• Aucun résultat trouvé

MICROMAGNETIC PROPERTIES OF AMORPHOUS CoxY1-x SPUTTERED FILMS WITH Mo OVERLAYERS

N/A
N/A
Protected

Academic year: 2021

Partager "MICROMAGNETIC PROPERTIES OF AMORPHOUS CoxY1-x SPUTTERED FILMS WITH Mo OVERLAYERS"

Copied!
3
0
0

Texte intégral

(1)

HAL Id: jpa-00229039

https://hal.archives-ouvertes.fr/jpa-00229039

Submitted on 1 Jan 1988

HAL is a multi-disciplinary open access

archive for the deposit and dissemination of

sci-entific research documents, whether they are

pub-lished or not. The documents may come from

teaching and research institutions in France or

abroad, or from public or private research centers.

L’archive ouverte pluridisciplinaire HAL, est

destinée au dépôt et à la diffusion de documents

scientifiques de niveau recherche, publiés ou non,

émanant des établissements d’enseignement et de

recherche français ou étrangers, des laboratoires

publics ou privés.

MICROMAGNETIC PROPERTIES OF AMORPHOUS

CoxY1-x SPUTTERED FILMS WITH Mo

OVERLAYERS

J. Alameda, M. Contreras, D. Givord, A. Liénard

To cite this version:

(2)

JOURNAL DE PHYSIQUE

Colloque C8, Supplkment au no 12, Tome 49, dkcembre 1988

MICROMAGNETIC PROPERTIES

OF

AMORPHOUS

C o x Y l - , SPUTTERED

FILMS

WITH M o O V E R L A Y E R S

J. M. Alameda (I), M. C. Contreras (I), D. Givord ( 2 ) , and A. Lienard (2) ( I ) Dpto. de Fisica, Universidad de Oviedo, Oviedo 3307, Spain

(') Lab. L. Ne'el, CNRS, 166X, 38042 Grenoble Cedez, France

Abstract. - Magnetic and magneto-optical properties of amorphous CoxY1-, ( z = 0.80, 0.35) films (thickness range: 50- 1 000 %I) with Mo overlayers are studied. Transverse biased initial susceptibility measurements are reported. The structure constant S increases as the thickness decreases, i.e.: S = 0.04 and 0.15 erg/cm2 for 1 000

A

and 50

A

respectively. Surface effects on Coo.35Yo.65 are discussed.

Surface effects on magnetic and magneto-optical properties of amorphous Co,Y1-, films were reported in a previous paper [I]. In particular, evidence of a magnetically ordered phase at room temperature for films where x

5

0.60, was observed. This is in di- sameement with the well stablished behaviour in bulk

-

amorphous samples [2,3]. In reference [l] we proposed a simple explanation for this effect, i.e.: Y segregates to the top of the surface and reacts with oxygen, for-

ming oxide patches across the film surface (selective oxidation is a part of the driving force for Y segre- gation). Consequently, localized Co-enriched regions may exist near the film- air interface. The anomalous magnetic and magneto-optical properties observed at room temperature for films with nominal composition x

<

0.60, may arise f r ~ m Co-enriched regions. Here we present new experimental evidence which seems t o confirm this hypothesis.

Amorphous Co,Yl-, films were obtained by d.c. triode sputtering with single cathode configuration. Sputtering targets (obtained by induction-levitation melting) of nominal compositions x = 0.80 and x =

0.35 were used. Glass substrates, fixed on t o a rota- ting sample holder, were held a t 77 K during deposi- tion. Film thickness was varied between 50 t o 1 000

A.

Some films were in situ protected after deposition by Mo overlayers (thickness: 1 000

A),

transverse biased initial susceptibility (TBIS) measurements were car- ried out using a magneto-optical set-up already descri- bed [I]. Details about the determination of transverse Kerr effect parameter SK = A R /

R,

where R is the reflectivity and AR the magneto-optical modulation, are given elsewhere [I]. In Mo-protected films, only 6~ from the glass-film interface can be measured. Howe- ver, for unprotected films, SK from both glass-film and film-air interfaces may be analysed.

Ftegarding SK values, the main experimental results may be summarized as follows:

Within the limits of experimental errors (SK

<

,

no magneto-optical signal was found for Mo-protected C00.35Yo.65 films. This was not the case for unprotec- ted films, where 6~ = -1.5

x

lo-* was observed from film-air interface. (Negative means that Kerr polarity is opposite t o the observed in Co-rich amorphous films (See Ref. 111). This later value is of the same order of

magnitude as that previously reported for

x

5

0.60 [I]. Furthermore, the same magnitude for 6~ but with op- posite (positive) polarity was detected from the glass- film interface in unprotected films whose thickness was lower than 300

A.

