Chemical vapour deposition
Protective Alumina Coatings by Low Temperature Metalorganic Chemical Vapour Deposition
... To cite this version : Sovar, Maria-Magdalena and Samélor, D. and Gleizes, Alain and Alphonse, Pierre and Perisanu , S. and Vahlas, Constantin ( 2007) Protective Alumina Coatings by Low Temperature Metalorganic ...
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Fluidization and coating of very dense powders by fluidized bed chemical vapour deposition
... Bed Chemical Vapour Deposition (FBCVD) reactor was made of a vertical cylindrical column of stain- less steel and had the same dimensions as the glass column used for fluidization ...
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Transient stages during the chemical vapour deposition of silicon carbide from CH3SiCl3/H2: impact on the physicochemical and interfacial properties of the coatings
... protect chemical reactors, space mirrors, thermostructural composite materials or the fission fuel containers of the future nuclear ...reactors. Chemical vapour deposition (CVD) is the most ...
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Chemical vapour deposition and atomic layer deposition of amorphous and nanocrystalline metallic coatings: towards deposition of multimetallic films
... material deposition are ...(metalorganic chemical vapour deposition) and ALD of intermetallic films, in view of fabrication of metallic glass thin films is ...metallic deposition ...
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Modelling of an industrial moving belt chemical vapour deposition reactor forming SiO2 films
... Pressure Chemical Vapour Deposition moving belt reactor depositing SiO 2 film from tetraethoxysilane Si (OC 2 H 5 ) 4 (TEOS) andozone O 3 ...a chemical limitation for TEOS has been introduced, ...
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Al–Cu intermetallic coatings processed by sequential metalorganic chemical vapour deposition and post-deposition annealing
... enhanced Young’s modulus, good compressive strength and rea- sonably good compressive ductility [3] . In addition, Al and Cu are reasonably inexpensive, and easily available. Processing of Al–Cu and, more generally of ...
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Charge effect of superparamagnetic iron oxide nanoparticles on their surface functionalization by photo-initiated chemical vapour deposition
... the chemical and biomedical industry depend on their surface ...photo-initiated chemical vapour deposition ...the chemical composition of the treated ...
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Reduced Order Modelling for efficient numerical optimisation of a hot-wall Chemical Vapour Deposition reactor
... hot-wall Chemical Vapour Deposition (CVD) ...a chemical reaction of vapour-phase precursors. The deposition of the solid phase is controlled through the temperature field on the ...
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Chemical vapour deposition and atomic layer deposition of amorphous and nanocrystalline metallic coatings: Towards deposition of multimetallic films
... material deposition are ...(metalorganic chemical vapour deposition) and ALD of intermetallic films, in view of fabrication of metallic glass thin films is ...metallic deposition ...
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Low pressure chemical vapour deposition of BN: Relationship between gas phase chemistry and coating microstructure
... hot deposition area, leading to the disappearance of reaction path N°2 in favour of reaction path ...BN deposition can be fast and total even when the high standard total gas flow rate is ...the ...
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Full range of wettability through surface modification of single-wall carbon nanotubes by photo-initiated chemical vapour deposition
... of chemical and roughness changes) [ 44 ]. Aside from CA approaches, an inverse gas chromatography-surface energy analyzer (IGC-SEA) may be used to assess expected wettability [ 45 , 46 ]. For example, Li et ...
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Preliminary study of [Ni(en)3] (CF3CO2)2 and Ni(en) (hfpd)2 as precursors for metalorganic chemical vapour deposition: structural properties and thermal behaviours (en = ethylenediamine, hfpd = hexafluoropentadionato(−))
... [Ni(enh](CF,CO 2 ) i (1) and Ni\en)(hfpd) i (2) were both o:,tained by wmking in the system Ni z . /ethy!enediamine/hcxafluorn pentanedione. They have been comparatively studied as possible sources for chemi.:al ...
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Chemical vapour infiltration and mechanical properties of carbon open-cell foams
... Chemical vapour deposition (CVD) is a versatile process of prime interest to achieve this goal. CVD coatings are generally smooth, dense and crack free, leading to particularly high fracture strength ...
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Deposition of La2Zr2O7 Film by Chemical Solution Deposition
... metalorganic chemical vapour deposition (MOCVD) and metal organic decomposition (MOD); ...production. Chemical solution deposition (CSD) is very attractive in this respect and much used ...
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Chemical vapor deposition of low reflective cobalt (II) oxide films
... According to this model, we conclude that T d appears to influ- ence the effective refractive index of the layer probably through the film density. Several authors demonstrate that the widening of the refractive index ...
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Chemical vapor deposition of organosilicon and sacrificial polymer thin films
... On a per wafer basis for a base case comparing spin-on and CVD organosilicon low-k dielectric films, chemical consumption was 350% higher for the spin-on deposition method.1o[r] ...
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Chemical vapor deposition of low reflective cobalt (II) oxide films
... According to this model, we conclude that T d appears to influ- ence the effective refractive index of the layer probably through the film density. Several authors demonstrate that the widening of the refractive index ...
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SiGe growth using Si3H8 by low temperature chemical vapor deposition
... temperature during epitaxial growth. Several groups (among which IMEC) studied the impact of the pre-epi treatments on substrate/epi interface contamination and its importance for device performance, see for example ...
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Kinetics, Chemistry, and Morphology of Syngas Photoinitiated Chemical Vapor Deposition
... ions such as SiCO - , SiC2O - , SiC2OH - ( at m/z = 56, 68, 69, respectively). These results corroborated the suspected structure obtained from XPS. In addition, to confirm the chemical structure of the thin ...
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Chemical vapor deposition of TiO2 for photocatalytic applications and biocidal surfaces
... 3: Decomposition of Orange G aqueous solution vs UV light exposure by two TiO2 samples 2500 nm thick grown on steel at 500 °C by AA-CVD pyrosol without and with solvent high C contaminat[r] ...
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