HAL Id: hal-01375962
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Submitted on 3 Oct 2016
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Study of the sintering and oxidation behavior to the HfB2/SiC system. Synthesis, reactivity and
chemical-physical characterization.
Cassandre Piriou, Olivier Rapaud, Ludovic Charpentier, Sylvie Foucaud
To cite this version:
Cassandre Piriou, Olivier Rapaud, Ludovic Charpentier, Sylvie Foucaud. Study of the sinter- ing and oxidation behavior to the HfB2/SiC system. Synthesis, reactivity and chemical-physical characterization.. 7th International Workshop on Advanced Ceramics, Sep 2016, Limoges, France.
�10.13140/RG.2.2.18838.34885�. �hal-01375962�
Introduction
Study of the sintering and oxidation behavior to the HfB
2/SiC system.
Synthesis, reactivity and chemical-physical characterization.
1 : Laboratoire Science des Procédés Céramiques et de Traitements de Surface – UMR CNRS 7315
Université de Limoges – Centre Européen de la Céramique, 12 Rue Atlantis, F-87068 Limoges Cedex - France
C. Piriou1, O. Rapaud1, L. Charpentier2, S. Foucaud1
Study of sintering and oxidation behaviour
2 : Laboratoire Procédés, Matériaux et Energie Solaire – UPR CNRS 8521 7 Rue du Four Solaire, 66120 Font Romeu Odeillo - France
The first aim of our work consists in synthesizing Ultra High Temperature HfB2/SiC ceramics, used as structural materials in aeronautic and aerospace areas, by Spark Plasma Sintering (SPS). This process is used to obtain fully dense materials (>99% relative density) with fine grains, at lower sintering temperature and shorter dwell time than conventional techniques. Sintered materials are then oxidized in a solar furnace and characterized in order to better understand the oxidation mechanisms.
Conclusion
Spark Plasma Sintering (SPS)
Oxidation in solar furnace
Characterization of oxidized products
Electrode
Piston (graphite) Sample
Matrix (graphite) Spacer
HfB2* 5µm
SiC
1µm > 99% relative
density
SiC content (% vol.)
Sintering temperature
(°C)
Relative density
(%)
0 1850 100
5 1850 99
10 1800 100
15 1750 100
20 1750 100
25 1700 99
c-HfC (00-039-1491)
10 30 50 70
Intensity (a.u.)
2θ (°)
1450K 1550K 1800K
m-HfO2 (00-034-0104) h-HfB2 (00-038-1398) α-SiC (00-029-1131)
m-SiO2 (00-051-1377)
• Sintering of fully dense HfB2/SiC ceramics by Spark Plasma Sintering
• Decrease of sintering temperature with the addition of silicon carbide
• Oxidation tests carried out with a solar furnace up to 1800K under stagnant air
Mass gain
Protective oxide layer
Slower mass gain rate for
80% vol. HfB2 +
20% vol. SiC
• Slower mass gain rate for the composition 80% vol. HfB2 + 20% vol. SiC
• Different microstructures observed depending on the oxidation temperature and ceramic composition.
1450 K
1550 K
1800 K 1450 K
1550 K
1800 K
Solar flux
Exposed surfaces
c-HfC (00-039-1491) m-HfO2 (00-034-0104) h-HfB2 (00-038-1398) α-SiC (00-029-1131)
• Appearance of hafnium and silicon dioxides
• Increase of dioxides intensity peaks with
temperature
• Silicon carbide grains growth with oxidation
temperature
• External oxide layer growth with oxidation
temperature
H80S20
SiC
Black grains
HfB2
Grey grains
*Milled powder
1650 1700 1750 1800 1850
0 10 20
Sintering temperature (°C)
SiC content (% vol.)
H100 H95S5 H90S10 H85S15 H80S20 H75S25
10 30 50 70
Intensity (a.u.)
2θ (°)
H100 H95S5 H90S10 H85S15 H80S20 H75S25
Surface Section
Surface
0 5 10 15 20
1200 1400 1600 1800
Mass gain rate (mg.cm-2 .h-1 )
Temperature (K)
H100 H95S5 H90S10 H85S15 H80S20
*
* H95S5: 95% vol. of milled HfB2 + 5% vol. SiC
The milling was carried out in a planetary mill during 30 minutes containing 6 cycles of 6 minutes (1 minute of milling and 5 minutes rest).