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HAL Id: jpa-00246584

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Submitted on 1 Jan 1992

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X-ray absorption near edge structure of quartz.

Application to the structure of densified silica

P. Lagarde, A. Flank, G. Tourillon, R. Liebermann, J. Itie

To cite this version:

P. Lagarde, A. Flank, G. Tourillon, R. Liebermann, J. Itie. X-ray absorption near edge structure of

quartz. Application to the structure of densified silica. Journal de Physique I, EDP Sciences, 1992, 2

(6), pp.1043-1050. �10.1051/jp1:1992113�. �jpa-00246584�

(2)

Classification Physics Abstracts

61.10D 61.40 62.50

X-ray absorption

near

edge structure of quartz.

Application to the structure of densified silica

P-

Lagarde ii),

A. M- Flank

ii),

G- Tourillon

ii),

R. C. Liebermann

(2)

and J. P- Itie

(3)

II)

LURE (CNRS, CEA, MENJS) Bit. 209d, Centre Universitaire, 91405

Orsay,

France (2) Center for

High

Pressure Research, State

University

of New York,

Stony

Brook, New York

11794, U-S.A.

(3)

Physique

des Milieux Condens£s, Universit£ P. et M. Curie, 4

place

Jussieu, 75230 Paris Cedex 05, France

(Received 20

January

1992, revised and

accepted19

March 1992)

Abstract.

X-ray absorption

spectra of quartz

(10T0),

pure silica and densified silica under

pressure have been recorded at the silicon and oxygen

K-edges.

The spectra of quartz show intense

polarization

effects which have been

interpreted

on the

single scattering approximation,

using geometrical considerations. The

comparison

between the spectra of silica and densified silica, on the basis of this

interpretation, gives

some information on the structural effect suffered

by

the silica network under pressure.

Introduction.

X-ray absorption

spectroscopy

(XAS)

has been, and is

still,

a

powerful

tool for the

understanding

of the local order in

amorphous systems.

This comes from the

sensitivity

of the Extended

X-ray Absorption

Fine Structure

(EXAFS)

to the very local order due to the 2 k-

dependence

of the

oscillatory signal [I], despite

the fact that the structural disorder becomes often a very

strong

limitation to the extraction of a reliable radial distribution function

[2].

For

instance EXAFS

analysis

in

amorphous

metallic

alloys

has been able to show the

splitting

of the first coordination shell into two different subshells

[3]

and this accurate

description

of the local order could not be achieved

by

any other method : in that case EXAFS appears to be

short-range

limited

compared

to

scattering techniques

but at the same

time,

much more sensitive to fine details of the local order. When

applied

to covalent

glasses

or

oxides,

this

technique

does not

yield

useful information : the first shell is well defined because of the

stability

of the valence bond

angles

and it is very close to its

crystalline

counterpart ; however the distribution of the dihedral

angle

is wide

enough

to eliminate the

signal

from the medium range order.

Nevertheless,

some

interesting pieces

of information can be

gained

from a more detailed data

analysis

in some

special

cases

[4]

or

by taking

into account the three

body

correlation function

[5],

at the cost of

increasing

the

complexity

of the calculations.

(3)

1044 JOURNAL DE PHYSIQUE I N° 6

At the same time it is also well known that the

X-ray

Near

Edge

Structure

(XANES)

part of

the spectrum contains much more information on the

medium-range

order

[6]:

its

quantitative analysis

is still a very difficult task which has

only

been

attempted

in some

selected cases

[7, 8], primarily crystalline

materials with a

simple symmetry

and

closely

related

amorphous

systems.

