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IMPACT OF NANOSECOND LASER ENERGY DENSITY ON THE C40-TiSi2 FORMATION AND C54-TiSi2 TRANSFORMATION TEMPERATURE.

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Academic year: 2021

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Figure

Fig. 1 presents the TEM micrograph of the as-deposited sample. It can be described with three distinct layers
Fig. 2 - Sheet resistance as a function of laser energy density after 3 UV-NLA pulses only (black squares) and UV-NLA followed by RTA at 650°C for 30s (red triangles)
Fig. 3 - θ-θ XRD measurements corresponding to the as-deposited TiN/Ti/Si sample and those annealed with 3 UV-NLA pulses at various energy densities in the 0.75-1.00 J/cm² range
Fig. 4 - (a) HRTEM micrograph corresponding to the sample annealed at 0.80 J/cm² with 3 UV-NLA pulses
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