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LIST  OF  ABBREVIATIONS

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  -­‐  201  -­‐  

LIST  OF  ABBREVIATIONS    

1D,  2D,  3D   one-­‐,  two-­‐  or  three-­‐dimensional   AC  (DC)   alternating  (direct)  current  

AFM     atomic  force  microscopy  

AP   arbitrary  pattern  

BSE   back-­‐scattered  electron  

CA   contact  angle  

CCM   colloidal  crystal  mask  

CVD   chemical  vapor  deposition  

DL   double  layer  

F

c

  capillary  force  

fct   face-­‐centered  tetragonal    

F

d

  hydrodynamic  force  

FTO   fluorine-­‐doped  tin  oxide  

H

c

  coercive  field    

HCP   hexagonal  close  packed  

H

IP

  in-­‐plane  height  

H

OP

  out-­‐of-­‐plane  height  

ITO     indium  tin  oxide  

J

s

  convection  solvent  flux  

L

s

  lateral  size  

LSPR   localized  surface  plasmon  resonance  

MFM   magnetic  force  microscopy  

MLR   multi  linear  regression  

MOCVD   meta-­‐organic  chemical  vapor  deposition  

MOKE   magneto-­‐optic  Kerr  effect  

M

s

  saturation  magnetization    

NP(s)   nanoparticle(s)  

Ns   nanosphere  

NSL   nanosphere  lithography  

PC(A)   principal  component  (analysis)  

PDMS   polyddimethylsiloxane  

PLD   pulsed  laser  deposition    

PLS   partial  least  square  regression  

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  -­‐  202  -­‐  

PMMA   poly(methyl  methacrylate)  

PPA   perdioc  particle  array  

PS   polystyrene  

PS  490  nm  (250  nm)   mask  

colloidal  mask  prepared  with  PS  spheres   (diameters  of  490  nm  or  250  nm)  

PV   photovoltaïc  

PVD   physical  vapor  deposition    

PW   parallel  writing  

RH   relative  humidity  

RIE   reactive  ion  etching  

RMS   root-­‐mean-­‐square  

RPM   revolutions  per  minute  

sccm   standar  cubic  cm  

SE   secondary  electron    

SEM     scanning  electonm  icroscopy  

SL   single  layer  

SQUID    superconducting  quantum  interference  device  

SW   sequential  writing  

TG  (TS)  process   templated  growth  (templated  seeding)  process   TG-­‐calcined  

sample  manufactured  by  the  templated  growth   process,  after  removal  of  the  nanospheres  by   calcination  

TG-­‐NS   sample  manufactured  by  the  templated  growth   process,  before  removal  of  the  nanospheres     TS-­‐calcined  

sample  manufactured  by  the  templated  seeding   process  in  which  the  nanospheres  were  removed   by  calcination  

TS-­‐sonicated  

sample  manufactured  by  the  templated  seeding   process  in  which  the  nanospheres  were  removed   by  sonication+calcination  

UV   ultraviolet  

VLS  growth   vapor-­‐liquid-­‐solid  growth  

VSM   vibrating  sample  magnetometer  

XRD   x-­‐ray  diffraction  

 

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