10%,
mainly
due to theresistivity
measurements.But,
in the case of Zr-basedalloys,
thediscrepancy
exceeds the uncertainties. It can no more be due toinhomogeneity
of thesputtered
samples,
because all characterizationmeasurements indicate that the whole series is
homogeneous
[41].
It appears that thediscrepancy
is actual andprobably
related to thedegree
of structural disorder of the material. In the case of thesputtered
ZrCu(or ZrNi)
alloys,
one can assume that the electronicD.O.S.