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Molecular dynamics simulations of H-induced plasma processes and cluster-catalyzed epitaxial growth of thin silicon films

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Academic year: 2021

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Figure

Figure 1.1: Schematic diagram of a parallel plate capacitively coupled RF glow dis- dis-charge reactor.
Table 2.1: Parameters of the Ohira-Tersoff potential
Figure 3.2: The evolution of the instantaneous temperature of clusters with the number n of reactions with H-atoms: a) Si 15 H 10 ; b) Si 29 H 24 .
Figure 3.3: The RDFs of the clusters during the heating processes induced by the subsequent reactions with H-atoms: a) Si 15 H 10 ; b) Si 29 H 24 .
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