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HAL Id: jpa-00224412

https://hal.archives-ouvertes.fr/jpa-00224412

Submitted on 1 Jan 1984

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DEVELOPMENT OF BORON AND PHOSPHORUS LIQUID-METAL-ION SOURCES

T. Ishitani, K. Umemura, Y. Kawanami, H. Tamura

To cite this version:

T. Ishitani, K. Umemura, Y. Kawanami, H. Tamura. DEVELOPMENT OF BORON AND PHOS-

PHORUS LIQUID-METAL-ION SOURCES. Journal de Physique Colloques, 1984, 45 (C9), pp.C9-

191-C9-196. �10.1051/jphyscol:1984932�. �jpa-00224412�

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DEVELOPMENT OF BORON AND PHOSPHORUS LIQUID-METAL-ION SOURCES T. Ishitani, K. Umemura, Y. Kawanami and H. Tamura

Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo 185, Japan-

Résumé - Des sources d'ions à métal liquide (LMIS) de (B) et (P) ont été développées pour l'implantation sans masque dans le sili- cium. La source de (B) qui emploie un émetteur de carbone ou de carbure et un alliage à base de Ni-B a une' durée de vie de plus de 250 heures. La source de (P) utilisant l'alliage Cu-P permet plus de 20 heures de fonctionnement. Les ions issus de ces sour- ces sont analysés en masse et en énergie. Des effets isotopiques ont été observés pour l'émission ionique de B. Des essais prélimi- naires d'implantation de B+ dans Si ont été entrepris en utilisant une colonne ionique avec séparateur de masse.

Abstract - Boron (B) and phosphorus (P) liquid-metal-ion (LMI) sources have been developed for maskless implantation in silicon, The B-LMI source, which employs a carbon or carbide emitter and a Ni-B base alloy as its source material, has a lifetime of more than 250 hours. The P-LMI source utilizing a Cu-P alloy achieves a lifetime of more than 20 hours. The ions emitted from these sources are investigated by mass and energy analyses. Isotope effect has been observed for B ion emission with a B-LMI source.

Focused B implantation in Si was preliminarily carried out using a mass-separated microbeam column.

1. Introduction

LMI sources are now being actively investigated due to" the poten- tially enormorus advantages they offer in focused-ion-beam (FIB) technology, such as maskless implantation, microfabrication, and submicron analysis /1-if/. Considerable interest has also been shown in the diversity of ion species LMI sources provide. For ion implan- tation into Si semiconductors, B, As, and P are the most important dopants. However, it is difficult to construct LMI sources from these materials due to their high melting point (for B ) , high vapour

pressure (for As and P ) , or strong corrosive effect on most metals ( for B). Several LMI sources that use eutectic alloys as the source material have been reported to date /5-7/. For GaAs semiconductors, LMI sources for Be and Si ions have also been developed by employing eutectic alloys /5,8,9/.

Recently, B- and P-LMI sources have been developed by the authors /10,11/. The present paper briefly describes these sources with new additional data on ion emission characteristics. Evidence of isotope

Article published online by EDP Sciences and available at http://dx.doi.org/10.1051/jphyscol:1984932

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C9-192 JOURNAL

DE

PHYSIQUE

e f f e c t i n t h e B-LMI s o u r c e i s a l s o p r e s e n t e d . F u r t h e r , p r e l i m i n a r y e x p e r i m e n t s o n

B'-FIB

i m p l a n t a t i o n i n t o S i u s i n g a mass-separated microbeam column /12/ w i t h maximum beam energy of 20 keV a r e d e s c r i b e d . F i n a l l y , t h e h i g h d o s e - r a t e e f f e c t i n

F I B

i m p l a n t a t i o n /13/ i s d i s - cussed.

2.

B- and P-LMI s o u r c e s

The LMI s o u r c e f o r

B

and P i o n s c o n s i s t s o f a n e e d l e e m i t t e r , h e a t e r and e x t r a c t o r . Molten s o u r c e - m a t e r i a l mounted on t h e h e a t e r c o v e r s

t h e e m i t t e r and s t a b l y f l o w s t o t h e e m i t t e r t i p d u r i n g i o n emission.

F o r t h e B-LMI s o u r c e /10/, a combination of c a r b o n o r c a r b i d e n e e d l e s and

Ni-B

base a l l o y s as t h e s o u r c e m a t e r i a l was used. L i t t l e r e a c t i o n i s produced between t h e s e m a t e r i a l s , s o t h e y p r o v i d e a s o u r c e l i f e t i m e of more t h a n 250 hours. F o r t h e P-LMI s o u r c e

/U/, a

combination of m e t a l n e e d l e and Cu-P a l l o y w a s employed.

