Chemical vapour deposition and atomic layer deposition of amorphous and nanocrystalline metallic coatings: towards deposition of multimetallic films

R. Nanocrystalline-to- amorphous transition in nanolaminates grown by low temperature atomic layer deposition and re- lated mechanical properties..

2 Production associée de jets avec un boson Z au LHC Ce chapitre introduit les méthodes utilisées pour prédire les sections ecaces de production de jets en association avec un boson

7 - Logarithmic plot of the growth rate for polycrystalline cubic boron monophosphide (BP) on alumina substrates versus the reciprocal absolute temperature.. The PBr3 pressure

Typical deposition parameters were: SiH4 flow rate 3-30 SCCM; H2 10-30 SOX; discharge concentration of silane 5-20%; power dissipated 50-150 W; teat1 pressure 1.0-1Olkr; deposi-

In the next sections, a few examples of diamond deposition these materials are given. In the case of diamond deposition on graphite substrates, the growth conditions induce

Experimental (blobs) and calculated (solid lines) deposition rates uers~s location on the substrate in reference conditions with the carrying ZrC14 argon flow rate increased to

In previous work [4], we proposed MINLO models for conflict avoidance based on velocity regulation, aiming at solv- ing all the conflicts occurring in a given air sector observed

The properties of materials at the nanoscale strongly depend on their size, shape, chemical composition, and surface area [45, 46]. Thus, ALD has been extensively used to modify