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Chemical vapor deposition of organosilicon and sacrificial polymer thin films

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Academic year: 2021

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Figure

Figure  2-1.  Arrhenius  plot of D3 and D4 films produced  by HFCVD. Measured deposition rates,  r (left axis), are denoted by solid markers,  and
Figure  2-2.  FTIR spectra  of a. D3 PECVD film deposited  under continuous-wave excitation  and b
Figure 2-3. FTIR spectra  of D3 HFCVD films deposited at filament temperatures of a. 86o0 C, b
Figure 2-4. FTIR spectra  of D4 HFCVD films  deposited  at filament temperatures  of a
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