For higher thickness (1 000 A), no magneto-optical signal was detected from the glass- film interface.

From the above results, we conclude that the magneto-optical signal found in unprotected C00.35Y0.6~ films arises from the film-air interface. Furthermore, taking into account that the change in the polarity for 6~ is related to optical effects in the topmost oxide layer, the above results are justi- fied if the magneto-optical signal arises from discrete Co-enriched sub-surface layers localized below oxide patches which occur across the film surface. Scanning Auger deep-profiles analysis, now in progress, seems to confirm these hypothesis.

In C O O . ~ ~ Y ~ . ~ O films protected with Mo overlayers SK = 4.2

x

This value is slightly higher than that observed in a previous work Il] where 6~ = 3.4 x

for unprotected Co0.79Y0.21. Taking into account that in the latter case 6~ was measured from the air-film interface, the above results are in agreement with the present hypothesis, if we suppose that oxide patches extend over 10 % of the film surface.

(3)

C8 - 1734 JOURNAL DE PHYSIQUE

Otherwise, in reference [I] we suggest that magne- tization ripple deduced from TBIS measurements for films where x

>

0.70, may arise, not only from the in- trinsic contribution of randomly distributed local ani-

sotropies inherent to amorphous alloys [6], but an ad-

ditional contribution from magnetic inhomogeneities localized in the film-air interface could be expected. To elucidate this point, TBIS measurements were car- ried out in Coo.soY0.20 films protected with Mo over- layers. Similar values for the structure constant S [4,7]

t o those already reported for unprotected film [I] were found. In both cases, S = 0.04 erg/cm2 when film thickness is close t o 1 000

A.

(It is noteworthy that they are also similar t o S values recently reported for CoZr amorphous films [5]). Furthermore, S increases

as the thickness decreases. This is evidenced in fi- gure 1. It must be remembered that S is defined as:

where K,,, is the local anisotropy constant related to a random distribution of local easy axes and V is the volume where local anisotropies are correlated. from figure 1, it follows that the diameter of such regions is a t least lower than 100

A.

Furthermore, K I , , . v ~ / ~ =

1.2 x erg/cm-3/2 is obtained from

s2

VS. 1

/

t

curves if film thickness is within 100 to 1 000

A.

For film thickness lower than 100 A, perpendicular anisotropy effects on the macroscopic magnetic beha- viour (stripe domains) [6], makes ripple characteriza- tion from TBIS measurements ambigous. This is the main reason of the observed scatter in S values. A full

analysis of these results will be given elsewhere. here conclude that S values found here and in reference [I],

are related to the intrinsic magnetic properties of this;

/

I

I

I

I

I

I

/

I

I

I

200 LW 6W thickness (A)

Fig. 1. - Structure constant (S) vs. t for Co0.s0Y0.20 films with Mo overlayer. Inset:

s2

vs. 1

/

t ( 0 ) Experimental

points.

[I] Alameda, J. M., Contreras, M. C., Lagunas,

A. R., J . Magn. Magn. Mater. 72 (1988) 279. [2] Gignoux, D., Givord, D., Lienard, A., J. Appl.

Phys. 53 (1982) 2321.

[3] Buschow, K. H. J., J. Appl. Phys. 53 (1982)

7713.

[4] Hoffmann, H., Phys. Status Solidi 33 (1969) 175. [5] Hoffmann, H., Heller, G., Kammerer, K. H., IEEE

Trans. Magn. MAG-23 (1988) 2731.

[6] Alameda, J. M., Contreras, M. C., Rubio, H.,

Phys. Status Solidi A 85 (1984) 511.

[7] Hoffmann, H., IEEE Trans. Magn. MAG-4

Références

Documents relatifs

Sputtered copper films on glass substrates.- A planar magnetron was used as a high rate s~uttering source to deposit copper coatings onto glass substrates at room

activation type conduction became *Magnetron target was reinforced and dominant as Ar pressure and bias sputtering voltage was reduced to 0.6 kV... power

L’archive ouverte pluridisciplinaire HAL, est destinée au dépôt et à la diffusion de documents scientifiques de niveau recherche, publiés ou non, émanant des

- The optical and transport properties of flash-evaporated amorphous GaSb thxn films are described as a function of preparation conditions.. The results for

The measurement of the thickness (h) by the method of the interference fringes, [11] and from the Figure.1 transmittance curve, we derive the physical constants

region, a first-order martensitic transition occurs from this dislocated incoherent metastable structure to an incoherent bulk stable phase characterized by a macroscopic

Transport properties of evaporated versus sputtered amorphous germanium

density at the air-film and film-substrate interface for quarterwave and halfwave optical thickness, respectively ; i.e., not only for scattering but also