Among

the numerous

glasses,

silica is of

particular

interest because of its natural abundance as well as its wide range of industrial

applications

nevertheless its structure is still not

fully

elucidated. Since it is one of the most abundant materials in the earth's

interior,

the behavior of the structure of this

glass

when submitted to

high temperature

and/or

high

pressure is of a fundamental interest in

geophysics. Finally,

silicon and silicon oxide and sub- oxides are present in all the electronic devices based on the MOS

technology

; the structure of the first oxide

layers

on the

top

of a silicon substrate

[9],

the structure of silicon suboxides

[10]

and that of different kinds of silicas obtained

through

the

sol-gel

route

[I

I are still the

subject

of fundamental research in materials science

by

XAS-

All of these reasons make the

understanding

of the

X,ray absorption

of the silicon in an

oxidized environment very valuable. Since the

analysis

of the EXAFS data has not been able to

give

much more than the first oxygen shell around the silicon atom, we have focused our attention to the near

edge part

of the spectrum with the

goal

of

extracting

some

signature

on

the

absorption

spectra from the

medium-range order,

which could then be used to understand the structure of an unknown material.

Therefore,

we started with the

interpretation

of the X- ray

absorption spectra

of

quartz, keeping

in mind that the

spectra

of the

amorphous

state is sometimes reminiscent of that of the

crystalline

material. As an

illustration,

the

change

on the middle range of silica when densified under very

high

pressure will be

analyzed.

This first

approach

will be

completed by

a full

multiple scattering analysis

which is now in progress to

quantify

these conclusions.

1.

Experimental techniques.

XANES spectra of quartz, silica and densified silica have been taken at the silicon and the oxygen

K-edges.

In the case of

quartz, polarized spectra

have been recorded with the z-axis of the

crystal aligned parallel

or normal to the

photon

electric field. The

experiments

have been

done at

SuperAco

: silicon spectra have been taken on the SA32 soft

X-ray

beam line

using

the two

crystal

monochromator

equipped

with

Insb(ill) crystals.

The

experimental

resolution is then of the order of 0-7 eV ; the

absorption signal

is collected

by measuring

the

total electron

yield

with a channeltron in the

counting

mode while the

incoming

flux is

monitored

by

an ion chamber.

Oxygen spectra

have been collected on SA72

using

a TGM

monochromator in that case, the

experimental

resolution is of the order of 0-3 eV. Three

samples

have been run : a

quartz (1010)

set normal to the

photon

beam and rotated

along

an axis

parallel

to the

photon beam,

a pure silica

glass

and a densified silica. This densified

sample

was

produced

at the

Stony

Brook

High

Pressure

Laboratory compressing

rods of

normal

a-Si02

in an uniaxial

split-sphere

apparatus up to pressures of 16GPa at room

temperature.

From

density

measurement, the densification can be estimated to about 20 fb- The two

amorphous samples

were set at the same incidence

angle.

2. Results and discussion.

2-1

QUARTZ. Figure

I shows the two silicon near

edge spectra

of the

(lfl0) quartz

: the

(1010) plane

is oriented normal to the

photon

beam and the c-axis has been oriented

parallel

or normal to the electric field of the

photon.

These two

spectra

are raw data since the

(4)

1850 1860

E(eV)

Fig. I. Silicon XANES spectra of quartz I do with two orientations of the

crystal

i,ei,ins the

photon

electric field I

: solid line I

perpendicular

to the z-axis, crosses : I

parallel

to the =-axis.

incoming

flux is monitored at each

experimental point by

the ion chamber and the

quantity I/Io

is known to be

proportional

to the

absorption

coefficient, While the two white lines

appears to be identical there are considerable differences between the two

spectra

in the first 40 eV

beyond

the

edge

which

obviously correspond

to

polarization

effects due to the electric

dipole

operator

entering

the matrix element

[I]-

Figure

2 shows the structure of the quartz

(1010) plane

where

only

one unit cell

along

the direction normal to this

plane

has been taken into account

depending

on the orientation of

e

Fig.

2. View of the quartz

(ld0) plane.

Silicon atoms are small circles.

Only

one unit cell has been used

along

the x-axis and the

figure

has been rotated

slightly

around the

y-axis

for

clarity.

The z-axis is

horizontal. The labels refer to the text.