A

s o u r c e l i f e t i m e of more t h a n 20 hours w a s achieved, which was mainly r e s t r i c t e d by s e l e c t i v e e v a p o r a t i o n o f t h e P element due t o i t s h i g h vapor p r e s s u r e . Thus, t h e r e i s much room f o r improvement of t h e

P

s o u r c e l i f e t i m e .

I o n s e m i t t e d from t h e s o u r c e were i n v e s t i g a t e d by mass and energy a n a l y s e s u s i n g a double-focusing mass s p e c t r o m e t e r w i t h a n e n e r g y r e s o l u t i o n of AE

=

1.1 eV a t E

=

3.2 keV. T h i s r e s o l u t i o n w a s c a l i - b r a t e d u s i n g s u r f a c e - i o n i z e d ~ a + beams.

T y p i c a l mass s p e c t r a f o r i o n s e m i t t e d from t h e l i q u i d

N i

B S i 45 45 1 0 a l l o y a t It = 25 p l and Cu

P

a l l o y a t

It =

80 )1A a r e shown i n Figs.

1

( a ) and ( b ) , r e s p e c t i v e l y . 3 Here, I t i s t o t a l e m i s s i o n c u r r e n t .

O p e r a t i n g t e m p e r a t u r e f o r t h e s e s o u r c e s was 900 - 950 "C f o r t h e B s o u r c e and 750 - 800

"C

f o r t h e P s o u r c e . The B' and

P'

i o n i n t e n - s i t i e s were 25 - 35 % and a b o u t 1 0 % of t o t a l i o n i n t e n s i t y , respec- t i v e l y , depending o n o p e r a t i n g c o n d i t i o n s .

T y p i c a l energy d i s t r i b u t i o n s f o r 'IB',

58~i',

a n d

2 8 ~ i +

i o n s from t h e Ni-B-Si a l l o y a r e shown i n Fig.2 f o r I t

=

40 9 . The o r i g i n of t h e energy axis i s e s t i m a t e d , r a t h e r t h a n c a l i b r a t e d . S i m i l a r e x p e r i - ments f o r t h e Cu-P a l l o y were c a r r i e d o u t . T y p i c a l r e s u l t s of f u l l - width-at-half-maximum (FWHM) v a l u e , AE, f o r v a r i o u s i o n s a r e g i v e n i n T a b l e

1.

I t w a s found t h a t A E v a l u e s f o r doubly-charged i o n s a r e , i n g e n e r a l , have a narrower range t h a n t h o s e f o r s i n g l y - c h a r g e d i o n s , as p o i n t e d o u t i n a p r e v i o u s p a p e r

/l.+/.

The

AE

vs. I t r e s u l t s f o r v a r i o u s i o n s , i.e.

B+

f o r Ni-B-Si a l l o y ,

P+

and

CU+

f o r Cu-P a l l o y , and ~ a ' f o r pure

G a ,

a r e summarized i n Fig.

3 . A s shown, t h e r e i s a s t r o n g mass-dependence, w i t h l i g h t e r i o n s

h a v i n g a narrower AE.

(4)

40 20 0 -20 -40 Relative Ion Energy

,

E ( e V )

Fig.2 T y p i c a l energy d i s t r i - b u t i o n s of B,

N i ,

and S i i o n s .

I . I . I , I

0 50 100 150 200

Total Ion Current, IT(

m)

Fig.3

A E

vs. It f o r v a r i o u s

LMI s o u r c e s .

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C9-194 JOURNAL DE PHYSIQUE

3. Isocope e f f e c t on B i o n e m i s s i o n

I s o t o p e e f f e c t on

B

i o n s e m i t t e d from t h e B-LMI s o u r c e h a s been observed. The

B++

i o n i n t e n s i t y

i s

a s weak a s 1/30 - 1/50 t h a t f o r

B+

a t It=15 - loo)&, b u t t h e r e i s a c e r t a i n d i f f e r e n c e between P10 and Pll, where Pm i s t h e i n t e n s i t y r a t i o o f m ~ + + t o (*B+

+

m ~ + + ) . F i g u r e 4 shows t h e e x p e r i m e n t a l AP v a l u e s

(=

Pll - PlO) p l o t t e d a s a f u n c t i o n of P

(=

Pll).

A s

shown, t h e Pll v a l u e s a r e l a r g e r by 13 - 1 7 % t h a n

t h e P10 v a l u e s .

The p o s t - i o n i s a t i o n model f o r f i e l d e v a p o r a t i o n proposed by Haydock and Kingham

/l>/

p r e d i c t s s u c h i s o t o p e e f f e c t when a n element w i t h two o r more i s o t o p e s i s f i e l d evaporated. According t o t h a t model, t h e l e s s - m a s s i v e i s o t o p e s t r a v e l f a s t e r and t h u s spend l e s s t i m e i n t h e p o s t - i o n i s a t i o n zone i n which t h e t r a n s i t i o n from t h e s i n g l y - t o doubly-charged i o n s i s e x p e c t e d t o occur.

