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LIMITATIONS ON THE USEFULNESS OF
METALLIC THIN FILM SEMICONDUCTORS FOR PHONON DETECTION
S. Rogers, C. Shaw, H. Wiederick
To cite this version:
S. Rogers, C. Shaw, H. Wiederick. LIMITATIONS ON THE USEFULNESS OF METALLIC THIN
FILM SEMICONDUCTORS FOR PHONON DETECTION. Journal de Physique Colloques, 1981,
42 (C6), pp.C6-317-C6-319. �10.1051/jphyscol:1981692�. �jpa-00221629�
JOURNAL DE PHYSIQUE
CoZZoque 66, suppldment au n022, Tome 42, dScembre 1981
LIMITATIONS ON THE USEFULNESS OF METALLIC THIN FILM SEMICONDUCTORS FOR PHONON DETECTION
S.J. Rogers, C . J . Shaw and H.D. ~ i e d e r i c k *
Phys<es Laboratory, University of Kent a t Canterbury, Canterbury, Kent, England
* R. M. C., Kingston, Cmzada
Abstract.- Ultra-thin metallic films behave essentially as semiconductors.
W e ave explored the use of N i - C r devices in t h i s regime f o r phonon pulse det:ction. The evaporated films, which were typically 2. 20 B. thick, were deposited between layers of SiO, on a sapphire substrate. Suitable films had room temperature resistances per squarg i n the range 10 - 13 KQ and these values increased t o lo5 - lo6 sz a t 1 K. By using very short (2Su) conduction paths i n parallel, device resistances were reduced t o % 100 Q a t ~ O K . W e have tested devices down t o O.loK and two serious problems limit t h e i r usefulness: the low temperature resistances are quite non-ohmic for small currents; the thermal time constants a r e surprisingly long.
Metallic films a few atomic dimensions i n thickness behave essentially as semi- conductors('); t h e i r equivalent specific r e s i s t i v i t y is high and the resistance variation with temperature, T, can be approximately represented by R = l$, exp(Tofr), where To i s some characteristic temperature. The conduction mechanism is predomin- antly tunnelling between the island structures which a r e characteristic of such films. The aperiodic potential of these structures serves t o localize the electrons, and t h i s leads t o i n f i n i t e r e s i s t i v i t y a t OOK('). Systems showing such localization effects have been of considerable recent interest. The thin film r e s i s t i v i t y is i n general not much affected by magnetic f i e l d s , and t h i s suggests that i t night serve to detect phonon pulses i n experiments requiring such fields. Almost any non- superconducting metal could be used for a bolometer, but, following Griffin and
~ o c h e l ( ~ ) we have concentrated our work on 80/20 N i - C r alloy films which can be successfully deposited a t room temperature.
The films studied, which were typically s 20 8 i n average thickness, were deposited by evaporation (at a rate
%4 Qsec) between layers of SiO, on a sapphire substrate, through which phonon pulses could be transmitted. The Si4, layers were deposited a t r a t e s i n the range 20 - 100 8/sec by the evaporation of SiO under a pressure < 10-5 t o r r . The f i r s t oxide layer on the substrate ( % 1OOO 1) provided a chemically inert well characterised surface for the Ni-Cr, and the second protective oxide layer (*3000 1) wwas deposited on top of the Ni-Cr film withuut breaking the vacuum. The variation with temperature of the resistance of the N i - C r films depends c r i t i c a l l y upon t h e i r thickness, and semiconductor behaviour i s observed over a thickness range of only a few 1 (4). The room temperature r e s i s t i v i t y of our films provided a sensitive guide t o t h e i r low temperature properties; films with
Article published online by EDP Sciences and available at http://dx.doi.org/10.1051/jphyscol:1981692
C6-3 18 JOURNAL DE PHYSIQUE
resistivities in the range 10 - 13 KQ per square were most suitable for use as bolometers at 1°K.
The resistance values for suitable films changed little in cooling to 77OK, though in some cases there was an initial decrease of up to lo%, but the resistances typically increased to lo5 - lo6 52 per square at 1°K. Such values are inconveniently large if the bolometer circuit is to have an electrical time constant short compared with the time scale of typical phonon pulses, and in practical devices an interdig- ital comb geometry was adopted in which conduction was across Ni-Cr strips % 25 p
wide. The device resistance values were lo2 - lo3
!;''I times less than for a square film. Somewhat sur- prisingly, the change in geometry markedly affected
sg the resistance characteristics of the films. In
narrow geometries the equivalent specific resisti-
2. 5 1
- vity per square was increased as compared with
I- V) -
V)
that for a square monitor film. Fig. 1 shows this
Id 102 1 o3
a CONDUCTION PATH LENGTH (u) effect for a series of simultaneously deposited films of differing conduction path length; the Fig. Effect of film geometry enchancement factor here is the ratio of the
on resistivity measured resistance to that calculated from geo- metry and the resistance of a square film. Reduc- ing the conduction path length also changed the film thichess needed for the desired resistance variation at 1 ' ~ ; it was therefore necessary to use thinner films for the interdigital devices.
Fig. 2 shows the resistance variation in the temperature range 0.1 - 10'~ for two such devices in which the conduction path length was 29 11.
The difference in the two characteristics is a measure of the difficulty experienced in making devices to a given specification. In each case, above 1°K the resistance variation is essentially exponential, but there is an unexpected plateau at lower temperatures. Although the measured resistances in this plateau region varied little with power dissipation, which was a 1 ~ ~ l l W for these measurements, it is possible that the apparent almost constant resistance arises because of non-ohmic effects. We note, however, that in
l l l l r l I 8 t I I I M
106
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TEMPERATURE
( O K )this temperature range the resistance of some thin films has been observed to show a logarithmic temp- Fig. 2 Resistance of twodevices erature and power dependence (5). The resistivity
(conduction path = "IJ) plateau severely limits the devices1 useful
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