(5)

1046 JOURNAL DE

PHYSIQUE

I N° 6

the electric field with

respect

to the z-axis we obtain the situations described

by figure

I. The XAS

spectra

is

govemed by

Fermi's

golden

rule

p cc

£ )(I)I,r) f))~6(E~-E;-hw)

where

I)

and

f)

are the initial and final states. Because the matrix element contains the scalar

product

I r where I is the

photon

electric field and r the interatomic vector which links the

absorbing

atom and the

neighbors, only

these interatomic vectors which have a non-zero

projection

onto the

photon

electric field will appear on the spectrum. Examination of

figure

2 shows that :

I)

the first and the second shell must contribute almost with the same amount to the two

polarized

spectra : around the silicon atom A for

instance,

the first shell of four oxygen atoms at 1.6

I

has

a pure tetrahedral symmetry and the four-second

neighbor

atoms at 3.06

/k

must

contribute more or less

isotropically-

This is in accord with the observation that the

shape

resonance at 865 eV has almost the same energy and the same

intensity

for the two spectra.

From

multiple scattering calculations,

this resonance has been attributed to the 9 atoms cluster

composed

of one silicon atom, the four oxygen

nearest-neighbors

and the four silicon

next-nearest

neighbors [12]

it)

the main differences in the local environment of one silicon atom

projected

onto the electric field comes from outer shells which are active in one orientation and not in the other

one- The most obvious effect comes from the atoms at 4-9

/k

labelled B and B'

along

the

y-axis

and the atoms A and A' at 5.4

/k along

the z-axis : a

large polarization

effect is to be

expected

from this situation since there is no

intervening

atom between the central and the

scattering

ones. To a lesser extent the

third-neighbor

oxygen atoms also

produce

a

polarization

effect

which appears in

figure

2 : while the third

neighbors

at

3-6i (atoms c)

are distributed

isotropically

around the central atom

A,

this is not the case for those at 3.9

I (atoms d)

or at 4-1

I (atoms e)

; the former will be influential when the electric field is

parallel

to the z-axis and the latter when the field is

polarized

normal to the z-axis.

To a first

approximation,

each group of

scattering

atoms at one

given

distance will

contribute to the

absorption spectrum by

a

shape

resonance. The energy

position

AE of such a resonance, when measured from the

edge

energy, scales with the interatomic distance R as

[13]

:

AE *R ~

= constant

Therefore we can

interpret

the structures

present

in the XANES quartz spectra in the

following

way :

the two lines at 1853 and 855 eV

correspond

to the

scattering by

the silicon atoms

along

the z and the

y-axis respectively,

at 5-4 and 4.9

I,

the two resonances at 857.4 and 859 eV are due to the oxygen third

neighbors,

the

first one

being

attributed to those atoms at 4.I

I

while the second feature

comes from the

oxygens at 3.9

I- Using

this identification for these four resonances we obtain the same value of 843 eV

(within

I eV

accuracy)

for the energy of

origin.

This energy is the

low,energy

limit

of the white

line,

as

previously

indicated the wide

shape

resonance around 865 eV is due to the Flrst and second

neighbors

of the silicon.

2.2 SILICA AND DENSIFIED SILICA. The two spectra of silica and densified

silica,

in the

same energy range as that of the

quartz,

are shown in

figure

3- These spectra have been normalized to the same

edge step

taken at the maximum of the

shape

rdsonance at 865 eV-

(6)

1850 1860

E(eV) Fig.

3. a) solid line

= silicon XANES spectrum of the pure silica

glass,

b) crosses

= silicon XANES spectrum of the densified silica. The two spectra have been normalized at the same values before the white line and at 1865 eV-

The most

significative

differences between them and with the

quartz

spectra are the

following:

I)

in both cases the white line appears at the same energy as in the

quartz

but it is

slightly

wider in silica than in quartz. It is even wider in the case of the densified silica

it)

in the range 850-1 860 eV some structures are still present which vary from one silica to the other one. These

changes

have

already

been

reported

without any

explanation [12]

iii)

the structure at 1865 eV is still

present,

in an

equal

amount, in both

spectra

and it

keeps

some resemblance with that of the

crystalline

material.

