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Custom plating of nanoscale semiconductor/catalyst junctions for photoelectrochemical water splitting

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Academic year: 2021

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Figure

Figure 1. (a) Tilted SEM view of an n-Si/Ni NP photoanode prepared by conventional electrodeposition of Ni on n-Si
Figure 2. (a) Scheme of the sequential steps of templated electrodeposition for the preparation of catalytic metal NWs with a high degree of control
Figure 3. (a–c) High-magnification SEM top view images of Ni NWs electrodeposited on n-Si with p = 10 µm for (a) Q edep = 1 mC, (b) 3 mC, and (c) 30 mC
Figure 5. (a,b) 2D representation of the CB energy in n-Si for an n-Si/Ni surface with p =100 µm and (a) w = 350 nm (black) and (b) w = 100 nm
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