The s o l i d l i n e i n Fig.4 c o r r e s p o n d s t o t h e t h e o r e t i c a l c u r v e based on t h i s model, e x p r e s s e d as AP = (1/2)

(

AM/Mb)Pb f o r

AM

((Mb and Pb((

1.

Here, AM

= Mb

-

Ma

and

Mm

r e p r e s e n t s t h e mass of i s o t o p e m.

The p o s t - i o n i s a t i o n model e x p l a i n s t h e p r e s e n t i s o t o p e e f f e c t f a i r l y w e l l , a l t h o u g h t h e r e a r e some d i s c r e p a n c i e s between experiment and t h e o r y .

A

similar i s o t o p e e f f e c t h a s been o b s e r v e d f o r f i e l d evapo- r a t i o n o f FeB and

COB

m e t a l l i c g l a s s e s by Menand and ~ i i ~ h a m /16/.

A

more d e t a i l e d d i s c u s s i o n w i l l be p r e s e n t e d elsewhere.

Table

1 AE

v a l u e s f o r v a r i o u s i o n s e m i t t e d from Ni-B-Si and Cu-P LMI-sources a t

I t =

3 0

8' I I I

6

-

4

-

/' j g / [ L P .

:

2 - A-=

_ _ / - - -

--- Theory

CHK)

,/-7 Oo

I I I

1 2 3 4

Fig.4 D i f f e r e n c e i n p o s t - i o n i s a t i o n

p r o b a b i l i t i e s of

''B+

and

llB+ S

*p,

a s a f u n c t i o n o f p o s t - i o n i s a t i o n

p r o b a b i l i t y o f 'IB+,

P. (

Broken

l i n e c o r r e s p o n d s t o t h e t h e o r e t i c a l

(6)

P r e l i m i n a r y e x p e r i m e n t s on FIB i m p l a n t a t i o n have been c a r r i n g o u t u s i n g a mass-separated microbeam column, t h e d e t a i l s o f which have been d e s c r i b e d e l s e w h e r e /12/. T h i s column h a s t h e a b i l i t y t o produce sub-pm beams w i t h e n e r g i e s of u p t o 20 keV and h i g h c u r r e n t d e n s i t i e s ,

J,

e.g. s e v e r a l t e n s o f miX/cm2 f o r

B+

beam. These

J

v a l u e s a r e a b o u t t h r e e o r d e r s h i g h e r i n magnitude t h a n t h o s e f o r a c o n v e n t i o n a l implan- t e r u s i n g a n unfocused beam.

F i g u r e 5 shows t h e c a l c u l a t e d maximum t e m p e r a t u r e a t t h e c e n t e r of a s t e a d y - s t a t e unscanned FIB f o r S i and

G a A s

t a r g e t s based on t h e a n a l y t i c a l form of

N i s s i m

e t a1 /17/. I n t h e c a l c u l a t i o n , a t a r g e t back-surface t e m p e r a t u r e of 25

'C

and temperature-dependent t h e r m a l c o n d u c t i v i t y e x p r e s s e d by K(T)

=

A/(T - B

)

a r e assumed. Here,

A =

299 W/cm and B = -174 "C f o r S i , and

A =

9 1 W/cm and B

=

-182 "C f o r GaAs. I t s h o u l d be noted t h a t even a 1 0 0 keV unscanned beam of

l

p m i n d i a m e t e r w i t h

J =

1 0 A/cm 2 is e x p e c t e d t o i n c r e a s e a S i t a r g e t t e m p e r a t u r e from 25

"C

t o o n l y a b o u t 50

OC*.

No s i g n i f i c a n t FIB-heating h a s a l r e a d y p o i n t e d o u t i n t h e p r e v i o u s

/ 2 / .

R e c e n t l y , a h i g h d o s e - r a t e e f f e c t has been observed f o r

B+

FIB i m p l a n t a t i o n i n t o S i , t h a t i s , h i g h e l e c t r i c a l a c t i v a t i o n i n t h e a n n e a l e d i m p l a n t e d - l a y e r has been r e s u l t e d from enhancement of t h e amorphous zone /13/. T h i s enhancement i s presumably b r o u g h t a b o u t by o v e r l a p p i n g of t h e damage zone s u r r o u n d i n g t h e i o n p a t h w i t h i n some l i f e t i m e of i t s s h r i n k a g e , n o t by FIB h e a t i n g and s e l f - a n n e a l i n g ,

5. Conclusions

B-

and P-LMI s o u r c e s have been developed f o r m a s k l e s s i m p l a n t a t i o n i n t o

S i

semiconductors. The B-LMI s o u r c e , u s i n g a combination of a

c a r b o n o r c a r b i d e e m i t t e r and a

Ni-B

b a s e a l l o y a s i t s s o u r c e m a t e r i a l , h a s a l i f e t i m e of more t h a n 250 h o u r s and p r o v i d e s a

B+

e m i s s i o n c u r r e n t of 25 - 35 % t h e t o t a l e m i s s i o n c u r r e n t .