2-3 DiscussioN- The white line

corresponds

to the ls

-

3p

transition. Since quartz is an

insulating

material with

4sp3 hybridization,

the first level above the gap is of strong p character and it is empty,

leading

then to a strong

absorption

coefficient. This white line is of the same

type

as the discrete resonances due to the

promotion

of a core electron into a low-

lying

empty molecular orbital which have been observed in tetrahedral molecules like

SiC14, SiF4

or

Si(CH~)4 l14]. Therefore,

the short range order alone

gives

the main character of this final level and the

position

of the white line and its width remain in first

approximation

the

same since the elemental

Si04

unit is considered to remain

unchanged

in

going

from quartz to silica : full

multiple scattering

calculations of a 5 atom cluster

[15] composed

of one central silicon atom and its four

surrounding

oxygens show that this white line can be

explained by

this local environment.

Nevertheless,

the

long

range order must determine the exact value of the width of this level and we expect therefore the width of the silica white line to be greater

than that of the

quartz.

The

change

in the

shape

but not the energy of this line after densification is therefore a

signature

of the

broadening

of the

3p

states

following

a

slight

distorsion of the tetrahedron which occurs without any

significant change

of the interatomic distances for the Si-O first

neighbors.

This is in line with neutron diffraction results on the

same

sample

where no

change

in the Si,O and O-O mean distances have been detected whereas the width of the distribution of this last distance was

enlarged [16]-

It could also indicate that the disorder is even more

pronounced

in the case of the densified silica.

That the two

shape

resonances around 865 eV are similar in both silica and rather close to that on quartz appears to indicate that the

high-pressure cycle

does not

affect,

in first

(7)

1048 JOURNAL DE

PHYSIQUE

I N° 6

approximation,

the close environment of the silicon atoms up to the second shell apart for the

slight changes

which have been discussed above. In

fact,

full

multiple scattering

calculations

[17]

at the silicon

edge

show that this

spectral

feature is almost insensitive to the Si-O-Si bond

angle

in the

expected

domain of variation of this

angle

upon

amorphisation

or densification.

While little

insight

can be obtained from the silicon

K-edge,

some information comes from the oxygen

K-edge

shown in

figure

4 : it is

composed

of a wide white line at 540 eV followed

by

a

shape

resonance at about 560 eV which

slightly

shifts to

high energies

in the case of the

densified silica. XANES calculations

[17]

have attributed this resonance to the Si-Si second

neighbor

distance related to the Si-O-Si bond

angle

an increase of this

angle

leads to an increase of the energy

splitting

between this resonance and the main white line. Therefore the variation we observe in the densified silica as

interpreted

on the basis of this

calculation,

seems not in agreement with other results

[18],

which conclude to a decrease of the Si-O-Si

angle,

but definite conclusions from XAS need more accurate

experimental

and theoretical results.

a

a Si02

b

ji

b densfied Si02

§

d

z a

o

#

~ o b

~i

535 540 545 560 565 570 575 580

ENERGY (ell~

Fig.

4.

Oxygen K-edge

XANES of silica and densified silica. Notice the shift in energy of the

resonance at 560 eV.

The main modifications between the

crystal

and the

glass,

and between the two

glasses,

appear in the XAS spectra between 1850 and 1860 eV and thus comes from interatomic

distances

beyond

the third shell. In order to

clarify

this

point,

we have shown in

figure

5 the difference

spectra

:

figure 5,

curve

a)

is the difference between the quartz spectrum in the

parallel

and

perpendicular

orientations

(Fig. I)

while

figure 5,

curve

b)

shows the difference

between silica and densified silica after

being

normalized to the same

edge step (Fig. 3)-

In

this latter case,

only

the

part

between 1850 and 1870 eV has been

plotted

because the

difference between the two white line

yields meaningless

values in the range 840 to

848 eV. Two main features appear in

figure 5,

curve

a)

at 853 and 859 eV we attribute them to the structural differences described

previously

on the

(1010) plane

of the quartz : the

first one comes from the silicon atoms at 5,4 and 4.9

I along

the

z and

y-axis respectively

while the second feature comes from oxygen third

neighbors.

