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Process modeling for proximity effect correction in electron beam lithography

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Academic year: 2021

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Figure 2 (a) presents a pattern to be printed, (b) a SEM picture of the same layout after exposure based on  compensation of a poor model and (c) a SEM picture of the same layout after compensation using a better model
Figure 9. Basics on copolymers for DSA. (a) shows the difference of a random copolymer and a block one while (b)  shows the difference in concentrations
Figure 14. Schematic principles of the multi-beam columns from the tools proposed by (a) MAPPER and (b)  IMS Nanofabrication
Figure 19. The primary phases and activities of computer modeling and their relations
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