• Aucun résultat trouvé

Displacement Talbot Lithography for nano-engineering of III-nitride materials

N/A
N/A
Protected

Academic year: 2021

Partager "Displacement Talbot Lithography for nano-engineering of III-nitride materials"

Copied!
21
0
0

Texte intégral

Loading

Figure

Fig.  1  Schematic  of  the  III-Nitride  nano-engineering  process  via  DTL.  a  Coating  of  III-Nitride 127
Fig. 3 Dielectric mask and metal mask. a 1 µm pitch nanoholes opening in 140 nm HSQ. b 187
Fig. 5 III-Nitride top-down etched nanostructures a Plan-view SEM image of ~600 nm depth GaN 264
Fig. 6 GaN selective area sublimation a SEM plan-view image of 1  µ m height holes in GaN
+3

Références

Documents relatifs

Figure 5-18 denotes the experimental data and the average critical energy release rates Gci of the Ni/BaTiO3 interfaces measured by blister test.. The Ni films were fired at 1200°C

The aim of this chapter is to introduce the concept of epitaxial growth and the information concerning the growth of III-Nitrides (GaN, AlN, AlGaN, GaN/AlN

Figure 5: 2D-FDTD Transmission spectrum of silicon nitride sensor based on microring resonator before (black line) and after (red line) a changing in the background

Prefactors (B/A) 0 and activation energies E (B/A) for the Arrhenius expression of the linear rate constant for the Deal and Grove model. Standard TCAD and modified parameters to

Interaction between rainbow trout corticosteroid receptors - a possible regulatory role for the mineralocorticoid receptor in response to stress.. Pia Kiilerich, Sandrine

These clusters represent various temporal expression dynamics, with high expression at early (myoblast proliferation and fusion), mid (myotube attachment and myofibril assembly) or

We noted that the majority of enzymes implicated in glycolysis, TCA cycle and fatty acid  -oxidation were significantly down- regulated while the main proteins

values of the corresponding rate constants to zero in equation 7. In addition, the protonation constant of the complex determined by pH-potentiometric titration is much lower than