Without calculation of the XAS spectrum, it is not

possible

to be more

specific, Figure 5,

curve

b)

shows the first

spectral

(8)

1858 1866 E(eV)

Fig.

5. Differences between the normalized silicon XANES spectra : curve a) crosses quartz

parallel

to the z-axis minus quartz normal to the z-axis. Curve b) solid line : pure silica minus densified silica.

Only

the energy

region beyond

the white line has been

plotted.

feature and

perhaps

some hint of the second one ; this

implies

that the oxygen environment of the silicon at around 4

/k

is

only slightly changed

upon densification and that the

principal

modification of the structure at this

mid-range

interatomic distance affects the Si-Si at about 5

/k-

This suggest that the silicon atoms at about 5-4

I (which

exist

only

for 6-members of

larger rings),

move to a

position

similar to the atoms situated in the xy

plane

of

quartz

at 4-9

I la position

which can

only

be obtained for smaller

rings).

This result could be an indication for

a

change

in the

rings

statistic upon

densification,

with an increase of the concentration of low- membered

rings,

in

good agreement

with the data obtained from neutron

scattering

results on the same

sample [16],

Conclusions.

A

comparison

between XAS

spectra

of quartz in two

polarisations,

of normal silica and densified silica at both the silicon and the oxygen

K-edges

has led us to the

following

conclusions :

the XANES structures of

quartz

have been attributed to

specific

interatomic

distances,

Si-O at 3.9 and 4, I

I,

Si-Si at 4.9 and 5,4

I.

These results have to be confirmed

by

a

multiple scattering approach

;

the white line, due to the

Si04

tetrahedron, is

unchanged

from the

crystalline

to the

amorphous

state but is

slightly

wider upon

densification,

an indication for a

slight

distorsion of this

Si04

unit under pressure ;

the oxygen

K-edge

shows a small

displacement

of the resonance at 560 eV to

high

energies

upon

densification,

difficult to

interpret

in terms of the Si-O-Si bond

angle

variation ; in the Si

spectrum

of normal

silica,

there exists a

signature

from Si,Si

resulting

from

large-membered rings.

This interatomic distance of 5.4

I

decreases in

compression

to a value close to that

present

in the

crystal along

the xy

plane (I,e.

4.9

h).

(9)

1050 JOURNAL DE PHYSIQUE I N° 6

References

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(1970)

248

Phys.

Rev. B lo (1971) 8.

[2] EISENBERGER P. and BROWN G. S., Solid State Commun. 29 (1979) 481.

[3] SADOC A., RAOUX D., FONTAINE A. and LAGARDE P., J. Non

Cryst.

Solids 50

(1982)

33.

[4] BELLISSENT R., CHENEVAS-PAULE A,, LAGARDE P,, BAzIN D., RAOUX D., J, Non Cryst. Solids 59 (1983) 237.

[5] DI Clcco A,, BIANCONI A,, COLUzzA C,, RUDOLF P., LAGARDE P,, FLANK A. M. and MARCELLI A,, J. Non

Cryst.

Solids l16 (1990) 27,

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Phys.

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[8] SAINCTAVIT Ph., PETIAU J., LAWON C., FLANK A, M. and LAGARDE P,,

X-Ray Absorption

Fine Structure, S. Hasnain Ed., (Ellis-Horwood, 1991) p. 38.

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[10] FLANK A. M., KARNATAK R. C., BLANCARD C., ESTEVA J. M., LAGARDE P., CONNERADE J. P., Z. Phys. D 21 (1991) 357.

[11] BELOT V., CORRIU R. J. P., LECLERCQ D., LEFtVRE P., MUTIN P. H., VIOUX A. and FLANK A. M., J. Non Cryst. Sulids 127 (1991) 207.

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