I s o t o p e v a r i a t i o n s i n

B

i o n e m i s s i o n have been observed. The l 0

+

p r o p o r t i o n of ''B++ t o

(

B

+

''B++) i s 1/30 - 1/50, which i s 13 - 17

% s m a l l e r t h a n f o r "B++ . T h i s i s o t o p e e f f e c t w a s p r e d i c t e d by t h e p o s t - i o n i s a t i o n model f o r f i e l d e v a p o r a t i o n proposed by Haydock and

~ i n g h a m / l 5 / , a l t h o u g h t h e r e a r e c e r t a i n d i s c r e p a n c i e s between t h e e x p e r i m e n t a l r e s u l t s and theory.

A

P-LMI s o u r c e u t i l i z i n g a Cu-P a l l o y has a l s o been developed.

P+

i o n e m i s s i o n c u r r e n t i s a b o u t 1 0 % o f t o t a l e m i s s i o n c u r r e n t i n t h i s s o u r c e , a n d i t s l i f e t i m e i s more t h a n 20 hours.

Emission c h a r a c t e r i s t i c s f o r t h e

B-

and P-LMI s o u r c e s have been

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C9-196 JOURNAL

DE

PHYSIQUE

Fig.5 C a l c u l a t e d maximum temper- a t u r e

a t

t h e c e n t e r of

a

100 keV s t e a d y - s t a t e unscanned beam f o r S i and GaAs t a r g e t s

i n v e s t i g a t e d by

mass

and e n e r g y a n a l y s e s . P r e l i m i n a r y e x p e r i m e n t s

800- on FIB i m p l a n t a t i o n were a l s o

c a r r i e d o u t u s i n g

a

mass-separated

microbeam column. I n t h e s e e x p e r i - 600 ments, h i g h d o s e - r a t e e f f e c t

was

n

observed.

9

-400

R e f e r e n c e s

I I I 1 1 1 1 1 ~ I I I 1-

Si I

--- -

GaAs I

- I I -

-

I

I -

I I

-

1

- I

1 R.L,Kubena, C.L.Anderson, R.L.Seliger, R.A. J u l l e n s , E.H.Stevens, and 1.Lagnado: J. Vac. S c i . Technol. lq(19811916

2 W.L.Brown and A.Wagner: i n Proc. of I n t . I o n E n g i n e e r i n g Congress ISIAT'83 & IPAT'83 (Kyoto, 1983)

3

M.Komuro: T h i n S o l i d F l l m s =(l9821155

4 Y,Bamba, E-Miyauchi, H.Arimoto, K.Kuramoto A.Takamori, and H,Hashimoto : Japan, J. Appl. Phys. ~ ( 1 9 8 3

j

L650

5

V.Wang, J.W.Ward, and R.L.Seliger: J. Vac. S c i . Technol. u ( 1 9 8 1 )

1158

l-

6

K.Gamo, T.Ukegawa, Y.Inomoto, K.K.Ka, and S.Namba: Japan. J. Appl.

Phys. 1980 L595

7 K.Gamo, T.Ukegawa, Y.Inomoto, Y.Ochiai, and S.Namba: J. Vac. S c i . Technol. Q ( 1 9 8 1 1 1 1 8 2

8 E.Miyauchi, H,Hashimoto, and T.Utsumi: Japan. J. Appl. Phys.

22

(19831L225

9 K.Gamo, T.Matsui, and S.Namba: Japan. J. Appl. Phys. = ( 1 9 8 3 ) ~ 6 9 2 1 0 T - I s h i t a n i , K.Umemura, S.Hosoki, S.Takayama, and H.Tamura: J. Vac.

S c i . Technol. ( i n p r e s s )

11 T . I s h i t a n i , ~ . ~ m e m ; r a , and H.Tamura: Japan. J. Appl. Phys.

a

(1984)L330

1 2 ~ , ~ s h i t a n i , K.Umemura, and H.Tamura: Nucl. Instrum. Methods

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M.Tamura, S.Shukuri S.Tachi, T - I s h i t a n i , and H.Tamura: Japan. J.

Appl. Phys. ~ ( 1 9 8 3 3 ~ 6 9 8

1 4 L.W.Swanson: i n Proc. of I n t . I o n E n g i n e e r i n g Congress ISIAT183 &

IPAT'83 (Kyoto, 19831p.325

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R.Haydock and D.R.Kingham: Phys, Rev. L e t t , -J&(1980)1520

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