Microcrystalline silicon based thin film transistors fabricated on flexible substrate
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![Figure 1.8: Applications of flexible displays. a) Electronic paper by HP and ASU [15]](https://thumb-eu.123doks.com/thumbv2/123doknet/7998250.268022/21.918.206.727.107.431/figure-applications-flexible-displays-electronic-paper-hp-asu.webp)
![Figure 1.9 Flexible displays in research laboratories: a) OLED using a-Si:H TFTs on metal foil substrate [18], b) OLED using bottom gate OTFTs on plastic substrate [19], c) EPD using](https://thumb-eu.123doks.com/thumbv2/123doknet/7998250.268022/22.918.229.718.128.542/figure-flexible-displays-research-laboratories-substrate-plastic-substrate.webp)
![Figure 1.13: Density of states in microcrystalline silicon and a-Si:H measured by ICTS [83]](https://thumb-eu.123doks.com/thumbv2/123doknet/7998250.268022/39.918.253.656.115.450/figure-density-states-microcrystalline-silicon-si-measured-icts.webp)
![Figure 2.6: Crystalline fraction of microcrystalline silicon as a function of argon ration in the (Ar-H 2 ) mixture [1]](https://thumb-eu.123doks.com/thumbv2/123doknet/7998250.268022/58.918.287.632.189.533/figure-crystalline-fraction-microcrystalline-silicon-function-ration-mixture.webp)
![Figure 1 a): Transfer characteristic of TFTs using silicon oxide as gate insulator [2], b): Transfer characteristic of TFTs using silicon nitride as gate insulator [2]](https://thumb-eu.123doks.com/thumbv2/123doknet/7998250.268022/94.918.135.724.662.928/figure-transfer-characteristic-silicon-insulator-transfer-characteristic-insulator.webp)
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